Joo Hyon Noh - Academia.edu (original) (raw)

Papers by Joo Hyon Noh

Research paper thumbnail of Field-induced activation of metal oxide semiconductor for low temperature flexible transparent electronic device applications

Bulletin of the American Physical Society, 2016

Field-induced activation of metal oxide semiconductor for low temperature flexible transparent el... more Field-induced activation of metal oxide semiconductor for low temperature flexible transparent electronic device applications PUSHPA RAJ PUDASAINI, JOO HYON NOH, ANTHONY WONG, AMADA HAGLUND, The University of Tennessee, THOMAS ZAC WARD, Materials Science and Technology Division, ORBL, Oak Ridge, TN 37831, USA, DAVID MANDRUS1, PHILIP RACK2, The University of Tennessee — Amorphous metal-oxide semiconductors have been extensively studied as an active channel material in thin film transistors due to their high carrier mobility, and excellent large-area uniformity. Here, we report the athermal activation of amorphous indium gallium zinc oxide semiconductor channels by an electric field-induced oxygen migration via gating through an ionic liquid. Using field-induced activation, a transparent flexible thin film transistor is demonstrated on a polyamide substrate with transistor characteristics having a current ON-OFF ratio exceeding 108, and saturation field effect mobility of 8.32 cm2/(V....

Research paper thumbnail of Tunable 3D Nanoresonators for Gas-Sensing Applications

Advanced Functional Materials, 2018

Research paper thumbnail of Amorphous Semiconductors: Ionic Liquid Activation of Amorphous Metal-Oxide Semiconductors for Flexible Transparent Electronic Devices (Adv. Funct. Mater. 17/2016)

Advanced Functional Materials, 2016

Research paper thumbnail of Surface modification of polytetrafluoroethylene using atmospheric pressure plasma jet for medical application

Surface and Coatings Technology, Feb 1, 2007

Research paper thumbnail of Ionic Liquid Activation of Amorphous Metal-Oxide Semiconductors for Flexible Transparent Electronic Devices

Advanced Functional Materials, 2016

Research paper thumbnail of Ionic Liquid versus SiO 2 Gated a-IGZO Thin Film Transistors: A Direct Comparison

ECS Journal of Solid State Science and Technology, 2015

ABSTRACT

Research paper thumbnail of Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Research paper thumbnail of Programmable Electrowetting with Channels and Droplets

Research paper thumbnail of High-performance and low-voltage pentacene thin film transistors fabricated on the flexible substrate

Semiconductor Science and Technology, 2007

ABSTRACT

Research paper thumbnail of P‐49: Investigation on Parallel Operating Characteristics of a Closed Microhollow Cathode Discharge for Direct Current Plasma Display Panels

SID Symposium Digest of Technical Papers, 2000

Open microhollow cathode discharge shows a flat (dV/dI=0) or negative behavior in current-voltage... more Open microhollow cathode discharge shows a flat (dV/dI=0) or negative behavior in current-voltage characteristics for the entire pressure (70 to 760 Torr). On the contrary, the closed microhollow cathode discharge of 200 μm hole diameter leads to a positive differential resistance, in the range of pressure (70 to 760 Torr), without the individual ballast resistance and the distributed resistor. Also for the closed microhollow cathode discharges, the microdischarge in 200 μm hole diameter results in parallel operation characteristics at pressures higher than in 500 μm opening because of the large resistance of discharge itself as well as the small power requirement for producing the plasma in a hole. Therefore, parallel operating characteristics of microhollow cathode discharge allows us to fabricate the DC plasma display panel with high pressure and low current density.

Research paper thumbnail of Pulse thermal processing for low thermal budget integration of IGZO thin film transistors

IEEE Journal of the Electron Devices Society, 2015

Research paper thumbnail of Ionic liquid gated IGZO thin film field effect transistors

Research paper thumbnail of Effect of atmospheric-plasma treatments for enhancing adhesion of Au on Parylène-C-coated protein chips

ABSTRACT We have developed a new passivation method of MEMS-based biosensors using parylene-c for... more ABSTRACT We have developed a new passivation method of MEMS-based biosensors using parylene-c for application of an electrical protein mass detection system in a liquid environment. Because the adhesion property of gold for protein-protein interactions on parylene-c is poor, we performed atmospheric-plasma treatment of the parylene-c surface for adhesion enhancement. The surface properties of the treated parylene-c surfaces were investigated by measuring the contact angle, calculating the surface energy, observing the microstructure with a scanning electron microscope images, measuring the root-mean-square (RMS) roughness, and performing tape-test analysis. The surface energy increase of parylene-c due to the atmospheric-plasma treatment was demonstrated using the water-drop method with water and formamide. An atmospheric-plasma treatment for 120 seconds was beneficial, resulting in a surface energy increase of gold on the parylene-c films. The adhesion improvement of gold on the parylene-c was attributed to increased grain size and increased RMS roughness.

