Ronaldo Mansano - Academia.edu (original) (raw)

Papers by Ronaldo Mansano

Research paper thumbnail of Silicon wall profiles generated by isotropic dry etching processes

Monocrystalline silicon was etched isotropically in a Reactive ion Etching system to obtain deep ... more Monocrystalline silicon was etched isotropically in a Reactive ion Etching system to obtain deep trenches. The resulting profiles were analyzed and compared with profiles obtained from isotropic wet etching of silicon. When looking at a two-dimensional cross-section profile, both etching types yield similar results. However, when looking at the third dimension, one observes that the corners have a round shape for wet etching and remain sharp for dry etching processes. When etching trenches with depths of 80 μm, one observes that for dry etching processes, a re-entrant profile is obtained, what is not the case for wet etching. The first difference can be explained by a difference in etch rate limiting mechanism: reaction limited dry etching versus diffusion limited wet etching. The re-entrant profile can be explained by the lower local density of arriving reactive species just beneath the mask.

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Research paper thumbnail of Study of InN thin film for pulse oximeter application

Latin America Optics and Photonics Conference, 2018

During the last few years the interest in indium nitride (InN) semiconductor has been remarkable ... more During the last few years the interest in indium nitride (InN) semiconductor has been remarkable because this material is a small bandgap semiconductor and could be used for infrared applications and as an IR sensor. The objective of this study is the development of pulse oximeter sensor based in InN thin film deposited by RF magnetron sputtering. A Software was produced in Labview. Its function is to reproduce the results from pulse oximeter. The data are obtained through microcontroller arduino. LEDs with 850 nm and 632 nm were used in the measurement; oxy/deoxyhemoglobin ratio can be calculated from the ratio of the absorption of red and infrared light. An analysis of spectral response was performed.

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Research paper thumbnail of Comparative sterilization effectiveness of plasma in O2-H2O2 mixtures and ethylene oxide treatment

PDA journal of pharmaceutical science and technology

We investigated the influence of variable parameters of plasma sterilization and compared its eff... more We investigated the influence of variable parameters of plasma sterilization and compared its effectiveness with that of ethylene oxide using a reactive ion etching plasma reactor at 13.56 MHz. Gases tested were pure oxygen and oxygen-hydrogen peroxide mixtures in 190/10, 180/20, and 160/40 sccm ratios with constant gas flow at 200 sccm, pressure at 0.100 torr, radio-frequency power at 25 W, 50 W, 100 W, and 150 W, and temperature below 60 degrees C. Ethylene oxide sterilization was performed using 450 mg/L at 55 degrees C, 60% humidity, and -0.65 and 0.60 kgf/cm2 pressure. The biological indicator was Bacillus atrophaeus ATCC 9372, with exposure times of 3 to 120 min. Observed D values were 215.91, 55.55, 9.19, and 2.98 min for pure oxygen plasma at 25 W, 50 W, 100 W, and 150 W, respectively. Oxygen-hydrogen peroxide plasma produced D values of 6.41 min (190/10), 6.47 min (180/20), and 4.02 min (160/40) at 100 W and 1.47 min (190/10), 3.11 min (180/20), and 1.94 min (160/40) at 150...

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Research paper thumbnail of EFEITO DA RAZÃO DE MISTURA DE GASES N 2 /AR NA ESTRUTURA DE LIGAÇÃO NOS FILMES FINOS DE CN x PREPARADOS POR MAGNETRON SPUTTERING

1/1 lhe present \rork, we studied lhe e/rect (~rlhe N/Ar mixture ratio 0/1 lhe bonding structure ... more 1/1 lhe present \rork, we studied lhe e/rect (~rlhe N/Ar mixture ratio 0/1 lhe bonding structure of CN" .films prepared by reactive RF 11Iagnetron sputtering of a graphite target in a N2 and Ar plasma. The films, ~vpica/~v 100-160 n111thick. were deposited auto Si(/OO) substrates at a temperature of 90 Cc and at apressure of 0.../ 1'a. Fourier transform infrared spectroscopy spectra observed for ali lhe films indicated a prominent band at 2190 cm-I which is attributed to stretching mode of lhe C=.N triple bonding, thereby col!firming lhe carho/1 nitride formafion. lncreasing lhe N2,~4rralio resulfed in alI increase in film thickness. On lhe other hand, lhe intensi~v offhe 219() C/,,-I band initia/~v increased with increasing lhe N/'lr ralio and then became constanf with a further increase in N2Ulr ralio.

