Ido Dolev - Academia.edu (original) (raw)

Papers by Ido Dolev

Applied Physics Letters, 2010

We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. ... more We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. In order to frequency convert these beams, the nonlinear process should be performed with the Fourier transform of the beam, rather than with the beam itself. This was confirmed experimentally by frequency doubling of one-dimensional and two-dimensional Airy beams in a periodically poled crystal. Sum-frequency or

Optics Letters, 2010

We present experimental control of the acceleration direction of Airy beams generated by nonlinea... more We present experimental control of the acceleration direction of Airy beams generated by nonlinear threewave mixing processes in an asymmetrically poled nonlinear photonic crystal. Changing the crystal temperature enabled us to switch the phase matching condition between second-harmonic generation and difference-frequency generation in the same nonlinear crystal and thereby to change the acceleration direction and the wavelength of the output Airy beam. All-optical control of the acceleration direction can be also realized at a fixed crystal temperature by using a tunable pump source and selecting the proper crystal poling period.

Considerable effort is directed towards the development of next-generation lithography processes,... more Considerable effort is directed towards the development of next-generation lithography processes, addressing the need for transistor densification to meet Moore's Law. The aggressive design rule shrinkage requires very tight process windows and induces various types of pattern failure with lithography process variations. Since the lithography process is critical in the wafer fabrication process, the requirements for high sensitivity defect detection

IEEE Convention of the Electrical and ELectronic Engineers in Israel, 2008

We present a new wavelength and temperature dependent refractive index equations for 0.5% MgO dop... more We present a new wavelength and temperature dependent refractive index equations for 0.5% MgO doped periodically poled stoichiometric LiTaO3 crystal for both extra-ordinary and ordinary polarizations. Our equations fit experimental data over a wide temperature (25-250°C) and spectral ranges: 0.35-6 ¿m for the extra-ordinary wave and 0.375-3.75 ¿m for the ordinary wave. The equations were cross validated with measurements of

Adoption of immersion technology to push printing resolution with existing wavelength (193nm) bri... more Adoption of immersion technology to push printing resolution with existing wavelength (193nm) brings to many concerns about defect controls on lithography process. Along with aggressive design rule shrinkage k1 factor of lithography process is close to 0.3 and this low k1 factor process results in very tight process window. Narrow process window easily induces various types of pattern failure with

Applied Physics B-lasers and Optics, 2009

We derive new temperature dependent Sellmeier equations for the extra-ordinary and ordinary refra... more We derive new temperature dependent Sellmeier equations for the extra-ordinary and ordinary refractive indices of 0.5% MgO-doped stoichiometric LiTaO3 crystal. The equations are based on quasi phase-matched frequency conversion measurements, as well as on interferometric measurements of the thermal expansion and thermal dispersion. These equations fit experimental data over wide spectral ranges: 0.35–6 μm for the extra-ordinary wave and 0.375–3.75 μm for

Metrology, Inspection, and Process Control for Microlithography XXI, 2007

As cell size of advanced memory is approaching to around 50nm hence the size of defect is require... more As cell size of advanced memory is approaching to around 50nm hence the size of defect is required to be detected is less than 30nm. In the array area best combinations of the inspection tool that can be achieved the maximum sensitivity through optics based are short wavelength, small pixel and collection from off-axis perspectives when the noise from pattern can be blocked. To remove the pattern noise efficiently and having enough defect signal to detector laser illumination is better approach than broadband lamp where lobe formation is not well defined and light intensity is not high enough. UVisionTM 3D channel which is off-axis collection of light from normal illumination was evaluated on array area of advanced memory design rules. Below 100nm node design rule 3D channel can successfully suppress the Customized Light Collection (CLC) lobes which are diffraction lobes from memory array pattern. In this paper we would like to report significant improvement of defect detection sensitivity through optimizing CLC lobe mask. It was developed to maximize the defect collection area and angle and showed improvements on defect detection through SNR and signal enhancement. Because of CLC lobe suppression's inverse relationship with device design rule the results show that the smaller design rule gives better defect signal detection capability.

SADP (Self Aligned Double Patterning) is one of the major options to be implemented to bridge the... more SADP (Self Aligned Double Patterning) is one of the major options to be implemented to bridge the lithography resolution gaps for 40 nm half pitch nodes and below. A natural concern for IC manufacturers when developing and/or implementing this kind of module is defectivity control strategy to ensure all defect sources are understood and an appropriate inspection strategy can be implemented to ensure high die yields. In this paper we will share a comprehensive study done to understand & characterize the major defect types in the SADP module developed by the Maydan Technology Center of Applied Materials. The implications of this work in terms of setting an optimized inspection strategy in the module will be discussed.