Research paper thumbnail of Large area silicon dioxide deposition using rf atmospheric pressure glow discharge at low termperature

The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts., 2006

Abstract Summary form only given. RF APGD (atmospheric pressure glow discharge) is nonequilibrium... more Abstract Summary form only given. RF APGD (atmospheric pressure glow discharge) is nonequilibrium plasma and low temperature plasma. This plasma source is of interest for the deposition of materials because low temperature deposition without a vacuum system is ...

Research paper thumbnail of Purification of nanoscale electron-beam-induced platinum deposits via a pulsed laser-induced oxidation reaction

ACS applied materials & interfaces, Jan 10, 2014

Platinum-carbon deposits made via electron-beam-induced deposition were purified via a pulsed las... more Platinum-carbon deposits made via electron-beam-induced deposition were purified via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ∼485 K, and the purification rate is a function of the PtC5 thickness (80-360 nm) and laser pulse width (1-100 μs) in the ranges studied. The thickness dependence is attributed to the ∼235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.

Research paper thumbnail of Pulsed laser assisted focused electron beam induced etching of titanium with XeF2: enhanced reaction rate and precursor transport

ACS applied materials & interfaces, Jan 28, 2015

In order to enhance the etch rate of electron beam induced etching, we introduce a laser assisted... more In order to enhance the etch rate of electron beam induced etching, we introduce a laser assisted focused electron beam induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. The evolution of the etching process is correlated to in-situ stage current measurements and scanning electron micrographs as a function of time. The increased etch rate is attributed to photo-thermally enhanced Ti-F reaction and TiF4 desorption, and in some regimes enhanced XeF2 surface diffusion to the reaction zone.

Research paper thumbnail of Surface modification for adhesion enhancement of PET-laminated steel using atmospheric pressure plasma

Surface and Coatings Technology, 2007

Research paper thumbnail of Micromachined PZT cantilever based on SOI structure for low frequency vibration energy harvesting

Sensors and Actuators A: Physical, 2009

... Dongna Shen a , b , Jung-Hyun Park a , b , Joo Hyon Noh a , b , Song-Yul Choe b , Seung-Hyun ... more ... Dongna Shen a , b , Jung-Hyun Park a , b , Joo Hyon Noh a , b , Song-Yul Choe b , Seung-Hyun Kim c , Howard C. Wikle III a , b and Dong-Joo Kim a , b , Corresponding Author Contact Information , E-mail The Corresponding Author [Author vitae]. ...

Research paper thumbnail of High-Rate SiO 2 Deposition by Oxygen Cold Arc Plasma Jet at Atmospheric Pressure

Plasma Processes and Polymers, 2008

... Full Paper. High-Rate SiO 2 Deposition by Oxygen Cold Arc Plasma Jet at Atmospheric Pressure.... more ... Full Paper. High-Rate SiO 2 Deposition by Oxygen Cold Arc Plasma Jet at Atmospheric Pressure. Man H. Han 1 ,; Joo H. Noh 1 ,; Tae I. Lee 1 ,; Jai H. Choi 1 ,; Ki W. Park 1 ,; Hyeon S. Hwang 1 ,; Kie M. Song 2 ,; Hong K. Baik 1,*. ... Jub, YS Hwang, Surf. Coat. Technol. 2005, 193, 319 ...

Research paper thumbnail of Nanofabrication of insulated scanning probes for electromechanical imaging in liquid solutions

Nanotechnology, 2010

In this paper, the fabrication and electrical and electromechanical characterization of insulated... more In this paper, the fabrication and electrical and electromechanical characterization of insulated scanning probes have been demonstrated in liquid solutions. The silicon cantilevers were sequentially coated with chromium and silicon dioxide, and the silicon dioxide was selectively etched at the tip apex using focused-electron-beam-induced etching (FEBIE) with XeF(2). The chromium layer acted not only as the conductive path from the tip, but also as an etch-resistant layer. This insulated scanning probe fabrication process is compatible with any commercial AFM tip and can be used to easily tailor the scanning probe tip properties because FEBIE does not require lithography. The suitability of the fabricated probes is demonstrated by imaging of a standard topographical calibration grid as well as piezoresponse force microscopy (PFM) and electrical measurements in ambient and liquid environments.

