Lutz Kirste - Academia.edu (original) (raw)
Uploads
Papers by Lutz Kirste
CrystEngComm, 2016
In this paper, the optimal growth conditions during the physical vapour transport of bulk AlN cry... more In this paper, the optimal growth conditions during the physical vapour transport of bulk AlN crystals are evaluated with regard to significantly increased deep UV transparency, while maintaining the high structural quality of the AlN crystals which are grown on N-polar c-facets. We show that carbon concentration [C], oxygen concentration [O], and the ratio between both concentrations [C]/[O] have a significant influence on the deep UV transparency. At 3[C] < [O] with [C] + [O] < 1019 cm−3, deep UV transparent AlN single crystals with absorption coefficients at around 265 nm (α265nm) smaller than 15 cm−1 can be prepared. These conditions can be achieved in the N-polar grown volume parts of the AlN crystals using growth temperatures in the range of TG = 2030–2050 °C and tungsten and tantalum carbide as getter materials for carbon and oxygen, respectively. Deep UV transparent AlN substrates (α265nm < 30 cm−1) ≥10 mm in diameter and of high crystalline perfection (rocking curve FWHM < 15 arcsec) are shown for the first time.
Journal of Applied Physics, Jul 28, 2019
Applied Physics Letters, Mar 9, 2020
Physica Status Solidi A-applications and Materials Science, Dec 29, 2019
Applied Physics Letters, Nov 7, 2022
Journal of vacuum science & technology, May 1, 2022
Applied Surface Science, Jun 1, 2017
Journal of Applied Physics, Jan 14, 2020
Micromachines, Aug 8, 2022
Proceedings of SPIE, Oct 25, 2013
ABSTRACT We report on materials and technology development for short-wave infrared photodetectors... more ABSTRACT We report on materials and technology development for short-wave infrared photodetectors based on InGaAs p-i-n and avalanche photodiodes (APDs). Using molecular beam epitaxy for the growth of thin layers with abrupt interfaces, which are required for optimized APD structures, excellent crystalline quality has been achieved for detector structures grown on 3-inch InP substrates. For the fabrication of focal plane detector arrays, we employed a mesa etching technology in order to compare the results with the commonly utilized planar technology. Camera detector arrays as well as test structures with various sizes and geometries for materials and process characterization are processed using a dry-etch mesa technology. Aspects of the process development are presented along with measured dark-current and photo-current characteristics of the detector devices.
Semiconductor Science and Technology, Jan 22, 2021
AlScN/GaN epitaxial heterostructures have raised much interest in recent years, because of the hi... more AlScN/GaN epitaxial heterostructures have raised much interest in recent years, because of the high potential of such structures for high-frequency and high-power electronic applications. Compared to conventional AlGaN/GaN heterostructures, the high spontaneous and piezoelectric polarization of AlScN can yield to a five-time increase in sheet carrier density of the two-dimensional electron gas formed at the AlScN/GaN heterointerface. Very promising radio-frequency device performance has been shown on samples deposited by molecular beam epitaxy. Recently, AlScN/GaN heterostructures have been demonstrated, which were processed by the more industrial compatible growth method metal-organic chemical vapor deposition (MOCVD). In this work, SiN x passivated MOCVD-grown AlScN/GaN heterostructures with improved structural quality have been developed. Analytical transmission electron microscopy, secondary ion mass spectrometry and high-resolution x-ray diffraction analysis indicate the presence of undefined interfaces between the epitaxial layers and an uneven distribution of Al and Sc in the AlScN layer. However, AlScN-based high-electron-mobility transistors (HEMT) have been fabricated and compared with AlN/GaN HEMTs. The device characteristics of the AlScN-based HEMT are promising, showing a transconductance close to 500 mS mm−1 and a drain current above 1700 mA mm−1.
Physica Status Solidi A-applications and Materials Science, Jun 19, 2023
Proceedings of SPIE, Feb 12, 2009
Acta Physica Polonica A, Nov 1, 2011
Proceedings of SPIE, Feb 10, 2011
Journal of Crystal Growth, Apr 1, 2007
ABSTRACT
Proceedings of SPIE, May 13, 2011
InAs/GaSb-based type-II superlattice photodiodes have considerably gained interest as high-perfor... more InAs/GaSb-based type-II superlattice photodiodes have considerably gained interest as high-performance infrared detectors. Beside the excellent properties of InAs/GaSb superlattices, like the relatively high effective electron mass suppressing tunneling currents, the low Auger recombination rate, and a high quantum efficiency, the bandgap can be widely adjusted within the infrared spectral range from 3 - 30 mum depending on the layer thickness
Physica status solidi, Feb 29, 2012
CrystEngComm, 2016
In this paper, the optimal growth conditions during the physical vapour transport of bulk AlN cry... more In this paper, the optimal growth conditions during the physical vapour transport of bulk AlN crystals are evaluated with regard to significantly increased deep UV transparency, while maintaining the high structural quality of the AlN crystals which are grown on N-polar c-facets. We show that carbon concentration [C], oxygen concentration [O], and the ratio between both concentrations [C]/[O] have a significant influence on the deep UV transparency. At 3[C] < [O] with [C] + [O] < 1019 cm−3, deep UV transparent AlN single crystals with absorption coefficients at around 265 nm (α265nm) smaller than 15 cm−1 can be prepared. These conditions can be achieved in the N-polar grown volume parts of the AlN crystals using growth temperatures in the range of TG = 2030–2050 °C and tungsten and tantalum carbide as getter materials for carbon and oxygen, respectively. Deep UV transparent AlN substrates (α265nm < 30 cm−1) ≥10 mm in diameter and of high crystalline perfection (rocking curve FWHM < 15 arcsec) are shown for the first time.