Frontiers in Optics 2010/Laser Science XXVI, 2010

ABSTRACT Frequency doubling of a surface plasmon-polariton in the metal-nonlinear dielectric boun... more ABSTRACT Frequency doubling of a surface plasmon-polariton in the metal-nonlinear dielectric boundary is analyzed. Phase matching can be achieved either by varying the metal thickness or periodically modulating the nonlinear coefficient of the crystal.

2010 12th International Conference on Transparent Optical Networks, 2010

Nonlinear photonic crystals are materials in which the second order susceptibility is modulated, ... more Nonlinear photonic crystals are materials in which the second order susceptibility is modulated, while the linear susceptibility remains constant. These structures are often used in nonlinear optics applications for compensating the phase mismatch between interacting waves. The progress in modulation techniques, mainly by electric field poling of ferroelectric crystals, enables to explore new applications, based on all-optical control of the

Metrology, Inspection, and Process Control for Microlithography XXV, 2011

ABSTRACT EUV mask metrology and inspection challenges as well as EUV patterned wafer metrology an... more ABSTRACT EUV mask metrology and inspection challenges as well as EUV patterned wafer metrology and inspection strategies must be addressed to enable EUV patterning for pilot and high volume production. In this work we present a defectivity analysis of defects from post EUV lithography and etch and the correlation between them on 40nm and 28nm half pitch (HP) line/space structures. The objective of the work was to study the lithography and etch process window vs. pitch as well as to characterize the performance of a DUV brightfield wafer inspection system on EUV stacks in order to detect EUV related DOI's. In addition to defect characterization for the lithography and etch layers, we present the results of scattering simulation from these layers, with polarized 266nm DUV illumination, to provide insight on the light-pattern interaction and on the critical detection parameters.

Metrology, Inspection, and Process Control for Microlithography XXIII, 2009

As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) have a ... more As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) have a dramatic effect on printed final lines and hence the need to control these parameters increases. Sources of CDU and LER variations include scanner auto-focus accuracy and ...

Metrology, Inspection, and Process Control for Microlithography XXV, 2011

Extreme ultraviolet (EUV) lithography is considered as the leading patterning technology beyond t... more Extreme ultraviolet (EUV) lithography is considered as the leading patterning technology beyond the ArF-based optical lithography, addressing the need for transistor densification to meet Moore's Law. Theoretically, EUV lithography at 13.5nm wavelength meets the resolution requirements for 1xnm technology nodes. However, there are several major challenges in the development of EUV lithography for mass production of advanced CMOS devices. These

16th International School on Quantum Electronics: Laser Physics and Applications, 2010

ABSTRACT Nonlinear photonic crystals are materials in which the second order susceptibility is mo... more ABSTRACT Nonlinear photonic crystals are materials in which the second order susceptibility is modulated. These structures are often used in nonlinear optics applications for compensating the phase mismatch between interacting waves. The progress in techniques of modulating the nonlinearity enables to explore new applications, based on all-optical control of the phase, amplitude and polarization of the nonlinearly generated waves. This enables the realization of functional nonlinear optical devices, such as nonlinear lenses, switches, polarization rotators, deflectors and beam shapers. Here we will discuss in detail two applications that are enabled by specially designed nonlinear photonic crystals: All optical polarization switching, and the generation, nonlinear mixing and manipulation of accelerating Airy beams.

Physical Review Letters, 2012

Surface plasmon polaritons and free-space beams are often coupled through periodic gratings. Here... more Surface plasmon polaritons and free-space beams are often coupled through periodic gratings. Here we show that by employing holographic-based techniques for modulating the grating, one can systematically control the amplitude and phase of the free-space beam. Alternatively, arbitrarily shaped surface plasmon can be generated. By using gratings with different periods for the input and output coupling, we obtain a planar beam transformer, whose resonance angles are related through a generalized form of the Bragg law. Specifically, we demonstrate the coupling of surface plasmon polaritons into focused free-space beams, as well as into accelerating Airy beams and vortex beams.

Physical Review Letters, 2012

We present the experimental observation of 1D and 2D self-accelerating nonlinear beams in quadrat... more We present the experimental observation of 1D and 2D self-accelerating nonlinear beams in quadratic media, which are also the first nonlinear self-accelerating beams in any symmetric nonlinearity. Notably, we show that the intensity peaks of the first and second harmonics are asynchronous with respect to one another, but the coupled harmonics exhibit joint acceleration within the nonlinear medium. Finally, we demonstrate the impact of self-healing effects on the jointly accelerating first and second harmonics.

