Nanofabrication of a two‐dimensional array using laser‐focused atomic deposition (original) (raw)

Skip Nav Destination

Research Article| September 04 1995

R. Gupta;

Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

Search for other works by this author on:

J. J. McClelland;

Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

Search for other works by this author on:

Z. J. Jabbour;

Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

Search for other works by this author on:

R. J. Celotta

Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899

Search for other works by this author on:

Crossmark: Check for Updates

Appl. Phys. Lett. 67, 1378–1380 (1995)

Fabrication of a two‐dimensional array of nanometer‐scale chromium features on a silicon substrate by laser‐focused atomic deposition is described. Features 13±1 nm high and having a full‐width at half maximum of 80±10 nm are fabricated in a square array with lattice constant 212.78 nm, determined by the laser wavelength. The array covers an area of approximately 100 μm×200 μm. Issues associated with laser‐focusing of atoms in a two‐dimensional standing wave are discussed, and potential applications and improvements of the process are mentioned.

REFERENCES

G.

Timp,

R. E.

Behringer,

D. M.

Tennant,

J. E.

Cunningham,

M.

Prentiss

, and

K. K.

Berggren,

Phys. Rev. Lett.

69

,

1636

(

1992

).

J. J.

McClelland,

R. E.

Scholten,

E. C.

Palm

, and

R. J.

Celotta,

Science

262

,

877

(

1993

).

R. E.

Scholten,

J. J.

McClelland,

E. C.

Palm,

A.

Gavrin

, and

R. J.

Celotta,

J. Vac. Sci. Technol. B

12

,

1847

(

1994

).

See, e.g., Electron-beam, X-ray and Ion-beam Sub-micrometer Lithographies for Manufacturing II, SPIE Proc. Vol. 1671, edited by M. Peckerar (SPIE, Bellingham, WA, 1992).

R. E. Scholten, R. Gupta, J. J. McClelland, and R. J. Celotta (to be published).

J. P. Gordon and A. Ashkin, Phys. Rev. A 21, 1606 (1980); J. Dalibard and C. Cohen-Tannoudji, J. Opt. Soc. Am. B 2, 1707 (1985).

The net electric field can be determined by combining the four traveling waves E+x=(ẑE1+ŷE2)ei(kx−ωt)⁠, E−x=−(ẑE1+ŷE2)e−i(kx+ωt)⁠, E+y=(x̂E3+ẑE4)ei(ky−ωt+φ)⁠, E−y=−(x̂E3+ẑE4)e−i(ky+ωt−φ), where E1 and E2 are the complex electric field amplitudes determining the magnitude and polarization state of a wave traveling in the +x̂-direction, E3 and E4 are the corresponding amplitudes for a wave traveling in the +ŷ-direction, and φ is the relative temporal phase for the two waves. See, e.g., J. D. Jackson, Classical Electrodynamics, 2nd ed. (Wiley, New York, 1975), pp. 273 ff.

A.

Hemmerich,

D.

Schropp,

Jr., and

T. W.

Hänsch,

Phys. Rev. A

44

,

1910

(

1991

).

G.

Grynberg,

B.

Lounis,

P.

Verkerk,

J.-Y.

Courtois

, and

C.

Salomon,

Phys. Rev. Lett.

70

,

2249

(

1993

).

J. J. McClelland, J. Opt. Soc. Am. B (in press).

For Cr, the variation can be as much as a factor of 28. See, e.g., V. G. Minogin and V. S. Letokhov, Laser Light Pressure on Atoms (Gordon and Breach, New York, 1987).

Uncertainty estimates quoted in this paper are to be interpreted as one standard deviation combined random and systematic uncertainties unless otherwise indicated.

N. I.

Maluf,

S. Y.

Chou,

J. P.

McVittie,

S. W. J.

Kuan,

. R.

Allee

, and

R. F. W.

Pease,

J. Vac. Sci. Technol. B

7

,

1497

(

1989

).

This content is only available via PDF.

© 1995 American Institute of Physics.

1995

American Institute of Physics

You do not currently have access to this content.

Sign in

Sign In

You could not be signed in. Please check your credentials and make sure you have an active account and try again.

Username ?

Password

Pay-Per-View Access

$40.00