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Research paper thumbnail of Study of optical and electrical properties of nanostructured indium nitride films

– In this work, the optical and electric properties of nanostructured indium nitride (InN) films ... more – In this work, the optical and electric properties of nanostructured indium nitride (InN) films were studied. For this study, the films were deposited by reactive magnetron sputtering using a pure indium target and nitrogen and hydrogen as processing gases. The InN films are naturally nanostructured and show properties as photoemission in the visible/Infrared range and photoelectric effects. The characteristics of these films were observed by FTIR (Fourier Transform Infrared) analyzes, optical absorbance, electrooptic analyzes and high step meter analyzes. After these measurements, indium nitride films with best properties will be chosen for the development of a high sensibility photo detector.

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Research paper thumbnail of Comparative study between wet and dry etching of silicon for microchannels fabrication

In this work we present a comparative study of two processes for the fabrication of an array of m... more In this work we present a comparative study of two processes for the fabrication of an array of microchannels for microfluidics applications, based on integrated-circuit technology process steps, such as lithography and dry etching. Two different methods were investigated in order to study the resulting microstructures: wet and dry deep etching of silicon substrate. The typical etching depth necessary to the target application is 50 μm.

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Research paper thumbnail of Electrical and Optical properties of Diamond-Like Carbon ( DLC ) films deposited by reactive magnetron sputtering

The goal of this work was study the optical and electric properties of Diamond-like Carbon (DLC) ... more The goal of this work was study the optical and electric properties of Diamond-like Carbon (DLC) films. The films were deposited by reactive magnetron sputtering using a pure graphite target and methane as processing gas. The DLC films properties are consequences from the relation between sp, sp and sp hybridizations, which is consequence from the deposition technique and conditions. The optical and electric properties of DLC films are crucial for the development of electro-optical devices as photo detectors. The characteristics of these films were compared by refractive index, dielectric constant, optical reflectance, FTIR (Fourier Transform Infrared) analyzes and electro-optic analyzes. After this research, DLC film with the best properties will be chosen for the development of a high sensibility photo detector. Production of DLC has started at the end of the 60th decade and then has been produced by different deposition techniques for different applications [1], as electronic and...

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Research paper thumbnail of Fabricação De Cristais Fotônicos 2D Utilizando Litografia Holográfica e Plasma Rie

Neste trabalho, foi utilizada a tecnica de litografia holografica aliada a litografia por ion rea... more Neste trabalho, foi utilizada a tecnica de litografia holografica aliada a litografia por ion reativo (RIE) para fabricacao de cristais fotonicos bidimensionais em dois tipos diferentes de materiais: Si cristalino(100) e filmes de carbono amorfo hidrogenado(a-C:H).

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Research paper thumbnail of Caracterização de filmes finos de nitreto de carbono formados por RF magnetron sputtering

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Research paper thumbnail of Optical characterization of an amorphous- hydrogenated carbon film and its application in phase modulated diffractive optical elements

A four level, phase only modulated, diffractive optical element was designed, manufactured and ch... more A four level, phase only modulated, diffractive optical element was designed, manufactured and characterized. The active part of the device was made of a well defined topology in a hydrogenated amorphous carbon thin film. In order to develop the correct thin film etching process, it was necessary to determine the refractive index of the film. The refractive index of the glass substrate and the absorption of the film at the 633 nm wavelength were also measured. The device was manufactured using standard optical lithography and an oxygen plasma etching process. The resulting RMS roughness in the etched carbon film was less than 5 nm. In order to perform the optical characterization of the device, the power in the zero order diffracted beam and in the desired light pattern of a ring shaped hologram, specifically designed for this purpose, was measured. The speckle was extremely low and the (total) optical efficiency is as high as 95%, what is suitable for most real life applications.

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Research paper thumbnail of Obtention of polymeric membrane fuel cells by low pressure plasma technique: Evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support

Journal of Physics: Conference Series, 2015

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Research paper thumbnail of Replacement of Waveguides by a Resonant Cavity in a Microwave CVD Reactor

IEEE Transactions on Plasma Science

There are several configurations of a microwave chemical vapor deposition (MWCVD) reactor. The co... more There are several configurations of a microwave chemical vapor deposition (MWCVD) reactor. The common characteristic of this reactor is the presence of waveguides. We describe a method that replaces the waveguide, responsible for conducting electromagnetic waves, with a resonant cavity (RC) coupled to a low-pressure chamber. Using RCs over waveguides can help produce dense plasma, which can be used in dissociation processes as the reagents are forced to move within a cavity until they reach the reaction chamber. Based on the excellent performance of the system, it was possible to deposit silicon oxide (SiO2), with the aid of the argon gas mixture, oxygen, and tetraethylorthosilicate (TEOS), on a silicon substrate at room temperature. The film formed was analyzed using an interferometer and FTIR, concluding on the satisfactory quality of the film.