Optics Letters, 2011

Whereas periodic gratings enable us to couple light into a surface plasmon polariton only at a sp... more Whereas periodic gratings enable us to couple light into a surface plasmon polariton only at a specific angle and wavelength, we show here that quasiperiodic gratings enable the coupling of light at multiple wavelengths and angles. The quasiperiodic grating can be designed in a systematic manner using the dual-grid method, thereby enabling us to control the coupling strength and grating dimensions. We verified the method experimentally by efficiently coupling light into a surface plasmon from several different illumination angles using a single quasiperiodic grating.

Optics Letters, 2008

We propose a novel all-optical, nonlinear mode-conversion scheme based on cascaded three-wave-mix... more We propose a novel all-optical, nonlinear mode-conversion scheme based on cascaded three-wave-mixing phase-matched interactions in quadratic nonlinear crystals. We demonstrate the method experimentally by performing all-optical mode conversion of an input 1636 nm Hermite-Gaussian mode from the zeroth order to the first order using two periodically poled LiNbO 3 crystals. Nonlinear mode conversion of an input beam into a higher order, orthogonally polarized output beam can be realized using only one quasiperiodic nonlinear structure. Moreover, it can be enhanced for conversion of complex modes, e.g., Laguerre-Gaussian or Bessel modes.

Optics Letters, 2011

A method to design lasers that emit an arbitrary beam profile is studied. In these lasers, output... more A method to design lasers that emit an arbitrary beam profile is studied. In these lasers, output-coupling is performed by a diffraction grating that imposes a phase and amplitude distribution onto the diffracted light. A solid-state laser emitting beams with a two-dimensional Airy intensity profile is demonstrated both theoretically and experimentally. In this case, the diffraction grating adds a transverse cubic phase to the diffracted light. An Airy beam is obtained by performing optical Fourier transform of the out-coupled light. The laser beam profile and power characteristics are shown to agree with theory.

Applied Physics Letters, 2010

We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. ... more We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. In order to frequency convert these beams, the nonlinear process should be performed with the Fourier transform of the beam, rather than with the beam itself. This was confirmed experimentally by frequency doubling of one-dimensional and two-dimensional Airy beams in a periodically poled crystal. Sum-frequency or difference frequency process between two accelerating beam enable to set the acceleration rate and direction of the generated beam.

Applied Physics Letters, 2010

We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. ... more We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. In order to frequency convert these beams, the nonlinear process should be performed with the Fourier transform of the beam, rather than with the beam itself. This was confirmed experimentally by frequency doubling of one-dimensional and two-dimensional Airy beams in a periodically poled crystal. Sum-frequency or

Optics Letters, 2010

We present experimental control of the acceleration direction of Airy beams generated by nonlinea... more We present experimental control of the acceleration direction of Airy beams generated by nonlinear threewave mixing processes in an asymmetrically poled nonlinear photonic crystal. Changing the crystal temperature enabled us to switch the phase matching condition between second-harmonic generation and difference-frequency generation in the same nonlinear crystal and thereby to change the acceleration direction and the wavelength of the output Airy beam. All-optical control of the acceleration direction can be also realized at a fixed crystal temperature by using a tunable pump source and selecting the proper crystal poling period.

Considerable effort is directed towards the development of next-generation lithography processes,... more Considerable effort is directed towards the development of next-generation lithography processes, addressing the need for transistor densification to meet Moore's Law. The aggressive design rule shrinkage requires very tight process windows and induces various types of pattern failure with lithography process variations. Since the lithography process is critical in the wafer fabrication process, the requirements for high sensitivity defect detection

IEEE Convention of the Electrical and ELectronic Engineers in Israel, 2008

We present a new wavelength and temperature dependent refractive index equations for 0.5% MgO dop... more We present a new wavelength and temperature dependent refractive index equations for 0.5% MgO doped periodically poled stoichiometric LiTaO3 crystal for both extra-ordinary and ordinary polarizations. Our equations fit experimental data over a wide temperature (25-250°C) and spectral ranges: 0.35-6 ¿m for the extra-ordinary wave and 0.375-3.75 ¿m for the ordinary wave. The equations were cross validated with measurements of

Adoption of immersion technology to push printing resolution with existing wavelength (193nm) bri... more Adoption of immersion technology to push printing resolution with existing wavelength (193nm) brings to many concerns about defect controls on lithography process. Along with aggressive design rule shrinkage k1 factor of lithography process is close to 0.3 and this low k1 factor process results in very tight process window. Narrow process window easily induces various types of pattern failure with

