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Papers by Daniel Sanders

Research paper thumbnail of Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains

ACS nano, Jan 29, 2016

The ability to control the specific adsorption and packing behaviors of biomedically important pr... more The ability to control the specific adsorption and packing behaviors of biomedically important proteins by effectively guiding their preferred surface adsorption configuration and packing orientation on polymeric surfaces may have utility in many applications such as biomaterials, medical implants, and tissue engineering. Herein, we investigate the distinct adhesion configurations of fibrinogen (Fg) proteins and the different organization behaviors between single Fg molecules that are mediated by the changes in the periodicity and alignment of chemically alternating nanodomains in thin films of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) block copolymer (BCP). Specifically, the adsorption characteristics of individual Fg molecules were unambiguously resolved on four different PS-b-PMMA templates of dsa PS-b-PMMA, sm PS-b-PMMA, com PS-b-PMMA, and PS-r-PMMA. By direct visualization through high resolution imaging, the distinct adsorption and packing configurations of both ...

Research paper thumbnail of Methods of directed self-assembly and layered structures formed therefrom (China Patent)

Research paper thumbnail of Reducibility in the Four-Color Theorem

In [J. Combin. Theory Ser. B 70 (1997), 2-44] we gave a simplified proof of the Four-Color Theore... more In [J. Combin. Theory Ser. B 70 (1997), 2-44] we gave a simplified proof of the Four-Color Theorem. The proof is computer-assisted in the sense that for two lemmas in the article we did not give proofs, and instead asserted that we have verified those statements using a computer. Here we give additional details for one of those lemmas, and we include the original computer programs and data as "ancillary files" accompanying this submission.

Research paper thumbnail of Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme

2014 Ieee International Electron Devices Meeting, Dec 1, 2014

Research paper thumbnail of Graded topcoat materials for immersion lithography

Research paper thumbnail of Self-Topcoating Resist for Photolithography

Research paper thumbnail of Self-Topcoating Photoresist for Photolithography

Research paper thumbnail of Contact angles & structure/surface property relationships of immersion materials - art. no. 65191Q

Proceedings of Spie the International Society For Optical Engineering, Mar 1, 2007

Research paper thumbnail of DSA patterning options for FinFET formation at 7nm node

Alternative Lithographic Technologies VIII, 2016

Research paper thumbnail of Three-edge-colouring doublecross cubic graphs

Research paper thumbnail of Modeling Polymer Self-Assembly for Sub-Lithographic Patterning

ABSTRACT The semiconductor industry is rapidly approaching the limits of 193 nm optical immersion... more ABSTRACT The semiconductor industry is rapidly approaching the limits of 193 nm optical immersion lithography with on chip features of 22 nm planned shortly. The high cost and complexity of extreme ultraviolet lithography is driving a search for alternative patterning technologies to create structures smaller than 14 nm. One promising alternative is a combination of top-down lithography with the directed self-assembly of block copolymers or blends. As part of an integrated experimental and computational research effort at IBM, we make use of parallel supercomputers, polymer field theory and Monte Carlo calculations to understand and guide the development of new DSA processes, polymers, and patterning designs.

Research paper thumbnail of Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography

J Photopolym Sci Technol, 2008

ABSTRACT Immersion lithography for the 32nm node and beyond requires advanced methods to control ... more ABSTRACT Immersion lithography for the 32nm node and beyond requires advanced methods to control 193 nm radiation reflected at the resist/BARC interface, due to the high incident angles that are verified under high numerical aperture (NA) imaging conditions. ...

Research paper thumbnail of Method of Controlling Orientation of Domains in Block Copolymer Films

Research paper thumbnail of Methods of directed self-assembly, and layered structures formed therefrom

Research paper thumbnail of Organic graded spin on BARC compositions for high NA lithography

Research paper thumbnail of Functionalized carbosilane polymers and photoresist compositions containing the same

Research paper thumbnail of Photoresist compositions and methods of use in high index immersion lithography

Research paper thumbnail of Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films

Research paper thumbnail of The Photopolymer Science and Technology Award

J Photopolym Sci Technol, 2009

Tatsuyuki Nakatani received the BS degree in physics from Tokyo University of Science, Tokyo, Jap... more Tatsuyuki Nakatani received the BS degree in physics from Tokyo University of Science, Tokyo, Japan, in 1987, and the Ph.D. degree in material engineering from Nagasaki University, Nagasaki, Japan, in 2008. He was with Mazda Motor Corporation, Hiroshima, ...

