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Papers by Yong-Mo KIM

Research paper thumbnail of Deposition of TiN thin films using grid-assisting magnetron sputtering

Research paper thumbnail of Spatial characterization of Ar–Ti plasma in a magnetron sputtering system using emission and absorption spectroscopy

Plasma Sources Science and Technology, 2006

ABSTRACT We present experimental results of the spatial distribution of Ar and Ti optical emissio... more ABSTRACT We present experimental results of the spatial distribution of Ar and Ti optical emission and absorption lines in Ar–Ti plasma during sputtering of Ti. Measurements were performed in a dc magnetron reactor with movable planar magnetron using optical emission/absorption spectroscopy. A study was made for two different working pressures: 0.5 and 4 Pa. The results show that the intensity of emission lines decay exponentially with the increase in the distance from the target with two different decrements which correspond to the different parts of the discharge, namely the plasma region with a steep decay (up to about 1.5 cm from the target) and the 'far' region with a slow decay (more than 2 cm away from the target). Ti absorption data reveal similar behaviour. The emission decrement values which correspond to the steep decay of intensity lie in the range 1.4–3 cm−1, whereas those for slow decay group around 0.3 cm−1.

Research paper thumbnail of Use of optical absorption spectroscopy for the characterization of an Ar−Ti magnetron discharge

Metals and Materials International, 2007

Research paper thumbnail of Optical emission spectroscopy measurements within a single microdischarge of a dielectric barrier discharge actuator

Applied Physics Letters, 2013

This paper reports optical emission spectroscopy measurements resolved laterally within a single ... more This paper reports optical emission spectroscopy measurements resolved laterally within a single microdischarge during the negative half-cycle of a sinusoidally driven dielectric barrier discharge. The maximum values of the reduced electric field, vibrational temperature of N2(C3Πu), and rotational temperature of N2+(B2Σu+) were approximately 300 Td, 3500 K, and 1200 K, respectively. These values were correlated to the outer-edges of the microdischarge near the plasma-dielectric surface interface. These maximum values were significantly greater than measurements made elsewhere within the microdischarge and suggest a strong sheath at the outer-edges of the microdischarge.

Research paper thumbnail of Spatially resolved optical emission studies of pulsed D.C. plasmas for TiN deposition by unbalanced magnetron sputtering

Thin Solid Films, 2005

Two-dimensional images of optical emission intensities from plasmas, captured by an intensified c... more Two-dimensional images of optical emission intensities from plasmas, captured by an intensified charge coupled device (ICCD) camera at the viewing window of a plasma chamber, could be interpreted as the spatial distributions of excited species or ions. We report the use of ICCD images for the optical emission study of a pulsed D.C. plasma for TiN coatings by an unbalanced magnetron sputtering. The images through specific pass filters discerned the differences of the optical emission distribution of corresponding species. The Abel inversion was performed to convert the line-integrated intensity values, measured by ICCD, to the emissivity data. For the calibration of intensity measurement with an ICCD, the ratio of heights among the peaks in a spectral graph measured by a monochromator was used as the reference data. Especially the comparison between N 2 and Ti emission images of the region near the substrate surface is noticeable. The significant increase in the ratio of N 2 to Ti intensity with increasing nitrogen gas flow rate implied the transition of deposition mode.

Research paper thumbnail of Deposition of TiN thin films using grid-assisting magnetron sputtering

Research paper thumbnail of Spatial characterization of Ar–Ti plasma in a magnetron sputtering system using emission and absorption spectroscopy

Plasma Sources Science and Technology, 2006

ABSTRACT We present experimental results of the spatial distribution of Ar and Ti optical emissio... more ABSTRACT We present experimental results of the spatial distribution of Ar and Ti optical emission and absorption lines in Ar–Ti plasma during sputtering of Ti. Measurements were performed in a dc magnetron reactor with movable planar magnetron using optical emission/absorption spectroscopy. A study was made for two different working pressures: 0.5 and 4 Pa. The results show that the intensity of emission lines decay exponentially with the increase in the distance from the target with two different decrements which correspond to the different parts of the discharge, namely the plasma region with a steep decay (up to about 1.5 cm from the target) and the 'far' region with a slow decay (more than 2 cm away from the target). Ti absorption data reveal similar behaviour. The emission decrement values which correspond to the steep decay of intensity lie in the range 1.4–3 cm−1, whereas those for slow decay group around 0.3 cm−1.

Research paper thumbnail of Use of optical absorption spectroscopy for the characterization of an Ar−Ti magnetron discharge

Metals and Materials International, 2007

Research paper thumbnail of Optical emission spectroscopy measurements within a single microdischarge of a dielectric barrier discharge actuator

Applied Physics Letters, 2013

This paper reports optical emission spectroscopy measurements resolved laterally within a single ... more This paper reports optical emission spectroscopy measurements resolved laterally within a single microdischarge during the negative half-cycle of a sinusoidally driven dielectric barrier discharge. The maximum values of the reduced electric field, vibrational temperature of N2(C3Πu), and rotational temperature of N2+(B2Σu+) were approximately 300 Td, 3500 K, and 1200 K, respectively. These values were correlated to the outer-edges of the microdischarge near the plasma-dielectric surface interface. These maximum values were significantly greater than measurements made elsewhere within the microdischarge and suggest a strong sheath at the outer-edges of the microdischarge.

Research paper thumbnail of Spatially resolved optical emission studies of pulsed D.C. plasmas for TiN deposition by unbalanced magnetron sputtering

Thin Solid Films, 2005

Two-dimensional images of optical emission intensities from plasmas, captured by an intensified c... more Two-dimensional images of optical emission intensities from plasmas, captured by an intensified charge coupled device (ICCD) camera at the viewing window of a plasma chamber, could be interpreted as the spatial distributions of excited species or ions. We report the use of ICCD images for the optical emission study of a pulsed D.C. plasma for TiN coatings by an unbalanced magnetron sputtering. The images through specific pass filters discerned the differences of the optical emission distribution of corresponding species. The Abel inversion was performed to convert the line-integrated intensity values, measured by ICCD, to the emissivity data. For the calibration of intensity measurement with an ICCD, the ratio of heights among the peaks in a spectral graph measured by a monochromator was used as the reference data. Especially the comparison between N 2 and Ti emission images of the region near the substrate surface is noticeable. The significant increase in the ratio of N 2 to Ti intensity with increasing nitrogen gas flow rate implied the transition of deposition mode.

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