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Research paper thumbnail of Simple and Low-Cost Technique for Carbon Nanotube Synthesis

IEEE Transactions on Nanotechnology

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Research paper thumbnail of Simple and Low-Cost Technique for Carbon Nanotube Synthesis

IEEE Transactions on Nanotechnology

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Research paper thumbnail of Low-cost polymeric microlenses array

 A process for large-scale fabrication of an array of divergent cylindrical micro lenses is pres... more  A process for large-scale fabrication of an array of divergent cylindrical micro lenses is presented. The device was fabricated employing a silicon-based micromachined mould combined with a replication technique of PMMA spin casting and a suiting post baking cycle. The resulting device is capable to split an incoming laser beam at a high fan-out angle. Key-words  microlenses array, silicon-based micromould, polymer-based microlenses

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Research paper thumbnail of Silicon Surface Roughness Induced by Reactive Ion Etching Processes, Using a Graphite Electrode

Deep trenches were etched in silicon with SF 6 based plasmas in a RIE system, using a graphite el... more Deep trenches were etched in silicon with SF 6 based plasmas in a RIE system, using a graphite electrode. Depending on the process parameters, the resulting silicon surface at the bottom of the trench has different roughness levels. The most important parameter for creating this roughness is the DC self bias voltage : the roughness increases when the DC bias voltage becomes more negative. It is necessary to perform a HF dip before etching, to avoid that the native oxide induces severe roughness, mainly for processes with a low DC voltage. When Ar is added, the main roughness determining parameter remains the DC bias voltage. For these processes, polymer deposition will occur. This deposition process depends on the pressure and causes different types of roughness, as verified through SEM analysis. Processes with low DC bias voltage and preceded by a HF dip result in smooth silicon surfaces.

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Research paper thumbnail of Temperature Modulated Nanomechanical Thermal Analysis

IEEE Sensors Journal

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Research paper thumbnail of Use of Protek-PSB as structural material for MEMS: Measurement of elastic modulus

2016 31st Symposium on Microelectronics Technology and Devices (SBMicro), 2016

Protek-PSB is a polymer spin-on coating designed to replace silicon oxide and silicon nitride as ... more Protek-PSB is a polymer spin-on coating designed to replace silicon oxide and silicon nitride as hard mask in bulk wet anisotropic etch of silicon. The possibility of application of this material as structural material joins the benefits of low cost fabrication using wet etch with the polymer low cost and mechanical properties. To better evaluate the applicability of this material, we measured the elastic modulus of Protek-PSB coatings using the beam bending method with cantilevered beams of Protek-PSB. We found that the elastic modulus of this material is estimated in 3,10 ± 0,47 GPa, compatible with other polymeric coatings like SU-8.

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Research paper thumbnail of Microbial decontamination potential of gas-plasma in herbs

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Research paper thumbnail of Evaluation of microbicidial activity of Oxygen-containing plasmas using biological monitors with different lumen calibers

New technologies and sterilization agents for heat-sensitive materials are under intense investig... more New technologies and sterilization agents for heat-sensitive materials are under intense investigation. Plasma sterilization, an atoxic low-temperature substitute for conventional sterilization, uses various gases that are activated by an electrical discharge, generating reactive species that promote lethality in microorganisms. Here, assays were performed using pure O2 and O2+ H2O2 mixture gas plasmas against a standard load of Bacillus atrophaeus spores inoculated on glass carriers inside PVC catheters. The sterilization efficiency was studied as a function of plasma system (reactive ion etching or inductively coupled plasma), biological monitor lumen diameter, gas, radio frequency power, and sub-lethal exposition time. After sterilization, the biological monitors were disassembled and the surviving bacteria were grown in trypticase soy broth using the most probable number technique. Plasma antimicrobial activity depended on the catheter’s internal diameter and radio frequency pow...

