Gadi Greenberg - Academia.edu (original) (raw)
Papers by Gadi Greenberg
Proceedings of SPIE, Mar 13, 2009
As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) constit... more As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) constitute a higher percentage of the line-width and hence the need to control these parameters increases. Sources of CDU and LER variations include: scanner auto-focus accuracy and ...
Proceedings of SPIE, Mar 14, 2008
Minute variations in advanced VLSI manufacturing processes are well known to significantly impact... more Minute variations in advanced VLSI manufacturing processes are well known to significantly impact device performance and die yield. These variations drive the need for increased measurement sampling with a minimal impact on Fab productivity. Traditional discrete measurements ...
La presente invention concerne un procede et un dispositif de verification de la rectilinearite d... more La presente invention concerne un procede et un dispositif de verification de la rectilinearite des bords de motifs d'un reticule. En l'occurrence, on recherche dans les bords des motifs des dislocations localisees au niveau du groupe de pixels et non pas au niveau du pixel. Selon un mode de realisation, l'imagerie du reticule donne des pixels caracterises par leur niveau de gris et reperes par des coordonnees orthonormees en x et y. On identifie une petite matrice de pixels, en general une matrice de deux sur deux, se trouvant sur un bord du motif cible, puis un calcule un plan en x et y ainsi que le niveau de gris de chaque pixel de la matrice, ainsi qu'un angle α entre une ligne de reference et une ligne coupant le plan calcule, et enfin un plan de reference. On identifie d'autres matrices a cheval sur le bord, adjacentes de la premiere matrice, on calcule leurs angles α et on les compare entre eux. Si ces angles α sont sensiblement egaux, on en conclut que le...
PURPOSE: Integration of automatic and manual defect classification is provided to make a report i... more PURPOSE: Integration of automatic and manual defect classification is provided to make a report including distribution of a plurality of defects over the whole of a plurality of defect classes. CONSTITUTION: A memory stores a plurality of definitions about a plurality of defect classes as to each classification rule in the multi-dimensional feature space. A processor (802) receives test data related with a plurality of defects detected in one or more samples under test. The processor generates a plurality of first classification results by applying an automatic classification unit to the test data on the basis of the plurality of definitions. The plurality of first classification results includes a class level and a corresponding confidence level as to one defect of the plurality of defects, in order to make a report including definition about the plurality of defects over the whole of the plurality of defect classes. [Reference numerals] (200) Prediction system; (802) Processor; (804) Main memory; (806) Static memory; (808) Bus; (810) Video display; (812) Zero-number input device; (814) Cursor control device; (818) Data storage device; (822) Network interface device; (824) Machine-legible storage media; (826) Commands; (AA) Signal generating device; (BB) Network
PURPOSE: Optimization of unknown defect rejection for automatic defect classification is provided... more PURPOSE: Optimization of unknown defect rejection for automatic defect classification is provided to perform automated classification of defects on the basis of test data. CONSTITUTION: A computer system (800) receives confidence threshold for automatic classification of at least one defect related with class. The computer system selects the value of a parameter related with the confidence threshold. The computer system receives test data about a number of defects detected in one or more samples under test. The computer system classifies the defects about the class automatically, by using the selected value of the parameter and a kernel function. [Reference numerals] (200) Prediction system; (802) Processor; (804) Main memory; (806) Static memory; (808) Bus; (810) Video display; (812) Zero-number input device; (814) Cursor control device; (818) Data storage device; (822) Network interface device; (824) Machine-legible storage media; (826) Commands; (AA) Signal generating device; (BB) Network
And detecting the incoming reticle detection system and method for the complete and rapid detecti... more And detecting the incoming reticle detection system and method for the complete and rapid detection of a periodic and pre-exposure detect a phase shift mask reticle tulyong is available as a detection tool suitable for a mask shop customers by facilities such as the mask shop. The systems and methods of the present invention by obtaining an image of the phase shift mask under the same optical conditions as the exposure conditions (i. E., Wavelength, aperture, sigma, and illumination aperture type) detects a phase error of an aerial image. Images are compared in order to improve the phase error can be obtained as the positive and negative out-of-focus an out-of-focus. "Phase error", the term refers to the acceptable range by using the exposure system to achieve the image on the photoresist, and meets the requirements of the wafer specification, the phase deviation from the 180 ° phase shift mask on a program.
