(original) (raw)

{"entities":{"Q7252868":{"pageid":7156463,"ns":0,"title":"Q7252868","lastrevid":1937912616,"modified":"2023-07-20T17:24:47Z","type":"item","id":"Q7252868","labels":{"en":{"language":"en","value":"proximity effect"},"zh-hant":{"language":"zh-hant","value":"\u9130\u8fd1\u6548\u61c9\uff08\u96fb\u5b50\u675f\u66dd\u5149\uff09"},"zh-hans":{"language":"zh-hans","value":"\u90bb\u8fd1\u6548\u5e94\uff08\u7535\u5b50\u675f\u66dd\u5149\uff09"},"zh":{"language":"zh","value":"\u90bb\u8fd1\u6548\u5e94\uff08\u7535\u5b50\u675f\u66dd\u5149\uff09"},"ca":{"language":"ca","value":"Efecte de proximitat (litografia de feix d'electrons)"}},"descriptions":{"en":{"language":"en","value":"phenomenon in electron beam lithography that developed pattern is wider than scanned pattern"},"ca":{"language":"ca","value":"fenomen de la distribuci\u00f3 de la dosi d'exposici\u00f3"}},"aliases":{"ca":[{"language":"ca","value":"EBL"}]},"claims":{"P31":[{"mainsnak":{"snaktype":"value","property":"P31","hash":"1754d81acb2486f5eaa2b615bf79f2b091c698e4","datavalue":{"value":{"entity-type":"item","numeric-id":1293220,"id":"Q1293220"},"type":"wikibase-entityid"},"datatype":"wikibase-item"},"type":"statement","id":"Q7252868$b617d04a-4577-c003-5835-f87b9d8016bd","rank":"normal"}],"P646":[{"mainsnak":{"snaktype":"value","property":"P646","hash":"31e3a8929779d5820e31ce78e422c6a668ed3b36","datavalue":{"value":"/m/02vr949","type":"string"},"datatype":"external-id"},"type":"statement","id":"Q7252868$0A62B270-088C-4397-949E-2742549EB1D0","rank":"normal"}],"P10283":[{"mainsnak":{"snaktype":"value","property":"P10283","hash":"78a3fb9db2baf6ed03dd6be8ad4058c66ba6d8a2","datavalue":{"value":"C2777953097","type":"string"},"datatype":"external-id"},"type":"statement","id":"Q7252868$CCD9CFF2-6032-43C5-9457-B8D7953C5869","rank":"normal","references":[{"hash":"c13ba4d7902ead2693f79396bc25bd35d4d14030","snaks":{"P248":[{"snaktype":"value","property":"P248","hash":"4a4f26a5361b5707266e48e425bf2be2f99fd2ab","datavalue":{"value":{"entity-type":"item","numeric-id":107507571,"id":"Q107507571"},"type":"wikibase-entityid"},"datatype":"wikibase-item"}],"P813":[{"snaktype":"value","property":"P813","hash":"435834d08182bb9f3dbe974ba9840af0f12899cc","datavalue":{"value":{"time":"+2022-01-26T00:00:00Z","timezone":0,"before":0,"after":0,"precision":11,"calendarmodel":"http://www.wikidata.org/entity/Q1985727"},"type":"time"},"datatype":"time"}\],"P854":\[{"snaktype":"value","property":"P854","hash":"a4a4bf53f22268815c51ec10fed608da703c9c7f","datavalue":{"value":"https://docs.openalex.org/download-snapshot/snapshot-data-format","type":"string"},"datatype":"url"}\]},"snaks-order":\["P248","P813","P854"\]}\]}\]},"sitelinks":{"cawiki":{"site":"cawiki","title":"Efecte de proximitat (litografia de feix d'electrons)","badges":[],"url":"https://ca.wikipedia.org/wiki/Efecte\_de\_proximitat\_(litografia\_de\_feix\_d%27electrons)"},"enwiki":{"site":"enwiki","title":"Proximity effect (electron beam lithography)","badges":[],"url":"https://en.wikipedia.org/wiki/Proximity\_effect\_(electron\_beam\_lithography)"}}}}}