Marko Vogler - Academia.edu (original) (raw)

Papers by Marko Vogler

Research paper thumbnail of Dianhydrohexitole-Based Benzamidines: An Efficient Synthesis of New Factor Xa Inhibitors

Synthesis, 2004

... a) highly efficacious, orally active and selective fXa inhibitors result in smaller amounts o... more ... a) highly efficacious, orally active and selective fXa inhibitors result in smaller amounts of agent administered, (b) fXa has no known activity other than as a procoagulant, and (c) since fXa has slow activation kinetics, affecting its function should result in easier management of ...

Research paper thumbnail of Synthesis of Dianhydrohexitole-based Benzamidines as Factor Xa Inhibitors Using Cross Couplings, Phenyl Ether and Amidine Formations as Key Steps

Research paper thumbnail of Reduction of the release forces of polymers for thermal nil and their quantification

The 9th International Conference on Nanoimprint and Nanoprint Technology, Öresund, Copenhagen, 13... more The 9th International Conference on Nanoimprint and Nanoprint Technology, Öresund, Copenhagen, 13 - 15 Oct. 2010.

Research paper thumbnail of Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2014

ABSTRACT We report on our development strategy of photo-curable resists for nanoimprint lithograp... more ABSTRACT We report on our development strategy of photo-curable resists for nanoimprint lithography (NIL) based on modularity. Starting with a basic formulation, we address two topics: the integration of fluorinated additives and the enhancement of the dry etching stability. We prove both concepts by the introduction of two different resists derived from the same basic formulation. The viscosity of the novel resist materials was optimized for inkjet dispensing at room temperature (RT). The novel resist materials can be applied either in NIL batch processes or in high-throughput roller processes. Batch-wise imprints were performed on various substrates such as Si or plastics, demonstrating the distinctive application versatility of the novel materials. Dry etching of spincoated thin films on Si wafers was performed, demonstrating an etch stability versus Si of 3.5:1 by using the resist formulation with improved etching stability. Roll-to-roll NIL at high throughput on large areas was performed with web speeds of up to 30 mmin−1 with different stamp materials. We conclude that all resists reported herein can be deposited via inkjet dispensing at RT, are suitable for continuous high-throughput imprinting on flexible substrates, and are applicable in step-wise NIL processes with good etch resistance in dry etch processes.

Research paper thumbnail of Novel thermoplastic polymers with improved release properties for thermal NIL

Microelectronic Engineering, 2011

In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of ... more In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of the carefully designed special properties a resist may have, it has to come over this challenging process step to be employed in a NIL process. Generally, the moulds are coated with anti-sticking layers. Here, an alternative solution is developed by modification of two well-established NIL polymers through integration of fluorinated additives in their formulation. An effective additive concentration window was successfully defined, in which the substrate adhesion and imprint behaviour is not influenced. Defect-free patterning down to 30 nm is possible. A release force reduction of about 40% was observed with the modified polymer mr-I 7000R compared to the unmodified original.

Research paper thumbnail of <title>Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing</title>

Emerging Lithographic Technologies XI, 2007

ABSTRACT One of the key elements for the successful integration of nanoimprint lithography into i... more ABSTRACT One of the key elements for the successful integration of nanoimprint lithography into industrial production processes is the availability of high-performance resist materials. In this contribution we present a novel low-viscosity and fast curing UV-NIL polymer, which is applied by spin-coating and designed for wafer-scale imprinting. Systematic investigations of photocurable components and photoinitiators led to the formulation of the polymer system mr-UVCur06. Film thicknesses in the range of 50 - 500 nm with excellent quality and uniformity could be obtained by spin-coating. Its suitability for UV-NIL processes was evaluated by means of imprinting tests and plasma etching investigations. This included investigations on imprinting with hard moulds, UV curing doses, resolution, etch rates using various plasma gases and pattern transfer. The beneficial flow behaviour of mr-UVCur06 led to short UV-NIL cycle times. Patterns of several orders of magnitude with feature sizes in the range of 30 nm to several tens of micrometers could be imprinted simultaneously. An example of a pattern transfer into Si was shown, where mr-UVCur06 was used as an polymer etch mask.

Research paper thumbnail of Nanoimprint lithography of topology optimized photonic crystal devices

2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference, 2006

The optical performance of photonic crystal (PhC) components is highly sensitive to the nanometer... more The optical performance of photonic crystal (PhC) components is highly sensitive to the nanometer feature sizes of the components. Even small deviations may be devastating for the functionality and/or the target operating frequency. Recently, topology optimization has proven to be a ...