SPIE Proceedings, 1998
As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-wi... more As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-width variations becomes more vital in the quality control of advance reticle manufacturing processes. In this paper a new concept of operation is presented, for using an inspection ...
SPIE Proceedings, 1996
Mask inspection and real-time linewidth measurements. [Proceedings of SPIE 2884, 138 (1996)]. Yai... more Mask inspection and real-time linewidth measurements. [Proceedings of SPIE 2884, 138 (1996)]. Yair Eran, Gad Greenberg, Amnon Joseph. Abstract. Abstract not available.
SPIE Proceedings, 1997
The ability to inspect sub-micron features is an essential need for the manufacturing of advanced... more The ability to inspect sub-micron features is an essential need for the manufacturing of advanced reticles. The shrinking of the minimal line width and the need for detecting smaller defects present a challenge for die-to-database reticle inspection. To meet this challenge, ...
Photomask and X-Ray Mask Technology V, 1998
With the advance of photolithography technology into the super-resolution regime, reticle feature... more With the advance of photolithography technology into the super-resolution regime, reticle features are becoming denser and their dimensions are shrinking. This leads to much stricter design rules, which include a decrease in the dimensions of the critical defects needed to be detected. Orbot-Applied's new Improved Image Acquisition module has been developed as a means of meeting the rising demand in defect detection capability and integrated into RT-8000ES Die-to-Database reticle inspection system. The main purpose of this evaluation was to test the system's performance under difficult production conditions in its highest defect detection sensitivities.
Proceedings of SPIE, Mar 13, 2009
As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) constit... more As design rules shrink, Critical Dimension Uniformity (CDU) and Line Edge Roughness (LER) constitute a higher percentage of the line-width and hence the need to control these parameters increases. Sources of CDU and LER variations include: scanner auto-focus accuracy and ...
Proceedings of SPIE, Mar 14, 2008
Minute variations in advanced VLSI manufacturing processes are well known to significantly impact... more Minute variations in advanced VLSI manufacturing processes are well known to significantly impact device performance and die yield. These variations drive the need for increased measurement sampling with a minimal impact on Fab productivity. Traditional discrete measurements ...
La presente invention concerne un procede et un dispositif de verification de la rectilinearite d... more La presente invention concerne un procede et un dispositif de verification de la rectilinearite des bords de motifs d'un reticule. En l'occurrence, on recherche dans les bords des motifs des dislocations localisees au niveau du groupe de pixels et non pas au niveau du pixel. Selon un mode de realisation, l'imagerie du reticule donne des pixels caracterises par leur niveau de gris et reperes par des coordonnees orthonormees en x et y. On identifie une petite matrice de pixels, en general une matrice de deux sur deux, se trouvant sur un bord du motif cible, puis un calcule un plan en x et y ainsi que le niveau de gris de chaque pixel de la matrice, ainsi qu'un angle α entre une ligne de reference et une ligne coupant le plan calcule, et enfin un plan de reference. On identifie d'autres matrices a cheval sur le bord, adjacentes de la premiere matrice, on calcule leurs angles α et on les compare entre eux. Si ces angles α sont sensiblement egaux, on en conclut que le...
