Kevin Wearen | Dundalk Institute of Technology (original) (raw)
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Papers by Kevin Wearen
Journal of Optics-nouvelle Revue D Optique, 2010
We describe the optimization of the holographic patterning of sub-micrometre surface relief struc... more We describe the optimization of the holographic patterning of sub-micrometre surface relief structures in an acrylamide-based photopolymer. A substantial improvement in the photoinduced surface relief resolution was achieved by altering the photopolymer chemical composition and by introducing a single step post-recording thermal treatment of the layers. It was observed that, by optimization of the chemical composition of the photopolymer layers, the maximum achievable spatial frequency increases from 200 to 550 lines/mm. The improvement of the surface relief amplitude by alteration of the chemical composition is limited due to the fact that both decrease of the plasticizer and increase of the monomer concentrations result in less stable photopolymer layers. In order to obtain further improvement in the spatial frequency resolution a thermal treatment of the layers was implemented. It was observed that baking of the layers at temperatures ranging from 120 to 220 °C at a rate of 1 °C min - 1 makes possible the inscription of surface relief profiles with a sub-micrometre period of 650 nm and amplitude of 15 nm.
Holographic recording is an effective approach for photopolymer surface patterning. It has been p... more Holographic recording is an effective approach for photopolymer surface patterning. It has been previously utilised in acrylamide-based photopolymers and a spatial frequency limit of 200 l/mm has been observed. We report the successful inscription of submicrometer resolution patterns. The spatial frequency response has been extended to 1550 l/mm by introduction of thermal post recording treatment. Initial results from the optical patterning utilising a spatial light modulation (SLM) reveal that the amplitude of the photoinduced surface relief structures is larger in comparison to the amplitude obtained by holographic recording.
Holographic recording is an effective approach for photopolymer surface patterning. It has been p... more Holographic recording is an effective approach for photopolymer surface patterning. It has been previously utilised in acrylamide-based photopolymers and a spatial frequency limit of 200 l/mm has been observed. We report the successful inscription of submicrometer resolution patterns. The spatial frequency response has been extended to 1550 l/mm by introduction of thermal post recording treatment. Initial results from the optical patterning utilising a spatial light modulation (SLM) reveal that the amplitude of the photoinduced surface relief structures is larger in comparison to the amplitude obtained by holographic recording.
Journal of Optics-nouvelle Revue D Optique, 2010
We describe the optimization of the holographic patterning of sub-micrometre surface relief struc... more We describe the optimization of the holographic patterning of sub-micrometre surface relief structures in an acrylamide-based photopolymer. A substantial improvement in the photoinduced surface relief resolution was achieved by altering the photopolymer chemical composition and by introducing a single step post-recording thermal treatment of the layers. It was observed that, by optimization of the chemical composition of the photopolymer layers, the maximum achievable spatial frequency increases from 200 to 550 lines/mm. The improvement of the surface relief amplitude by alteration of the chemical composition is limited due to the fact that both decrease of the plasticizer and increase of the monomer concentrations result in less stable photopolymer layers. In order to obtain further improvement in the spatial frequency resolution a thermal treatment of the layers was implemented. It was observed that baking of the layers at temperatures ranging from 120 to 220 °C at a rate of 1 °C min - 1 makes possible the inscription of surface relief profiles with a sub-micrometre period of 650 nm and amplitude of 15 nm.
Holographic recording is an effective approach for photopolymer surface patterning. It has been p... more Holographic recording is an effective approach for photopolymer surface patterning. It has been previously utilised in acrylamide-based photopolymers and a spatial frequency limit of 200 l/mm has been observed. We report the successful inscription of submicrometer resolution patterns. The spatial frequency response has been extended to 1550 l/mm by introduction of thermal post recording treatment. Initial results from the optical patterning utilising a spatial light modulation (SLM) reveal that the amplitude of the photoinduced surface relief structures is larger in comparison to the amplitude obtained by holographic recording.
Holographic recording is an effective approach for photopolymer surface patterning. It has been p... more Holographic recording is an effective approach for photopolymer surface patterning. It has been previously utilised in acrylamide-based photopolymers and a spatial frequency limit of 200 l/mm has been observed. We report the successful inscription of submicrometer resolution patterns. The spatial frequency response has been extended to 1550 l/mm by introduction of thermal post recording treatment. Initial results from the optical patterning utilising a spatial light modulation (SLM) reveal that the amplitude of the photoinduced surface relief structures is larger in comparison to the amplitude obtained by holographic recording.