Stanislav Hucek - Academia.edu (original) (raw)
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Papers by Stanislav Hucek
Plasma Processes and Polymers, Apr 1, 2007
Fresenius Journal of Analytical Chemistry, 1999
A novel experimental method for the assessment of the escape probability of photoelectrons as a f... more A novel experimental method for the assessment of the escape probability of photoelectrons as a function of depth and their mean escape depths is described and illustrated for photoelectrons leaving an aluminium oxide surface. The results are compared with those of the straight line approximation model calculations.
Plasma Processes and Polymers, 2007
TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Tit... more TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 °C under low energy ion bombardment.
Plasma Processes and Polymers, Apr 1, 2007
Fresenius Journal of Analytical Chemistry, 1999
A novel experimental method for the assessment of the escape probability of photoelectrons as a f... more A novel experimental method for the assessment of the escape probability of photoelectrons as a function of depth and their mean escape depths is described and illustrated for photoelectrons leaving an aluminium oxide surface. The results are compared with those of the straight line approximation model calculations.
Plasma Processes and Polymers, 2007
TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Tit... more TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 °C under low energy ion bombardment.