Holographic encoding of fine-pitched micrograting structures in amorphous SiO2 thin films on silicon by a single femtosecond laser pulse (original) (raw)
Research Article| February 19 2001
Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
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Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
Search for other works by this author on:
Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
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Materials and Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
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Ken-ichi Kawamura
Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
Nobuhiko Sarukura
Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
Masahiro Hirano
Hosono Transparent Electro-Active Materials (TEAM) Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu-ku, Kawasaki 213-0012, Japan
Hideo Hosono
Materials and Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
Appl. Phys. Lett. 78, 1038–1040 (2001)
Fine-pitched micrograting structures were holographically encoded in amorphous (a-) SiO2 thin films on silicon wafers by colliding a pair of focused pulses split from a single, mode-locked Ti: sapphire, femtosecond laser. A method enhancing the third-harmonic generation resulting from the nonlinearity of air adjusted the optical paths of the two pulses. Surface-relief-type gratings were formed on SiO2 glasses due to laser ablation when the laser power exceeded more than 0.3 mJ/pulse, while shallow grating structures were imprinted on a-SiO2 thin films by volume compaction (∼3%) when the irradiation power was reduced to ∼50 μJ/pulse. The postirradiation deepening of the valley of the grating structure was possible with chemical etching. The minimal spacing of 430 nm was encoded using the 800 nm laser.
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© 2001 American Institute of Physics.
2001
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