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Research paper thumbnail of Silicon wall profiles generated by isotropic dry etching processes

Monocrystalline silicon was etched isotropically in a Reactive ion Etching system to obtain deep ... more Monocrystalline silicon was etched isotropically in a Reactive ion Etching system to obtain deep trenches. The resulting profiles were analyzed and compared with profiles obtained from isotropic wet etching of silicon. When looking at a two-dimensional cross-section profile, both etching types yield similar results. However, when looking at the third dimension, one observes that the corners have a round shape for wet etching and remain sharp for dry etching processes. When etching trenches with depths of 80 μm, one observes that for dry etching processes, a re-entrant profile is obtained, what is not the case for wet etching. The first difference can be explained by a difference in etch rate limiting mechanism: reaction limited dry etching versus diffusion limited wet etching. The re-entrant profile can be explained by the lower local density of arriving reactive species just beneath the mask.

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Research paper thumbnail of Study of InN thin film for pulse oximeter application

Latin America Optics and Photonics Conference, 2018

During the last few years the interest in indium nitride (InN) semiconductor has been remarkable ... more During the last few years the interest in indium nitride (InN) semiconductor has been remarkable because this material is a small bandgap semiconductor and could be used for infrared applications and as an IR sensor. The objective of this study is the development of pulse oximeter sensor based in InN thin film deposited by RF magnetron sputtering. A Software was produced in Labview. Its function is to reproduce the results from pulse oximeter. The data are obtained through microcontroller arduino. LEDs with 850 nm and 632 nm were used in the measurement; oxy/deoxyhemoglobin ratio can be calculated from the ratio of the absorption of red and infrared light. An analysis of spectral response was performed.

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Research paper thumbnail of Comparative sterilization effectiveness of plasma in O2-H2O2 mixtures and ethylene oxide treatment

PDA journal of pharmaceutical science and technology

We investigated the influence of variable parameters of plasma sterilization and compared its eff... more We investigated the influence of variable parameters of plasma sterilization and compared its effectiveness with that of ethylene oxide using a reactive ion etching plasma reactor at 13.56 MHz. Gases tested were pure oxygen and oxygen-hydrogen peroxide mixtures in 190/10, 180/20, and 160/40 sccm ratios with constant gas flow at 200 sccm, pressure at 0.100 torr, radio-frequency power at 25 W, 50 W, 100 W, and 150 W, and temperature below 60 degrees C. Ethylene oxide sterilization was performed using 450 mg/L at 55 degrees C, 60% humidity, and -0.65 and 0.60 kgf/cm2 pressure. The biological indicator was Bacillus atrophaeus ATCC 9372, with exposure times of 3 to 120 min. Observed D values were 215.91, 55.55, 9.19, and 2.98 min for pure oxygen plasma at 25 W, 50 W, 100 W, and 150 W, respectively. Oxygen-hydrogen peroxide plasma produced D values of 6.41 min (190/10), 6.47 min (180/20), and 4.02 min (160/40) at 100 W and 1.47 min (190/10), 3.11 min (180/20), and 1.94 min (160/40) at 150...

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Research paper thumbnail of EFEITO DA RAZÃO DE MISTURA DE GASES N 2 /AR NA ESTRUTURA DE LIGAÇÃO NOS FILMES FINOS DE CN x PREPARADOS POR MAGNETRON SPUTTERING

1/1 lhe present \rork, we studied lhe e/rect (~rlhe N/Ar mixture ratio 0/1 lhe bonding structure ... more 1/1 lhe present \rork, we studied lhe e/rect (~rlhe N/Ar mixture ratio 0/1 lhe bonding structure of CN" .films prepared by reactive RF 11Iagnetron sputtering of a graphite target in a N2 and Ar plasma. The films, ~vpica/~v 100-160 n111thick. were deposited auto Si(/OO) substrates at a temperature of 90 Cc and at apressure of 0.../ 1'a. Fourier transform infrared spectroscopy spectra observed for ali lhe films indicated a prominent band at 2190 cm-I which is attributed to stretching mode of lhe C=.N triple bonding, thereby col!firming lhe carho/1 nitride formafion. lncreasing lhe N2,~4rralio resulfed in alI increase in film thickness. On lhe other hand, lhe intensi~v offhe 219() C/,,-I band initia/~v increased with increasing lhe N/'lr ralio and then became constanf with a further increase in N2Ulr ralio.