Research paper thumbnail of Field-induced activation of metal oxide semiconductor for low temperature flexible transparent electronic device applications

Bulletin of the American Physical Society, 2016

Field-induced activation of metal oxide semiconductor for low temperature flexible transparent el... more Field-induced activation of metal oxide semiconductor for low temperature flexible transparent electronic device applications PUSHPA RAJ PUDASAINI, JOO HYON NOH, ANTHONY WONG, AMADA HAGLUND, The University of Tennessee, THOMAS ZAC WARD, Materials Science and Technology Division, ORBL, Oak Ridge, TN 37831, USA, DAVID MANDRUS1, PHILIP RACK2, The University of Tennessee — Amorphous metal-oxide semiconductors have been extensively studied as an active channel material in thin film transistors due to their high carrier mobility, and excellent large-area uniformity. Here, we report the athermal activation of amorphous indium gallium zinc oxide semiconductor channels by an electric field-induced oxygen migration via gating through an ionic liquid. Using field-induced activation, a transparent flexible thin film transistor is demonstrated on a polyamide substrate with transistor characteristics having a current ON-OFF ratio exceeding 108, and saturation field effect mobility of 8.32 cm2/(V....

Research paper thumbnail of Tunable 3D Nanoresonators for Gas-Sensing Applications

Advanced Functional Materials, 2018

Research paper thumbnail of Amorphous Semiconductors: Ionic Liquid Activation of Amorphous Metal-Oxide Semiconductors for Flexible Transparent Electronic Devices (Adv. Funct. Mater. 17/2016)

Advanced Functional Materials, 2016

Research paper thumbnail of Surface modification of polytetrafluoroethylene using atmospheric pressure plasma jet for medical application

Surface and Coatings Technology, Feb 1, 2007

Research paper thumbnail of Ionic Liquid Activation of Amorphous Metal-Oxide Semiconductors for Flexible Transparent Electronic Devices

Advanced Functional Materials, 2016

Research paper thumbnail of Ionic Liquid versus SiO 2 Gated a-IGZO Thin Film Transistors: A Direct Comparison

ECS Journal of Solid State Science and Technology, 2015

ABSTRACT

Research paper thumbnail of Nanoscale electron beam-induced deposition and purification of ruthenium for extreme ultraviolet lithography mask repair

Research paper thumbnail of Programmable Electrowetting with Channels and Droplets

Research paper thumbnail of High-performance and low-voltage pentacene thin film transistors fabricated on the flexible substrate

Semiconductor Science and Technology, 2007

ABSTRACT

Research paper thumbnail of P‐49: Investigation on Parallel Operating Characteristics of a Closed Microhollow Cathode Discharge for Direct Current Plasma Display Panels

SID Symposium Digest of Technical Papers, 2000

Open microhollow cathode discharge shows a flat (dV/dI=0) or negative behavior in current-voltage... more Open microhollow cathode discharge shows a flat (dV/dI=0) or negative behavior in current-voltage characteristics for the entire pressure (70 to 760 Torr). On the contrary, the closed microhollow cathode discharge of 200 μm hole diameter leads to a positive differential resistance, in the range of pressure (70 to 760 Torr), without the individual ballast resistance and the distributed resistor. Also for the closed microhollow cathode discharges, the microdischarge in 200 μm hole diameter results in parallel operation characteristics at pressures higher than in 500 μm opening because of the large resistance of discharge itself as well as the small power requirement for producing the plasma in a hole. Therefore, parallel operating characteristics of microhollow cathode discharge allows us to fabricate the DC plasma display panel with high pressure and low current density.

Research paper thumbnail of Pulse thermal processing for low thermal budget integration of IGZO thin film transistors

IEEE Journal of the Electron Devices Society, 2015

Research paper thumbnail of Ionic liquid gated IGZO thin film field effect transistors

Research paper thumbnail of Effect of atmospheric-plasma treatments for enhancing adhesion of Au on Parylène-C-coated protein chips

ABSTRACT We have developed a new passivation method of MEMS-based biosensors using parylene-c for... more ABSTRACT We have developed a new passivation method of MEMS-based biosensors using parylene-c for application of an electrical protein mass detection system in a liquid environment. Because the adhesion property of gold for protein-protein interactions on parylene-c is poor, we performed atmospheric-plasma treatment of the parylene-c surface for adhesion enhancement. The surface properties of the treated parylene-c surfaces were investigated by measuring the contact angle, calculating the surface energy, observing the microstructure with a scanning electron microscope images, measuring the root-mean-square (RMS) roughness, and performing tape-test analysis. The surface energy increase of parylene-c due to the atmospheric-plasma treatment was demonstrated using the water-drop method with water and formamide. An atmospheric-plasma treatment for 120 seconds was beneficial, resulting in a surface energy increase of gold on the parylene-c films. The adhesion improvement of gold on the parylene-c was attributed to increased grain size and increased RMS roughness.

Research paper thumbnail of Large area silicon dioxide deposition using rf atmospheric pressure glow discharge at low termperature

The 33rd IEEE International Conference on Plasma Science, 2006. ICOPS 2006. IEEE Conference Record - Abstracts., 2006

Abstract Summary form only given. RF APGD (atmospheric pressure glow discharge) is nonequilibrium... more Abstract Summary form only given. RF APGD (atmospheric pressure glow discharge) is nonequilibrium plasma and low temperature plasma. This plasma source is of interest for the deposition of materials because low temperature deposition without a vacuum system is ...