Applied Physics B-lasers and Optics, 2009

We derive new temperature dependent Sellmeier equations for the extra-ordinary and ordinary refra... more We derive new temperature dependent Sellmeier equations for the extra-ordinary and ordinary refractive indices of 0.5% MgO-doped stoichiometric LiTaO3 crystal. The equations are based on quasi phase-matched frequency conversion measurements, as well as on interferometric measurements of the thermal expansion and thermal dispersion. These equations fit experimental data over wide spectral ranges: 0.35–6 μm for the extra-ordinary wave and 0.375–3.75 μm for

Metrology, Inspection, and Process Control for Microlithography XXI, 2007

As cell size of advanced memory is approaching to around 50nm hence the size of defect is require... more As cell size of advanced memory is approaching to around 50nm hence the size of defect is required to be detected is less than 30nm. In the array area best combinations of the inspection tool that can be achieved the maximum sensitivity through optics based are short wavelength, small pixel and collection from off-axis perspectives when the noise from pattern can be blocked. To remove the pattern noise efficiently and having enough defect signal to detector laser illumination is better approach than broadband lamp where lobe formation is not well defined and light intensity is not high enough. UVisionTM 3D channel which is off-axis collection of light from normal illumination was evaluated on array area of advanced memory design rules. Below 100nm node design rule 3D channel can successfully suppress the Customized Light Collection (CLC) lobes which are diffraction lobes from memory array pattern. In this paper we would like to report significant improvement of defect detection sensitivity through optimizing CLC lobe mask. It was developed to maximize the defect collection area and angle and showed improvements on defect detection through SNR and signal enhancement. Because of CLC lobe suppression's inverse relationship with device design rule the results show that the smaller design rule gives better defect signal detection capability.

SADP (Self Aligned Double Patterning) is one of the major options to be implemented to bridge the... more SADP (Self Aligned Double Patterning) is one of the major options to be implemented to bridge the lithography resolution gaps for 40 nm half pitch nodes and below. A natural concern for IC manufacturers when developing and/or implementing this kind of module is defectivity control strategy to ensure all defect sources are understood and an appropriate inspection strategy can be implemented to ensure high die yields. In this paper we will share a comprehensive study done to understand & characterize the major defect types in the SADP module developed by the Maydan Technology Center of Applied Materials. The implications of this work in terms of setting an optimized inspection strategy in the module will be discussed.

Frontiers in Optics 2010/Laser Science XXVI, 2010

ABSTRACT Frequency doubling of a surface plasmon-polariton in the metal-nonlinear dielectric boun... more ABSTRACT Frequency doubling of a surface plasmon-polariton in the metal-nonlinear dielectric boundary is analyzed. Phase matching can be achieved either by varying the metal thickness or periodically modulating the nonlinear coefficient of the crystal.

2010 12th International Conference on Transparent Optical Networks, 2010

Nonlinear photonic crystals are materials in which the second order susceptibility is modulated, ... more Nonlinear photonic crystals are materials in which the second order susceptibility is modulated, while the linear susceptibility remains constant. These structures are often used in nonlinear optics applications for compensating the phase mismatch between interacting waves. The progress in modulation techniques, mainly by electric field poling of ferroelectric crystals, enables to explore new applications, based on all-optical control of the

Metrology, Inspection, and Process Control for Microlithography XXV, 2011

ABSTRACT EUV mask metrology and inspection challenges as well as EUV patterned wafer metrology an... more ABSTRACT EUV mask metrology and inspection challenges as well as EUV patterned wafer metrology and inspection strategies must be addressed to enable EUV patterning for pilot and high volume production. In this work we present a defectivity analysis of defects from post EUV lithography and etch and the correlation between them on 40nm and 28nm half pitch (HP) line/space structures. The objective of the work was to study the lithography and etch process window vs. pitch as well as to characterize the performance of a DUV brightfield wafer inspection system on EUV stacks in order to detect EUV related DOI's. In addition to defect characterization for the lithography and etch layers, we present the results of scattering simulation from these layers, with polarized 266nm DUV illumination, to provide insight on the light-pattern interaction and on the critical detection parameters.

Metrology, Inspection, and Process Control for Microlithography XXIII, 2009

As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) have a ... more As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) have a dramatic effect on printed final lines and hence the need to control these parameters increases. Sources of CDU and LER variations include scanner auto-focus accuracy and ...