Research paper thumbnail of <title>Development of thermosets for thermal nanoimprint lithography at decreased temperatures</title>

Emerging Lithographic Technologies IX, 2005

Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint litho... more Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint lithography (NIL), since they cure as a consequence of heating during the imprint process. Thus they have the potential to enable NIL at comparatively low temperatures while the imprinted patterns concurrently show high thermal stability, in contrast to thermoplastic polymers, where the thermal behaviour of the imprinted patterns is closely related to the glass transition temperature (Tg) of the polymers. The use of allyl prepolymers for NIL was previously described, but only very few experimental data are known. In recent investigations on the application of allyl prepolymers for NIL a displacement of the patterns on the wafer has been observed after cooling down the imprinted polymer in the press. This could be avoided by detaching the stamp at the imprint temperature, i.e. without cooling down the press, which requires the polymer to be crosslinked to a great extent in this stage. Since high temperatures are necessary (150 °C - 190 °C), and the imprint time is still long, allyl prepolymers to be reported here have been modified aiming at a reduction of imprint temperature and time. The admixture of free-radical initiators increases the polymerization rate and allows the polymerization to start at lower temperatures. A reduced imprint temperature (100 °C) and shorter imprint time (10 min) are achieved. Additional polymer modification by plasticizers improves the material flow during the imprint due to a lower Tg. Recipes for polymer modifications have been found out, which result in thermally stable imprints under the specified processing conditions.

Research paper thumbnail of Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists

Alternative Lithographic Technologies VI, 2014

ABSTRACT The high throughput and large area nanostructuring of flexible substrates by continuous ... more ABSTRACT The high throughput and large area nanostructuring of flexible substrates by continuous roller processes has great potential for future custom applications like wire grid polarizers, antireflection films, or super-hydrophobic surfaces. For each application different material characteristicshave to be considered, e.g. refractive index, hydrophobicity, or dry etch stability. Herein, we show experimental results of nanoimprint lithography resist developments focusedon inkjetable and photo-curable resists suitable for high throughput production, especially roll-to-roll NIL. The inkjetdeposition of the novel materials is demonstrated by the use of different state-of-the-art inkjet printheads at room temperature. A plate-to-plate process on silicon substrates was successfully implemented on a NPS300 nano patterning stepper with previously inkjet dispensed NIL resist. Furthermore, we demonstrate a throughput of 30 m min-1in a roller NIL process on PET. Dry etching of unstructured thin films on Si wafers was performed, and it was demonstrated that the etch stability in Si is tunable to a value of 3.5:1 by aconcise selection of the resist components. The surface roughness of the etched films was measured to be &lt; 2 nm, after etching of around 100 nm of the resist films what is an essential factor for a low line edge roughness. All resists reported herein can be deposited via inkjet dispensing at room temperature, are suitable for continuous high throughput imprinting on flexible substrates, and are applicable in step-wise NIL processes with good etch resistance in dry etch processes.

Research paper thumbnail of Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

Microelectronic Engineering, 2007

There are two basic types of nanoimprint lithography: hot embossing using thermoplastic or thermo... more There are two basic types of nanoimprint lithography: hot embossing using thermoplastic or thermosetting polymers and UV-based nanoimprint lithography (UV-NIL) using UV-curable polymer systems. Since the interest in UV-NIL has been constantly increasing within the ...

Research paper thumbnail of <title>Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials</title>

24th European Mask and Lithography Conference, 2008

The motivation for the presented research was the known issue of very expansive UV transparent st... more The motivation for the presented research was the known issue of very expansive UV transparent stamps and moulds, which are necessary tools for UV-based patterning methods such as UV-based nanoimprint lithography, which has been developing as an attractive alternative lithography approach in recent 10 years. Low priced polymer working stamps could be an alternative to quartz as stamp material. UV transparent nanoimprint stamps were fabricated from sol-gel process-derived hybrid polymer, which has the benefit of high thermal, chemical and UV radiation stability. Tailored surface treatment and release agents were applied to ease the de-moulding process and secure the accuracy and fidelity of the transferred patterns. To increase the life time of the hybrid polymer nanoimprint stamps some adhesives between stamp substrate and the stamp material were used. The hybrid polymer stamps are compatible with NIL polymers and long-term stable even at elevated temperatures of thermal imprint processes.

