Molecular vapor deposition (original) (raw)

Molecular vapor deposition is the gas-phase reaction between surface reactive chemicals and an appropriately receptive surface. Often bi-functional silanes are used in which one termination of the molecule is reactive. For example, a functional chlorosilane (R-Si-Cl3) can react with surface hydroxyl groups (-OH) resulting a radicalized (R) deposition on the surface. The advantage of a gas phase reaction over a comparable liquid phase process is the control of moisture from the ambient environment, which often results in cross polymerization of the silane leading to particulates on the treated surface. Often a heated sub-atmospheric vacuum chamber is used to allow precise control of the reactants and water content. Additionally the gas phase process allows for easy treatment of complex par