Metrology, Inspection, and Process Control for Microlithography XXV, 2011

Extreme ultraviolet (EUV) lithography is considered as the leading patterning technology beyond t... more Extreme ultraviolet (EUV) lithography is considered as the leading patterning technology beyond the ArF-based optical lithography, addressing the need for transistor densification to meet Moore's Law. Theoretically, EUV lithography at 13.5nm wavelength meets the resolution requirements for 1xnm technology nodes. However, there are several major challenges in the development of EUV lithography for mass production of advanced CMOS devices. These

16th International School on Quantum Electronics: Laser Physics and Applications, 2010

ABSTRACT Nonlinear photonic crystals are materials in which the second order susceptibility is mo... more ABSTRACT Nonlinear photonic crystals are materials in which the second order susceptibility is modulated. These structures are often used in nonlinear optics applications for compensating the phase mismatch between interacting waves. The progress in techniques of modulating the nonlinearity enables to explore new applications, based on all-optical control of the phase, amplitude and polarization of the nonlinearly generated waves. This enables the realization of functional nonlinear optical devices, such as nonlinear lenses, switches, polarization rotators, deflectors and beam shapers. Here we will discuss in detail two applications that are enabled by specially designed nonlinear photonic crystals: All optical polarization switching, and the generation, nonlinear mixing and manipulation of accelerating Airy beams.

Physical Review Letters, 2012

Surface plasmon polaritons and free-space beams are often coupled through periodic gratings. Here... more Surface plasmon polaritons and free-space beams are often coupled through periodic gratings. Here we show that by employing holographic-based techniques for modulating the grating, one can systematically control the amplitude and phase of the free-space beam. Alternatively, arbitrarily shaped surface plasmon can be generated. By using gratings with different periods for the input and output coupling, we obtain a planar beam transformer, whose resonance angles are related through a generalized form of the Bragg law. Specifically, we demonstrate the coupling of surface plasmon polaritons into focused free-space beams, as well as into accelerating Airy beams and vortex beams.

Physical Review Letters, 2012

We present the experimental observation of 1D and 2D self-accelerating nonlinear beams in quadrat... more We present the experimental observation of 1D and 2D self-accelerating nonlinear beams in quadratic media, which are also the first nonlinear self-accelerating beams in any symmetric nonlinearity. Notably, we show that the intensity peaks of the first and second harmonics are asynchronous with respect to one another, but the coupled harmonics exhibit joint acceleration within the nonlinear medium. Finally, we demonstrate the impact of self-healing effects on the jointly accelerating first and second harmonics.

Optics Letters, 2011

Whereas periodic gratings enable us to couple light into a surface plasmon polariton only at a sp... more Whereas periodic gratings enable us to couple light into a surface plasmon polariton only at a specific angle and wavelength, we show here that quasiperiodic gratings enable the coupling of light at multiple wavelengths and angles. The quasiperiodic grating can be designed in a systematic manner using the dual-grid method, thereby enabling us to control the coupling strength and grating dimensions. We verified the method experimentally by efficiently coupling light into a surface plasmon from several different illumination angles using a single quasiperiodic grating.

Optics Letters, 2008

We propose a novel all-optical, nonlinear mode-conversion scheme based on cascaded three-wave-mix... more We propose a novel all-optical, nonlinear mode-conversion scheme based on cascaded three-wave-mixing phase-matched interactions in quadratic nonlinear crystals. We demonstrate the method experimentally by performing all-optical mode conversion of an input 1636 nm Hermite-Gaussian mode from the zeroth order to the first order using two periodically poled LiNbO 3 crystals. Nonlinear mode conversion of an input beam into a higher order, orthogonally polarized output beam can be realized using only one quasiperiodic nonlinear structure. Moreover, it can be enhanced for conversion of complex modes, e.g., Laguerre-Gaussian or Bessel modes.

Optics Letters, 2011

A method to design lasers that emit an arbitrary beam profile is studied. In these lasers, output... more A method to design lasers that emit an arbitrary beam profile is studied. In these lasers, output-coupling is performed by a diffraction grating that imposes a phase and amplitude distribution onto the diffracted light. A solid-state laser emitting beams with a two-dimensional Airy intensity profile is demonstrated both theoretically and experimentally. In this case, the diffraction grating adds a transverse cubic phase to the diffracted light. An Airy beam is obtained by performing optical Fourier transform of the out-coupled light. The laser beam profile and power characteristics are shown to agree with theory.

Applied Physics Letters, 2010

We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. ... more We study three wave mixing processes of accelerating Airy beams in quadratic nonlinear crystals. In order to frequency convert these beams, the nonlinear process should be performed with the Fourier transform of the beam, rather than with the beam itself. This was confirmed experimentally by frequency doubling of one-dimensional and two-dimensional Airy beams in a periodically poled crystal. Sum-frequency or difference frequency process between two accelerating beam enable to set the acceleration rate and direction of the generated beam.