PURPOSE: Integration of automatic and manual defect classification is provided to make a report i... more PURPOSE: Integration of automatic and manual defect classification is provided to make a report including distribution of a plurality of defects over the whole of a plurality of defect classes. CONSTITUTION: A memory stores a plurality of definitions about a plurality of defect classes as to each classification rule in the multi-dimensional feature space. A processor (802) receives test data related with a plurality of defects detected in one or more samples under test. The processor generates a plurality of first classification results by applying an automatic classification unit to the test data on the basis of the plurality of definitions. The plurality of first classification results includes a class level and a corresponding confidence level as to one defect of the plurality of defects, in order to make a report including definition about the plurality of defects over the whole of the plurality of defect classes. [Reference numerals] (200) Prediction system; (802) Processor; (804) Main memory; (806) Static memory; (808) Bus; (810) Video display; (812) Zero-number input device; (814) Cursor control device; (818) Data storage device; (822) Network interface device; (824) Machine-legible storage media; (826) Commands; (AA) Signal generating device; (BB) Network
PURPOSE: Optimization of unknown defect rejection for automatic defect classification is provided... more PURPOSE: Optimization of unknown defect rejection for automatic defect classification is provided to perform automated classification of defects on the basis of test data. CONSTITUTION: A computer system (800) receives confidence threshold for automatic classification of at least one defect related with class. The computer system selects the value of a parameter related with the confidence threshold. The computer system receives test data about a number of defects detected in one or more samples under test. The computer system classifies the defects about the class automatically, by using the selected value of the parameter and a kernel function. [Reference numerals] (200) Prediction system; (802) Processor; (804) Main memory; (806) Static memory; (808) Bus; (810) Video display; (812) Zero-number input device; (814) Cursor control device; (818) Data storage device; (822) Network interface device; (824) Machine-legible storage media; (826) Commands; (AA) Signal generating device; (BB) Network
And detecting the incoming reticle detection system and method for the complete and rapid detecti... more And detecting the incoming reticle detection system and method for the complete and rapid detection of a periodic and pre-exposure detect a phase shift mask reticle tulyong is available as a detection tool suitable for a mask shop customers by facilities such as the mask shop. The systems and methods of the present invention by obtaining an image of the phase shift mask under the same optical conditions as the exposure conditions (i. E., Wavelength, aperture, sigma, and illumination aperture type) detects a phase error of an aerial image. Images are compared in order to improve the phase error can be obtained as the positive and negative out-of-focus an out-of-focus. "Phase error", the term refers to the acceptable range by using the exposure system to achieve the image on the photoresist, and meets the requirements of the wafer specification, the phase deviation from the 180 ° phase shift mask on a program.
SPIE Proceedings, 1998
As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-wi... more As design rules in high-end photo-lithographic reticles become tighter, the monitoring of line-width variations becomes more vital in the quality control of advance reticle manufacturing processes. In this paper a new concept of operation is presented, for using an inspection ...
SPIE Proceedings, 1996
Mask inspection and real-time linewidth measurements. [Proceedings of SPIE 2884, 138 (1996)]. Yai... more Mask inspection and real-time linewidth measurements. [Proceedings of SPIE 2884, 138 (1996)]. Yair Eran, Gad Greenberg, Amnon Joseph. Abstract. Abstract not available.
SPIE Proceedings, 1997
The ability to inspect sub-micron features is an essential need for the manufacturing of advanced... more The ability to inspect sub-micron features is an essential need for the manufacturing of advanced reticles. The shrinking of the minimal line width and the need for detecting smaller defects present a challenge for die-to-database reticle inspection. To meet this challenge, ...
Photomask and X-Ray Mask Technology V, 1998
With the advance of photolithography technology into the super-resolution regime, reticle feature... more With the advance of photolithography technology into the super-resolution regime, reticle features are becoming denser and their dimensions are shrinking. This leads to much stricter design rules, which include a decrease in the dimensions of the critical defects needed to be detected. Orbot-Applied's new Improved Image Acquisition module has been developed as a means of meeting the rising demand in defect detection capability and integrated into RT-8000ES Die-to-Database reticle inspection system. The main purpose of this evaluation was to test the system's performance under difficult production conditions in its highest defect detection sensitivities.