Electron-beam-induced deformations of SiO2 nanostructures (original) (raw)
Article navigation
Research Article| July 06 2005
Kavli Institute of Nanoscience, Delft University of Technology
, Lorentzweg 1, 2628 CJ Delft, The Netherlands
Search for other works by this author on:
Kavli Institute of Nanoscience, Delft University of Technology
, Lorentzweg 1, 2628 CJ Delft, The Netherlands and
Netherlands Institute for Metals Research
, 2628 AL Delft, The Netherlands
Search for other works by this author on:
Kavli Institute of Nanoscience, Delft University of Technology
, Lorentzweg 1, 2628 CJ Delft, The Netherlands
Search for other works by this author on:
Kavli Institute of Nanoscience, Delft University of Technology
, Lorentzweg 1, 2628 CJ Delft, The Netherlands
Search for other works by this author on:
Kavli Institute of Nanoscience, Delft University of Technology
, Lorentzweg 1, 2628 CJ Delft, The Netherlands
Search for other works by this author on:
Electronic mail: storm@mb.tn.tudelft.nl
Permanent address: Department of Physics, Brown University, Providence, Rhode Island 02912.
J. Appl. Phys. 98, 014307 (2005)
The imaging beam of a transmission electron microscope can be used to fine tune critical dimensions in silicon oxide nanostructures. This technique is particularly useful for the fabrication of nanopores with single-nanometer precision, down to 2 nm. We report a detailed study on the effect of electron-beam irradiation on apertures with various geometries. We show that, on the same wafer, pores that are smaller than a certain critical size shrink and that larger ones expand. Our results are in agreement with the hypothesis that surface-tension effects drive the modifications. Additionally, we have determined the chemical composition in the pore region before and after modifications and found no significant changes. This result proves that contamination growth is not the underlying mechanism of pore closure.
REFERENCES
T.
Ito
and
S.
Okazaki
,
Nature (London)
406
,
1027
(
2000
).
D. M.
Eigler
and
E. K.
Schweizer
,
Nature (London)
344
,
524
(
1990
).
A. J.
Heinrich
,
C. P.
Lutz
,
J. A.
Gupta
, and
D. M.
Eigler
,
Science
298
,
1381
(
2002
).
H. W.C.
Postma
,
T.
Teepen
,
Z.
Yao
,
M.
Grifoni
, and
C.
Dekker
,
Science
293
,
76
(
2001
).
A. F.
Morpurgo
,
C. M.
Marcus
, and
R. B.
Robinson
,
Appl. Phys. Lett.
74
,
2064
(
1999
).
J. L.
Li
,
D.
Stein
,
C.
McMullan
,
D.
Branton
,
M. J.
Aziz
, and
J. A.
Golovchenko
,
Nature (London)
412
,
166
(
2001
).
A. J.
Storm
,
J. H.
Chen
,
X. S.
Ling
,
H. W.
Zandbergen
, and
C.
Dekker
,
Nat. Mater.
2
,
537
(
2003
).
J. L.
Li
,
M.
Gershow
,
D.
Stein
,
E.
Brandin
, and
J. A.
Golovchenko
,
Nat. Mater.
2
,
611
(
2003
).
A. J.
Storm
,
C.
Storm
,
J. H.
Chen
,
H. W.
Zandbergen
,
J. F.
Joanny
, and
C.
Dekker
, Nano Letters (submitted).
A. J.
Storm
,
J. H.
Chen
,
H. W.
Zandbergen
, and
C.
Dekker
,
Phys. Rev. E
71
,
051903
(
2005
).
A.
Mara
,
Z.
Siwy
,
C.
Trautmanu
,
J.
Wan
, and
F.
Kamme
,
Nano Lett.
4
,
497
(
2004
).
A.
Aksimentiev
,
J. B.
Heng
,
G.
Timp
, and
K.
Schulten
,
Biophys. J.
87
,
2086
(
2004
).
H.
Chang
,
F.
Kosari
,
G.
Andreadakis
,
M. A.
Alam
,
G.
Vasmatzis
, and
R.
Bashir
,
Nano Lett.
4
,
1551
(
2004
).
N. N.
Gribov
,
S. J.C.H.
Theeuwen
,
J.
Caro
, and
S.
Radelaar
,
Microelectron. Eng.
35
,
317
(
1997
).
Handbook of Microlithography, Micromachining and Microfabrication
, edited by
P.
Rai-Choudhury
(
SPIE
, Bellingham, WA,
1997
).
G. S.
Chen
,
C. B.
Boothroyd
, and
C. J.
Humphreys
,
Appl. Phys. Lett.
62
,
1949
(
1993
).
P. M.
Ajayan
and
S.
Iijima
,
Philos. Mag. Lett.
65
,
43
(
1992
).
G. I.
Taylor
and
D. H.
Michael
,
J. Fluid Mech.
58
,
625
(
1973
).
M.
Lanxner
,
C. L.
Bauer
, and
R.
Scholz
,
Thin Solid Films
150
,
323
(
1987
).
© 2005 American Institute of Physics.
2005
American Institute of Physics
You do not currently have access to this content.
Sign in
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Username ?
Password
Pay-Per-View Access
$40.00