Journal of Applied Physics, Jul 28, 2019
Applied Physics Letters, Mar 9, 2020
Physica Status Solidi A-applications and Materials Science, Dec 29, 2019
Applied Physics Letters, Nov 7, 2022
Journal of vacuum science & technology, May 1, 2022
Applied Surface Science, Jun 1, 2017
Journal of Applied Physics, Jan 14, 2020
Micromachines, Aug 8, 2022
Proceedings of SPIE, Oct 25, 2013
ABSTRACT We report on materials and technology development for short-wave infrared photodetectors... more ABSTRACT We report on materials and technology development for short-wave infrared photodetectors based on InGaAs p-i-n and avalanche photodiodes (APDs). Using molecular beam epitaxy for the growth of thin layers with abrupt interfaces, which are required for optimized APD structures, excellent crystalline quality has been achieved for detector structures grown on 3-inch InP substrates. For the fabrication of focal plane detector arrays, we employed a mesa etching technology in order to compare the results with the commonly utilized planar technology. Camera detector arrays as well as test structures with various sizes and geometries for materials and process characterization are processed using a dry-etch mesa technology. Aspects of the process development are presented along with measured dark-current and photo-current characteristics of the detector devices.
Semiconductor Science and Technology, Jan 22, 2021
AlScN/GaN epitaxial heterostructures have raised much interest in recent years, because of the hi... more AlScN/GaN epitaxial heterostructures have raised much interest in recent years, because of the high potential of such structures for high-frequency and high-power electronic applications. Compared to conventional AlGaN/GaN heterostructures, the high spontaneous and piezoelectric polarization of AlScN can yield to a five-time increase in sheet carrier density of the two-dimensional electron gas formed at the AlScN/GaN heterointerface. Very promising radio-frequency device performance has been shown on samples deposited by molecular beam epitaxy. Recently, AlScN/GaN heterostructures have been demonstrated, which were processed by the more industrial compatible growth method metal-organic chemical vapor deposition (MOCVD). In this work, SiN x passivated MOCVD-grown AlScN/GaN heterostructures with improved structural quality have been developed. Analytical transmission electron microscopy, secondary ion mass spectrometry and high-resolution x-ray diffraction analysis indicate the presence of undefined interfaces between the epitaxial layers and an uneven distribution of Al and Sc in the AlScN layer. However, AlScN-based high-electron-mobility transistors (HEMT) have been fabricated and compared with AlN/GaN HEMTs. The device characteristics of the AlScN-based HEMT are promising, showing a transconductance close to 500 mS mm−1 and a drain current above 1700 mA mm−1.
Physica Status Solidi A-applications and Materials Science, Jun 19, 2023
Proceedings of SPIE, Feb 12, 2009
Acta Physica Polonica A, Nov 1, 2011
Proceedings of SPIE, Feb 10, 2011
Journal of Crystal Growth, Apr 1, 2007
ABSTRACT
Proceedings of SPIE, May 13, 2011
InAs/GaSb-based type-II superlattice photodiodes have considerably gained interest as high-perfor... more InAs/GaSb-based type-II superlattice photodiodes have considerably gained interest as high-performance infrared detectors. Beside the excellent properties of InAs/GaSb superlattices, like the relatively high effective electron mass suppressing tunneling currents, the low Auger recombination rate, and a high quantum efficiency, the bandgap can be widely adjusted within the infrared spectral range from 3 - 30 mum depending on the layer thickness
Physica status solidi, Feb 29, 2012
IEEE Photonics Technology Letters, 2019
An indirect method to determine the internal polarization of a GaN/AlGaN-based quantum well is pr... more An indirect method to determine the internal polarization of a GaN/AlGaN-based quantum well is presented. The technique consists of carefully measuring the difference between the two lowest conduction subband levels under application of an electrical bias across the epitaxial layers. Due to a quantum confined Stark effect, the bound energy levels of the well show a strong frequency shift which depends on the size of the external field. Since this electric field was oriented oppositely to the internal polarization, partial screening of the latter occurred. By measuring these Stark shifts at three different fields, one was able to calculate the size of the internal polarization. Since the composition of the AlGaN barriers had previously been determined by X-ray diffraction, an extrapolated value of the internal polarization – as it would occur in a pure AlN/GaN interface – could be given. In agreement with the literature, a value of 720 MV/m was found.