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Papers by Samadarshi Maity

Journal of Chemical & Engineering Data

Molecular dynamics simulations are carried out to compute the intradiffusion coefficients of H 2 ... more Molecular dynamics simulations are carried out to compute the intradiffusion coefficients of H 2 and O 2 in H 2 O for temperatures ranging from 275.15 to 975.15 K and pressures ranging from 0.1 to 200 MPa. These conditions span vapor, liquid, and supercritical conditions. For the vast majority of the state points examined, experimental data are not available. The accuracy of six H 2 and six O 2 force fields is tested in reproducing the available experimentally measured densities, self-diffusivities, and shear viscosities of the pure gas and the intradiffusivity of the gas in H 2 O. Namely, we screen the H 2 force fields developed by Buch, Vrabec and co-workers, Hirschfelder et al., Cracknell, a modified Silvera−Goldman, and Marx and Nielaba. For O 2 , the force fields by Bohn et al., Miyano, Coon et al., Hansen et al., Vrabec et al., and Watanabe are tested. Overall, the force fields by Buch and Bohn for H 2 and O 2 , respectively, were found to perform the best, and combined with the TIP4P/2005 H 2 O force field are used to compute the intradiffusivities in the entire temperature and pressure range. The new data are used to develop an engineering model that can predict the H 2 and O 2 intradiffusivity in vapor, liquid, and supercritical H 2 O. The new model uses 11 parameters and has an accuracy of 4−11%. The model is validated with other available experimental and simulation data for H 2 and O 2 in H 2 O and pure H 2 O. Aside from the extensive collection of new data for the intradiffusivities of H 2 and O 2 in H 2 O, we present new data for the densities, shear viscosities, and self-diffusivities of pure TIP4P/ 2005 H 2 O in the same wide temperature and pressure range. The new data and the engineering model presented here can be used for the design and optimization of chemical processes, for which the knowledge of H 2 and O 2 diffusivities in H 2 O is important.

Journal of Chemical & Engineering Data

Molecular dynamics simulations are carried out to compute the intradiffusion coefficients of H 2 ... more Molecular dynamics simulations are carried out to compute the intradiffusion coefficients of H 2 and O 2 in H 2 O for temperatures ranging from 275.15 to 975.15 K and pressures ranging from 0.1 to 200 MPa. These conditions span vapor, liquid, and supercritical conditions. For the vast majority of the state points examined, experimental data are not available. The accuracy of six H 2 and six O 2 force fields is tested in reproducing the available experimentally measured densities, self-diffusivities, and shear viscosities of the pure gas and the intradiffusivity of the gas in H 2 O. Namely, we screen the H 2 force fields developed by Buch, Vrabec and co-workers, Hirschfelder et al., Cracknell, a modified Silvera−Goldman, and Marx and Nielaba. For O 2 , the force fields by Bohn et al., Miyano, Coon et al., Hansen et al., Vrabec et al., and Watanabe are tested. Overall, the force fields by Buch and Bohn for H 2 and O 2 , respectively, were found to perform the best, and combined with the TIP4P/2005 H 2 O force field are used to compute the intradiffusivities in the entire temperature and pressure range. The new data are used to develop an engineering model that can predict the H 2 and O 2 intradiffusivity in vapor, liquid, and supercritical H 2 O. The new model uses 11 parameters and has an accuracy of 4−11%. The model is validated with other available experimental and simulation data for H 2 and O 2 in H 2 O and pure H 2 O. Aside from the extensive collection of new data for the intradiffusivities of H 2 and O 2 in H 2 O, we present new data for the densities, shear viscosities, and self-diffusivities of pure TIP4P/ 2005 H 2 O in the same wide temperature and pressure range. The new data and the engineering model presented here can be used for the design and optimization of chemical processes, for which the knowledge of H 2 and O 2 diffusivities in H 2 O is important.