Research paper thumbnail of Dianhydrohexitole-Based Benzamidines: An Efficient Synthesis of New Factor Xa Inhibitors

Synthesis, 2004

... a) highly efficacious, orally active and selective fXa inhibitors result in smaller amounts o... more ... a) highly efficacious, orally active and selective fXa inhibitors result in smaller amounts of agent administered, (b) fXa has no known activity other than as a procoagulant, and (c) since fXa has slow activation kinetics, affecting its function should result in easier management of ...

Research paper thumbnail of Synthesis of Dianhydrohexitole-based Benzamidines as Factor Xa Inhibitors Using Cross Couplings, Phenyl Ether and Amidine Formations as Key Steps

Research paper thumbnail of Reduction of the release forces of polymers for thermal nil and their quantification

The 9th International Conference on Nanoimprint and Nanoprint Technology, Öresund, Copenhagen, 13... more The 9th International Conference on Nanoimprint and Nanoprint Technology, Öresund, Copenhagen, 13 - 15 Oct. 2010.

Research paper thumbnail of Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2014

ABSTRACT We report on our development strategy of photo-curable resists for nanoimprint lithograp... more ABSTRACT We report on our development strategy of photo-curable resists for nanoimprint lithography (NIL) based on modularity. Starting with a basic formulation, we address two topics: the integration of fluorinated additives and the enhancement of the dry etching stability. We prove both concepts by the introduction of two different resists derived from the same basic formulation. The viscosity of the novel resist materials was optimized for inkjet dispensing at room temperature (RT). The novel resist materials can be applied either in NIL batch processes or in high-throughput roller processes. Batch-wise imprints were performed on various substrates such as Si or plastics, demonstrating the distinctive application versatility of the novel materials. Dry etching of spincoated thin films on Si wafers was performed, demonstrating an etch stability versus Si of 3.5:1 by using the resist formulation with improved etching stability. Roll-to-roll NIL at high throughput on large areas was performed with web speeds of up to 30 mmin−1 with different stamp materials. We conclude that all resists reported herein can be deposited via inkjet dispensing at RT, are suitable for continuous high-throughput imprinting on flexible substrates, and are applicable in step-wise NIL processes with good etch resistance in dry etch processes.

Research paper thumbnail of Novel thermoplastic polymers with improved release properties for thermal NIL

Microelectronic Engineering, 2011

In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of ... more In the nanoimprint lithography (NIL) process the mould release is a limiting step. Regardless of the carefully designed special properties a resist may have, it has to come over this challenging process step to be employed in a NIL process. Generally, the moulds are coated with anti-sticking layers. Here, an alternative solution is developed by modification of two well-established NIL polymers through integration of fluorinated additives in their formulation. An effective additive concentration window was successfully defined, in which the substrate adhesion and imprint behaviour is not influenced. Defect-free patterning down to 30 nm is possible. A release force reduction of about 40% was observed with the modified polymer mr-I 7000R compared to the unmodified original.

Research paper thumbnail of <title>Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing</title>

Emerging Lithographic Technologies XI, 2007

ABSTRACT One of the key elements for the successful integration of nanoimprint lithography into i... more ABSTRACT One of the key elements for the successful integration of nanoimprint lithography into industrial production processes is the availability of high-performance resist materials. In this contribution we present a novel low-viscosity and fast curing UV-NIL polymer, which is applied by spin-coating and designed for wafer-scale imprinting. Systematic investigations of photocurable components and photoinitiators led to the formulation of the polymer system mr-UVCur06. Film thicknesses in the range of 50 - 500 nm with excellent quality and uniformity could be obtained by spin-coating. Its suitability for UV-NIL processes was evaluated by means of imprinting tests and plasma etching investigations. This included investigations on imprinting with hard moulds, UV curing doses, resolution, etch rates using various plasma gases and pattern transfer. The beneficial flow behaviour of mr-UVCur06 led to short UV-NIL cycle times. Patterns of several orders of magnitude with feature sizes in the range of 30 nm to several tens of micrometers could be imprinted simultaneously. An example of a pattern transfer into Si was shown, where mr-UVCur06 was used as an polymer etch mask.

Research paper thumbnail of Nanoimprint lithography of topology optimized photonic crystal devices

2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference, 2006

The optical performance of photonic crystal (PhC) components is highly sensitive to the nanometer... more The optical performance of photonic crystal (PhC) components is highly sensitive to the nanometer feature sizes of the components. Even small deviations may be devastating for the functionality and/or the target operating frequency. Recently, topology optimization has proven to be a ...

