Luz Areliz Espillco Romero - Academia.edu (original) (raw)
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Papers by Luz Areliz Espillco Romero
Chemical Vapor Deposition, 2015
Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass subs... more Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450°C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.
Surface and Coatings Technology, 2013
Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrates from the ... more Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrates from the electric field assisted aerosol chemical vapour deposition reaction of titanium isopropoxide in toluene at 450°C. The deposited films were characterised using scanning electron microscope, X-ray diffraction, Raman spectroscopy and UV/Vis spectroscopy. The photoactivity and hydrophilicity of deposited films were also analysed using an intelligent dye-ink test and water-contact angle measurements, respectively. The characterisation work revealed that the incorporation of electric fields influenced the film microstructure, preferential orientation and photocatalytic properties of titanium dioxide thin films. X-ray diffraction revealed that the application electric fields led to a change in the film preferential orientation from (200) to (004) and (211) planes depending on the applied field strength. The photocatalytic activity was calculated from the time needed by the films to degrade 90% of the dye-ink initial concentration (t 90). It was observed that all films prepared with an applied electric field showed increased photocatalytic activity compared to films produced with no electric field. The most photocatalytically active films had preferred orientation in the (004) plane.
Langmuir, 2013
Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrate from the e... more Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrate from the electric field assisted aerosol chemical vapor deposition (EACVD) reaction of titanium isopropoxide (TTIP, Ti(OC 3 H 7) 4) in toluene on glass substrates at a temperature of 450°C. DC electric fields were generated by applying a potential difference between the electrodes of the transparent coated oxide coated glass substrates during the deposition. The deposited films were characterized using scanning electron microscopy, X-ray diffraction, atomic force microscopy, Raman spectroscopy, and UV−vis spectroscopy. The photoactivity and hydrophilicity of the deposited films were also analyzed using a dyeink test and water-contact angle measurements. The characterization work revealed that the incorporation of DC electric fields produced significant reproducible changes in the film microstructure, preferred crystallographic orientation, roughness, and film thickness. Photocatalytic activity was calculated from the half-time (t 1/2) or time taken to degrade 50% of the initial resazurin dye concentration. A large improvement in photocatalytic activity was observed for films deposited using an electric field with a strong orientation in the (004) direction (t 1/2 17 min) as compared to a film deposited with no electric field (t 1/2 40 min).
Chemical Vapor Deposition, 2015
Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass subs... more Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450°C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.
Surface and Coatings Technology, 2013
Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrates from the ... more Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrates from the electric field assisted aerosol chemical vapour deposition reaction of titanium isopropoxide in toluene at 450°C. The deposited films were characterised using scanning electron microscope, X-ray diffraction, Raman spectroscopy and UV/Vis spectroscopy. The photoactivity and hydrophilicity of deposited films were also analysed using an intelligent dye-ink test and water-contact angle measurements, respectively. The characterisation work revealed that the incorporation of electric fields influenced the film microstructure, preferential orientation and photocatalytic properties of titanium dioxide thin films. X-ray diffraction revealed that the application electric fields led to a change in the film preferential orientation from (200) to (004) and (211) planes depending on the applied field strength. The photocatalytic activity was calculated from the time needed by the films to degrade 90% of the dye-ink initial concentration (t 90). It was observed that all films prepared with an applied electric field showed increased photocatalytic activity compared to films produced with no electric field. The most photocatalytically active films had preferred orientation in the (004) plane.
Langmuir, 2013
Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrate from the e... more Titanium dioxide thin films were deposited on fluorine doped tin oxide glass substrate from the electric field assisted aerosol chemical vapor deposition (EACVD) reaction of titanium isopropoxide (TTIP, Ti(OC 3 H 7) 4) in toluene on glass substrates at a temperature of 450°C. DC electric fields were generated by applying a potential difference between the electrodes of the transparent coated oxide coated glass substrates during the deposition. The deposited films were characterized using scanning electron microscopy, X-ray diffraction, atomic force microscopy, Raman spectroscopy, and UV−vis spectroscopy. The photoactivity and hydrophilicity of the deposited films were also analyzed using a dyeink test and water-contact angle measurements. The characterization work revealed that the incorporation of DC electric fields produced significant reproducible changes in the film microstructure, preferred crystallographic orientation, roughness, and film thickness. Photocatalytic activity was calculated from the half-time (t 1/2) or time taken to degrade 50% of the initial resazurin dye concentration. A large improvement in photocatalytic activity was observed for films deposited using an electric field with a strong orientation in the (004) direction (t 1/2 17 min) as compared to a film deposited with no electric field (t 1/2 40 min).