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Research paper thumbnail of Study of optical and electrical properties of nanostructured indium nitride films

– In this work, the optical and electric properties of nanostructured indium nitride (InN) films ... more – In this work, the optical and electric properties of nanostructured indium nitride (InN) films were studied. For this study, the films were deposited by reactive magnetron sputtering using a pure indium target and nitrogen and hydrogen as processing gases. The InN films are naturally nanostructured and show properties as photoemission in the visible/Infrared range and photoelectric effects. The characteristics of these films were observed by FTIR (Fourier Transform Infrared) analyzes, optical absorbance, electrooptic analyzes and high step meter analyzes. After these measurements, indium nitride films with best properties will be chosen for the development of a high sensibility photo detector.

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Research paper thumbnail of Comparative study between wet and dry etching of silicon for microchannels fabrication

In this work we present a comparative study of two processes for the fabrication of an array of m... more In this work we present a comparative study of two processes for the fabrication of an array of microchannels for microfluidics applications, based on integrated-circuit technology process steps, such as lithography and dry etching. Two different methods were investigated in order to study the resulting microstructures: wet and dry deep etching of silicon substrate. The typical etching depth necessary to the target application is 50 μm.

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Research paper thumbnail of Electrical and Optical properties of Diamond-Like Carbon ( DLC ) films deposited by reactive magnetron sputtering

The goal of this work was study the optical and electric properties of Diamond-like Carbon (DLC) ... more The goal of this work was study the optical and electric properties of Diamond-like Carbon (DLC) films. The films were deposited by reactive magnetron sputtering using a pure graphite target and methane as processing gas. The DLC films properties are consequences from the relation between sp, sp and sp hybridizations, which is consequence from the deposition technique and conditions. The optical and electric properties of DLC films are crucial for the development of electro-optical devices as photo detectors. The characteristics of these films were compared by refractive index, dielectric constant, optical reflectance, FTIR (Fourier Transform Infrared) analyzes and electro-optic analyzes. After this research, DLC film with the best properties will be chosen for the development of a high sensibility photo detector. Production of DLC has started at the end of the 60th decade and then has been produced by different deposition techniques for different applications [1], as electronic and...

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Research paper thumbnail of Fabricação De Cristais Fotônicos 2D Utilizando Litografia Holográfica e Plasma Rie

Neste trabalho, foi utilizada a tecnica de litografia holografica aliada a litografia por ion rea... more Neste trabalho, foi utilizada a tecnica de litografia holografica aliada a litografia por ion reativo (RIE) para fabricacao de cristais fotonicos bidimensionais em dois tipos diferentes de materiais: Si cristalino(100) e filmes de carbono amorfo hidrogenado(a-C:H).

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Research paper thumbnail of Caracterização de filmes finos de nitreto de carbono formados por RF magnetron sputtering

Bookmarks Related papers MentionsView impact

Research paper thumbnail of Optical characterization of an amorphous- hydrogenated carbon film and its application in phase modulated diffractive optical elements

A four level, phase only modulated, diffractive optical element was designed, manufactured and ch... more A four level, phase only modulated, diffractive optical element was designed, manufactured and characterized. The active part of the device was made of a well defined topology in a hydrogenated amorphous carbon thin film. In order to develop the correct thin film etching process, it was necessary to determine the refractive index of the film. The refractive index of the glass substrate and the absorption of the film at the 633 nm wavelength were also measured. The device was manufactured using standard optical lithography and an oxygen plasma etching process. The resulting RMS roughness in the etched carbon film was less than 5 nm. In order to perform the optical characterization of the device, the power in the zero order diffracted beam and in the desired light pattern of a ring shaped hologram, specifically designed for this purpose, was measured. The speckle was extremely low and the (total) optical efficiency is as high as 95%, what is suitable for most real life applications.

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Research paper thumbnail of Obtention of polymeric membrane fuel cells by low pressure plasma technique: Evaluation of total cell efficiency by function on the amount of platinum and the thickness of the deposited carbon support

Journal of Physics: Conference Series, 2015

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Research paper thumbnail of Replacement of Waveguides by a Resonant Cavity in a Microwave CVD Reactor

IEEE Transactions on Plasma Science

There are several configurations of a microwave chemical vapor deposition (MWCVD) reactor. The co... more There are several configurations of a microwave chemical vapor deposition (MWCVD) reactor. The common characteristic of this reactor is the presence of waveguides. We describe a method that replaces the waveguide, responsible for conducting electromagnetic waves, with a resonant cavity (RC) coupled to a low-pressure chamber. Using RCs over waveguides can help produce dense plasma, which can be used in dissociation processes as the reagents are forced to move within a cavity until they reach the reaction chamber. Based on the excellent performance of the system, it was possible to deposit silicon oxide (SiO2), with the aid of the argon gas mixture, oxygen, and tetraethylorthosilicate (TEOS), on a silicon substrate at room temperature. The film formed was analyzed using an interferometer and FTIR, concluding on the satisfactory quality of the film.

