Nanofabrication of a two‐dimensional array using laser‐focused atomic deposition (original) (raw)
Research Article| September 04 1995
Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
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Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Search for other works by this author on:
Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Search for other works by this author on:
Electron Physics Group, National Institute of Standards and Technology, Gaithersburg, Maryland 20899
Search for other works by this author on:
Appl. Phys. Lett. 67, 1378–1380 (1995)
Fabrication of a two‐dimensional array of nanometer‐scale chromium features on a silicon substrate by laser‐focused atomic deposition is described. Features 13±1 nm high and having a full‐width at half maximum of 80±10 nm are fabricated in a square array with lattice constant 212.78 nm, determined by the laser wavelength. The array covers an area of approximately 100 μm×200 μm. Issues associated with laser‐focusing of atoms in a two‐dimensional standing wave are discussed, and potential applications and improvements of the process are mentioned.
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© 1995 American Institute of Physics.
1995
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