Hans-Werner Schmidt - Academia.edu (original) (raw)
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Papers by Hans-Werner Schmidt
Chemie Ingenieur Technik - CIT, 1996
Soft Matter, 2015
We demonstrate a novel approach for controlling the formation of line-defects in wrinkling patter... more We demonstrate a novel approach for controlling the formation of line-defects in wrinkling patterns by introducing step-like changes in the Young's modulus of elastomeric substrates supporting thin, stiff layers. Wrinkles are formed upon treating the poly(dimethylsiloxane) (PDMS) substrates by UV/Ozone (UVO) exposure in a uniaxially stretched state and subsequent relaxation. Line defects such as minutiae known from fingerprints are a typical feature in wrinkling patterns. The position where these defects occur is random for homogenous substrate elasticity and film thickness. However, we show that they can be predetermined by using PDMS substrates consisting of areas with different cross-linking densities.
We present an organic photorefractive material based on a low molar mass glass with both photocon... more We present an organic photorefractive material based on a low molar mass glass with both photoconductive and nonlinear optical properties. By implementing a novel plasticizer and doping with the well known sensitizer C60 we obtained a composite material, which shows extremely fast initial response times of 2.5 ms at writing beam intensities of Iwrite equals 1 W/cm2 and 450 microsecond(s)
... time. Author(s): Jayan Thomas; Muhsin Eralp; Savas Tay; Guogiang Li; Seth R. Marder; Gerald R... more ... time. Author(s): Jayan Thomas; Muhsin Eralp; Savas Tay; Guogiang Li; Seth R. Marder; Gerald R. Meredith; Axel Schulzgen; Robert A ... Hybrid integrated optics in volume holographic photopolymer. Author(s): Robert R. McLeod; Amy C. Sullivan; Matthew W. Grabowski; Timothy ...
Chemie Ingenieur Technik - CIT, 1996
Soft Matter, 2015
We demonstrate a novel approach for controlling the formation of line-defects in wrinkling patter... more We demonstrate a novel approach for controlling the formation of line-defects in wrinkling patterns by introducing step-like changes in the Young's modulus of elastomeric substrates supporting thin, stiff layers. Wrinkles are formed upon treating the poly(dimethylsiloxane) (PDMS) substrates by UV/Ozone (UVO) exposure in a uniaxially stretched state and subsequent relaxation. Line defects such as minutiae known from fingerprints are a typical feature in wrinkling patterns. The position where these defects occur is random for homogenous substrate elasticity and film thickness. However, we show that they can be predetermined by using PDMS substrates consisting of areas with different cross-linking densities.
We present an organic photorefractive material based on a low molar mass glass with both photocon... more We present an organic photorefractive material based on a low molar mass glass with both photoconductive and nonlinear optical properties. By implementing a novel plasticizer and doping with the well known sensitizer C60 we obtained a composite material, which shows extremely fast initial response times of 2.5 ms at writing beam intensities of Iwrite equals 1 W/cm2 and 450 microsecond(s)
... time. Author(s): Jayan Thomas; Muhsin Eralp; Savas Tay; Guogiang Li; Seth R. Marder; Gerald R... more ... time. Author(s): Jayan Thomas; Muhsin Eralp; Savas Tay; Guogiang Li; Seth R. Marder; Gerald R. Meredith; Axel Schulzgen; Robert A ... Hybrid integrated optics in volume holographic photopolymer. Author(s): Robert R. McLeod; Amy C. Sullivan; Matthew W. Grabowski; Timothy ...