Research paper thumbnail of <title>Development of thermosets for thermal nanoimprint lithography at decreased temperatures</title>

Emerging Lithographic Technologies IX, 2005

Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint litho... more Prepolymers formed from multifunctional allyl monomers can beneficially used in nanoimprint lithography (NIL), since they cure as a consequence of heating during the imprint process. Thus they have the potential to enable NIL at comparatively low temperatures while the imprinted patterns concurrently show high thermal stability, in contrast to thermoplastic polymers, where the thermal behaviour of the imprinted patterns is closely related to the glass transition temperature (Tg) of the polymers. The use of allyl prepolymers for NIL was previously described, but only very few experimental data are known. In recent investigations on the application of allyl prepolymers for NIL a displacement of the patterns on the wafer has been observed after cooling down the imprinted polymer in the press. This could be avoided by detaching the stamp at the imprint temperature, i.e. without cooling down the press, which requires the polymer to be crosslinked to a great extent in this stage. Since high temperatures are necessary (150 °C - 190 °C), and the imprint time is still long, allyl prepolymers to be reported here have been modified aiming at a reduction of imprint temperature and time. The admixture of free-radical initiators increases the polymerization rate and allows the polymerization to start at lower temperatures. A reduced imprint temperature (100 °C) and shorter imprint time (10 min) are achieved. Additional polymer modification by plasticizers improves the material flow during the imprint due to a lower Tg. Recipes for polymer modifications have been found out, which result in thermally stable imprints under the specified processing conditions.

Research paper thumbnail of Enabling large area and high throughput roll-to-roll NIL by novel inkjetable and photo-curable NIL resists

Alternative Lithographic Technologies VI, 2014

ABSTRACT The high throughput and large area nanostructuring of flexible substrates by continuous ... more ABSTRACT The high throughput and large area nanostructuring of flexible substrates by continuous roller processes has great potential for future custom applications like wire grid polarizers, antireflection films, or super-hydrophobic surfaces. For each application different material characteristicshave to be considered, e.g. refractive index, hydrophobicity, or dry etch stability. Herein, we show experimental results of nanoimprint lithography resist developments focusedon inkjetable and photo-curable resists suitable for high throughput production, especially roll-to-roll NIL. The inkjetdeposition of the novel materials is demonstrated by the use of different state-of-the-art inkjet printheads at room temperature. A plate-to-plate process on silicon substrates was successfully implemented on a NPS300 nano patterning stepper with previously inkjet dispensed NIL resist. Furthermore, we demonstrate a throughput of 30 m min-1in a roller NIL process on PET. Dry etching of unstructured thin films on Si wafers was performed, and it was demonstrated that the etch stability in Si is tunable to a value of 3.5:1 by aconcise selection of the resist components. The surface roughness of the etched films was measured to be &lt; 2 nm, after etching of around 100 nm of the resist films what is an essential factor for a low line edge roughness. All resists reported herein can be deposited via inkjet dispensing at room temperature, are suitable for continuous high throughput imprinting on flexible substrates, and are applicable in step-wise NIL processes with good etch resistance in dry etch processes.

Research paper thumbnail of Development of a novel, low-viscosity UV-curable polymer system for UV-nanoimprint lithography

Microelectronic Engineering, 2007

There are two basic types of nanoimprint lithography: hot embossing using thermoplastic or thermo... more There are two basic types of nanoimprint lithography: hot embossing using thermoplastic or thermosetting polymers and UV-based nanoimprint lithography (UV-NIL) using UV-curable polymer systems. Since the interest in UV-NIL has been constantly increasing within the ...

Research paper thumbnail of <title>Alternative approach to transparent stamps for UV-based nanoimprint lithography: techniques and materials</title>

24th European Mask and Lithography Conference, 2008

The motivation for the presented research was the known issue of very expansive UV transparent st... more The motivation for the presented research was the known issue of very expansive UV transparent stamps and moulds, which are necessary tools for UV-based patterning methods such as UV-based nanoimprint lithography, which has been developing as an attractive alternative lithography approach in recent 10 years. Low priced polymer working stamps could be an alternative to quartz as stamp material. UV transparent nanoimprint stamps were fabricated from sol-gel process-derived hybrid polymer, which has the benefit of high thermal, chemical and UV radiation stability. Tailored surface treatment and release agents were applied to ease the de-moulding process and secure the accuracy and fidelity of the transferred patterns. To increase the life time of the hybrid polymer nanoimprint stamps some adhesives between stamp substrate and the stamp material were used. The hybrid polymer stamps are compatible with NIL polymers and long-term stable even at elevated temperatures of thermal imprint processes.