Research paper thumbnail of <title>Fluoro-alcohol materials with tailored interfacial properties for immersion lithography</title>

Advances in Resist Materials and Processing Technology XXIV, 2007

Immersion lithography has placed a number of additional performance criteria on already stressed ... more Immersion lithography has placed a number of additional performance criteria on already stressed resist materials. Much work over the past few years has shown that controlling the water-resist interface is critical to enabling high scan rates (i.e. throughput) while minimizing film pulling and PAG extraction (i.e. defectivity). Protective topcoat polymers were developed to control the aforementioned interfacial properties and emerged

Research paper thumbnail of Surface Assembly Configurations and Packing Preferences of Fibrinogen Mediated by the Periodicity and Alignment Control of Block Copolymer Nanodomains

ACS nano, Jan 29, 2016

The ability to control the specific adsorption and packing behaviors of biomedically important pr... more The ability to control the specific adsorption and packing behaviors of biomedically important proteins by effectively guiding their preferred surface adsorption configuration and packing orientation on polymeric surfaces may have utility in many applications such as biomaterials, medical implants, and tissue engineering. Herein, we investigate the distinct adhesion configurations of fibrinogen (Fg) proteins and the different organization behaviors between single Fg molecules that are mediated by the changes in the periodicity and alignment of chemically alternating nanodomains in thin films of polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) block copolymer (BCP). Specifically, the adsorption characteristics of individual Fg molecules were unambiguously resolved on four different PS-b-PMMA templates of dsa PS-b-PMMA, sm PS-b-PMMA, com PS-b-PMMA, and PS-r-PMMA. By direct visualization through high resolution imaging, the distinct adsorption and packing configurations of both ...

Research paper thumbnail of Methods of directed self-assembly and layered structures formed therefrom (China Patent)

Research paper thumbnail of Reducibility in the Four-Color Theorem

In [J. Combin. Theory Ser. B 70 (1997), 2-44] we gave a simplified proof of the Four-Color Theore... more In [J. Combin. Theory Ser. B 70 (1997), 2-44] we gave a simplified proof of the Four-Color Theorem. The proof is computer-assisted in the sense that for two lemmas in the article we did not give proofs, and instead asserted that we have verified those statements using a computer. Here we give additional details for one of those lemmas, and we include the original computer programs and data as "ancillary files" accompanying this submission.

Research paper thumbnail of Electrical characterization of FinFETs with fins formed by directed self assembly at 29 nm fin pitch using a self-aligned fin customization scheme

2014 Ieee International Electron Devices Meeting, Dec 1, 2014

Research paper thumbnail of Graded topcoat materials for immersion lithography

Research paper thumbnail of Self-Topcoating Resist for Photolithography

Research paper thumbnail of Self-Topcoating Photoresist for Photolithography

Research paper thumbnail of Contact angles & structure/surface property relationships of immersion materials - art. no. 65191Q

Proceedings of Spie the International Society For Optical Engineering, Mar 1, 2007

Research paper thumbnail of DSA patterning options for FinFET formation at 7nm node

Alternative Lithographic Technologies VIII, 2016

Research paper thumbnail of Three-edge-colouring doublecross cubic graphs

Research paper thumbnail of Modeling Polymer Self-Assembly for Sub-Lithographic Patterning

ABSTRACT The semiconductor industry is rapidly approaching the limits of 193 nm optical immersion... more ABSTRACT The semiconductor industry is rapidly approaching the limits of 193 nm optical immersion lithography with on chip features of 22 nm planned shortly. The high cost and complexity of extreme ultraviolet lithography is driving a search for alternative patterning technologies to create structures smaller than 14 nm. One promising alternative is a combination of top-down lithography with the directed self-assembly of block copolymers or blends. As part of an integrated experimental and computational research effort at IBM, we make use of parallel supercomputers, polymer field theory and Monte Carlo calculations to understand and guide the development of new DSA processes, polymers, and patterning designs.

Research paper thumbnail of Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography

J Photopolym Sci Technol, 2008

ABSTRACT Immersion lithography for the 32nm node and beyond requires advanced methods to control ... more ABSTRACT Immersion lithography for the 32nm node and beyond requires advanced methods to control 193 nm radiation reflected at the resist/BARC interface, due to the high incident angles that are verified under high numerical aperture (NA) imaging conditions. ...

Research paper thumbnail of Method of Controlling Orientation of Domains in Block Copolymer Films

Research paper thumbnail of Methods of directed self-assembly, and layered structures formed therefrom

Research paper thumbnail of Organic graded spin on BARC compositions for high NA lithography

Research paper thumbnail of Functionalized carbosilane polymers and photoresist compositions containing the same

Research paper thumbnail of Photoresist compositions and methods of use in high index immersion lithography

Research paper thumbnail of Method of use of epoxy-containing cycloaliphatic acrylic polymers as orientation control layers for block copolymer thin films

Research paper thumbnail of The Photopolymer Science and Technology Award

J Photopolym Sci Technol, 2009

Tatsuyuki Nakatani received the BS degree in physics from Tokyo University of Science, Tokyo, Jap... more Tatsuyuki Nakatani received the BS degree in physics from Tokyo University of Science, Tokyo, Japan, in 1987, and the Ph.D. degree in material engineering from Nagasaki University, Nagasaki, Japan, in 2008. He was with Mazda Motor Corporation, Hiroshima, ...

Research paper thumbnail of <title>Fluoro-alcohol materials with tailored interfacial properties for immersion lithography</title>

Advances in Resist Materials and Processing Technology XXIV, 2007

Immersion lithography has placed a number of additional performance criteria on already stressed ... more Immersion lithography has placed a number of additional performance criteria on already stressed resist materials. Much work over the past few years has shown that controlling the water-resist interface is critical to enabling high scan rates (i.e. throughput) while minimizing film pulling and PAG extraction (i.e. defectivity). Protective topcoat polymers were developed to control the aforementioned interfacial properties and emerged

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