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Research paper thumbnail of Simple and Low-Cost Technique for Carbon Nanotube Synthesis

IEEE Transactions on Nanotechnology

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Research paper thumbnail of Simple and Low-Cost Technique for Carbon Nanotube Synthesis

IEEE Transactions on Nanotechnology

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Research paper thumbnail of Low-cost polymeric microlenses array

 A process for large-scale fabrication of an array of divergent cylindrical micro lenses is pres... more  A process for large-scale fabrication of an array of divergent cylindrical micro lenses is presented. The device was fabricated employing a silicon-based micromachined mould combined with a replication technique of PMMA spin casting and a suiting post baking cycle. The resulting device is capable to split an incoming laser beam at a high fan-out angle. Key-words  microlenses array, silicon-based micromould, polymer-based microlenses

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Research paper thumbnail of Silicon Surface Roughness Induced by Reactive Ion Etching Processes, Using a Graphite Electrode

Deep trenches were etched in silicon with SF 6 based plasmas in a RIE system, using a graphite el... more Deep trenches were etched in silicon with SF 6 based plasmas in a RIE system, using a graphite electrode. Depending on the process parameters, the resulting silicon surface at the bottom of the trench has different roughness levels. The most important parameter for creating this roughness is the DC self bias voltage : the roughness increases when the DC bias voltage becomes more negative. It is necessary to perform a HF dip before etching, to avoid that the native oxide induces severe roughness, mainly for processes with a low DC voltage. When Ar is added, the main roughness determining parameter remains the DC bias voltage. For these processes, polymer deposition will occur. This deposition process depends on the pressure and causes different types of roughness, as verified through SEM analysis. Processes with low DC bias voltage and preceded by a HF dip result in smooth silicon surfaces.

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Research paper thumbnail of Temperature Modulated Nanomechanical Thermal Analysis

IEEE Sensors Journal

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Research paper thumbnail of Use of Protek-PSB as structural material for MEMS: Measurement of elastic modulus

2016 31st Symposium on Microelectronics Technology and Devices (SBMicro), 2016

Protek-PSB is a polymer spin-on coating designed to replace silicon oxide and silicon nitride as ... more Protek-PSB is a polymer spin-on coating designed to replace silicon oxide and silicon nitride as hard mask in bulk wet anisotropic etch of silicon. The possibility of application of this material as structural material joins the benefits of low cost fabrication using wet etch with the polymer low cost and mechanical properties. To better evaluate the applicability of this material, we measured the elastic modulus of Protek-PSB coatings using the beam bending method with cantilevered beams of Protek-PSB. We found that the elastic modulus of this material is estimated in 3,10 ± 0,47 GPa, compatible with other polymeric coatings like SU-8.

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Research paper thumbnail of Microbial decontamination potential of gas-plasma in herbs

Bookmarks Related papers MentionsView impact

Research paper thumbnail of Evaluation of microbicidial activity of Oxygen-containing plasmas using biological monitors with different lumen calibers

New technologies and sterilization agents for heat-sensitive materials are under intense investig... more New technologies and sterilization agents for heat-sensitive materials are under intense investigation. Plasma sterilization, an atoxic low-temperature substitute for conventional sterilization, uses various gases that are activated by an electrical discharge, generating reactive species that promote lethality in microorganisms. Here, assays were performed using pure O2 and O2+ H2O2 mixture gas plasmas against a standard load of Bacillus atrophaeus spores inoculated on glass carriers inside PVC catheters. The sterilization efficiency was studied as a function of plasma system (reactive ion etching or inductively coupled plasma), biological monitor lumen diameter, gas, radio frequency power, and sub-lethal exposition time. After sterilization, the biological monitors were disassembled and the surviving bacteria were grown in trypticase soy broth using the most probable number technique. Plasma antimicrobial activity depended on the catheter’s internal diameter and radio frequency pow...

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