Research paper thumbnail of Purification of nanoscale electron-beam-induced platinum deposits via a pulsed laser-induced oxidation reaction

ACS applied materials & interfaces, Jan 10, 2014

Platinum-carbon deposits made via electron-beam-induced deposition were purified via a pulsed las... more Platinum-carbon deposits made via electron-beam-induced deposition were purified via a pulsed laser-induced oxidation reaction and erosion of the amorphous carbon to form pure platinum. Purification proceeds from the top down and is likely catalytically facilitated via the evolving platinum layer. Thermal simulations suggest a temperature threshold of ∼485 K, and the purification rate is a function of the PtC5 thickness (80-360 nm) and laser pulse width (1-100 μs) in the ranges studied. The thickness dependence is attributed to the ∼235 nm penetration depth of the PtC5 composite at the laser wavelength, and the pulse-width dependence is attributed to the increased temperatures achieved at longer pulse widths. Remarkably fast purification is realized at cumulative laser exposure times of less than 1 s.

Research paper thumbnail of Pulsed laser assisted focused electron beam induced etching of titanium with XeF2: enhanced reaction rate and precursor transport

ACS applied materials & interfaces, Jan 28, 2015

In order to enhance the etch rate of electron beam induced etching, we introduce a laser assisted... more In order to enhance the etch rate of electron beam induced etching, we introduce a laser assisted focused electron beam induced etching (LA-FEBIE) process which is a versatile, direct write nanofabrication method that allows nanoscale patterning and editing. The results demonstrate that the titanium electron stimulated etch rate via the XeF2 precursor can be enhanced up to a factor of 6 times with an intermittent pulsed laser assist. The evolution of the etching process is correlated to in-situ stage current measurements and scanning electron micrographs as a function of time. The increased etch rate is attributed to photo-thermally enhanced Ti-F reaction and TiF4 desorption, and in some regimes enhanced XeF2 surface diffusion to the reaction zone.

Research paper thumbnail of Surface modification for adhesion enhancement of PET-laminated steel using atmospheric pressure plasma

Surface and Coatings Technology, 2007

Research paper thumbnail of Micromachined PZT cantilever based on SOI structure for low frequency vibration energy harvesting

Sensors and Actuators A: Physical, 2009

... Dongna Shen a , b , Jung-Hyun Park a , b , Joo Hyon Noh a , b , Song-Yul Choe b , Seung-Hyun ... more ... Dongna Shen a , b , Jung-Hyun Park a , b , Joo Hyon Noh a , b , Song-Yul Choe b , Seung-Hyun Kim c , Howard C. Wikle III a , b and Dong-Joo Kim a , b , Corresponding Author Contact Information , E-mail The Corresponding Author [Author vitae]. ...

Research paper thumbnail of High-Rate SiO 2 Deposition by Oxygen Cold Arc Plasma Jet at Atmospheric Pressure

Plasma Processes and Polymers, 2008

... Full Paper. High-Rate SiO 2 Deposition by Oxygen Cold Arc Plasma Jet at Atmospheric Pressure.... more ... Full Paper. High-Rate SiO 2 Deposition by Oxygen Cold Arc Plasma Jet at Atmospheric Pressure. Man H. Han 1 ,; Joo H. Noh 1 ,; Tae I. Lee 1 ,; Jai H. Choi 1 ,; Ki W. Park 1 ,; Hyeon S. Hwang 1 ,; Kie M. Song 2 ,; Hong K. Baik 1,*. ... Jub, YS Hwang, Surf. Coat. Technol. 2005, 193, 319 ...

Research paper thumbnail of Nanofabrication of insulated scanning probes for electromechanical imaging in liquid solutions

Nanotechnology, 2010

In this paper, the fabrication and electrical and electromechanical characterization of insulated... more In this paper, the fabrication and electrical and electromechanical characterization of insulated scanning probes have been demonstrated in liquid solutions. The silicon cantilevers were sequentially coated with chromium and silicon dioxide, and the silicon dioxide was selectively etched at the tip apex using focused-electron-beam-induced etching (FEBIE) with XeF(2). The chromium layer acted not only as the conductive path from the tip, but also as an etch-resistant layer. This insulated scanning probe fabrication process is compatible with any commercial AFM tip and can be used to easily tailor the scanning probe tip properties because FEBIE does not require lithography. The suitability of the fabricated probes is demonstrated by imaging of a standard topographical calibration grid as well as piezoresponse force microscopy (PFM) and electrical measurements in ambient and liquid environments.