Stanislav Hucek - Academia.edu (original) (raw)

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Papers by Stanislav Hucek

Research paper thumbnail of Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature

Plasma Processes and Polymers, Apr 1, 2007

Research paper thumbnail of Structural analyses of the calcium channel hTRPM2 with some electron microscopic methods

Research paper thumbnail of Structural analyses of the calcium channel hTRPM2 with some electron microscopic methods

Research paper thumbnail of Size Distribution Of Gold And Paladium Nanoparticles Measured In Cryo Fesem

Research paper thumbnail of Experiments to determine the escape probability of photoelectrons

Fresenius Journal of Analytical Chemistry, 1999

A novel experimental method for the assessment of the escape probability of photoelectrons as a f... more A novel experimental method for the assessment of the escape probability of photoelectrons as a function of depth and their mean escape depths is described and illustrated for photoelectrons leaving an aluminium oxide surface. The results are compared with those of the straight line approximation model calculations.

Research paper thumbnail of Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature

Plasma Processes and Polymers, 2007

TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Tit... more TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 °C under low energy ion bombardment.

Research paper thumbnail of Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature

Plasma Processes and Polymers, Apr 1, 2007

Research paper thumbnail of Structural analyses of the calcium channel hTRPM2 with some electron microscopic methods

Research paper thumbnail of Structural analyses of the calcium channel hTRPM2 with some electron microscopic methods

Research paper thumbnail of Size Distribution Of Gold And Paladium Nanoparticles Measured In Cryo Fesem

Research paper thumbnail of Experiments to determine the escape probability of photoelectrons

Fresenius Journal of Analytical Chemistry, 1999

A novel experimental method for the assessment of the escape probability of photoelectrons as a f... more A novel experimental method for the assessment of the escape probability of photoelectrons as a function of depth and their mean escape depths is described and illustrated for photoelectrons leaving an aluminium oxide surface. The results are compared with those of the straight line approximation model calculations.

Research paper thumbnail of Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature

Plasma Processes and Polymers, 2007

TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Tit... more TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 °C under low energy ion bombardment.

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