Sylvain Guerber - Academia.edu (original) (raw)

Papers by Sylvain Guerber

Silicon photonics technological platforms are meant to generate derivative products and concurren... more Silicon photonics technological platforms are meant to generate derivative products and concurrently to benefit from the main advantages associated with CMOS platforms namely: high yield, system robustness, product reliability and large volume, low cost production. Nevertheless, a simultaneous innovative approach is to analogously take advantage from state-of-the-art fabrication methods and tools available in CMOS to develop new solutions and propose better performing devices to the platform.

IEEE Photonics Technology Letters, Oct 1, 2018

HAL is a multidisciplinary open access archive for the deposit and dissemination of scientific re... more HAL is a multidisciplinary open access archive for the deposit and dissemination of scientific research documents, whether they are published or not. The documents may come from teaching and research institutions in France or abroad, or from public or private research centers. L'archive ouverte pluridisciplinaire HAL, est destinée au dépôt et à la diffusion de documents scientifiques de niveau recherche, publiés ou non, émanant des établissements d'enseignement et de recherche français ou étrangers, des laboratoires publics ou privés.

We report a 256 channels 1D optical phased-array (OPA) based on plasma-dispersion effect. This sy... more We report a 256 channels 1D optical phased-array (OPA) based on plasma-dispersion effect. This system exhibits ultra-low power consumption (~1mW) revealing the potential of carrier-depletion scheme at low doping dose for solid-state LiDARs applications.

HAL (Le Centre pour la Communication Scientifique Directe), Apr 23, 2020

Increase of power consumption on integrated optical devices for photonic applications has encoura... more Increase of power consumption on integrated optical devices for photonic applications has encouraged material engineering to explore new materials and its properties. One of the main challenges on silicon photonics for optical applications is the hybrid integration of these materials due to the lattice mismatch imposed by silicon. In this regard, yttria-stabilized zirconia (YSZ) with a lattice parameter similar to silicon and several functional oxides has been widely studied [1]. Moreover, YSZ waveguides have demonstrated low propagation loss, and no two photon absorption (TPA). Furthermore, it is transparent from the ultraviolet to the near-infrared and exhibit good Kerr effect. It was recently demonstrated about 2 dB/cm propagation losses in waveguides etched on YSZ at a wavelength of 1380 nm [2]. In order to grow an active material as waveguide cladding, we doped YSZ with Er 3+ ions with a wavelength emission within the C-band of telecommunication window (=1530 nm). In our study, we have considered Er:YSZ cladding deposited by Pulsed Laser Deposition (PLD) on a hybrid SiN x waveguide. Moreover, we demonstrated guided emission for near-IR transitions of erbium ions under continuous-wave pump laser excitation at 1480 nm. Enhancement of Er 3+ ion output signal at 1530nm will be discussed and explored and preliminary optical gain will be presented.

HAL (Le Centre pour la Communication Scientifique Directe), May 21, 2019

Here we experimentally demonstrate two-octave spanning supercontinuum generation in nitrogen-rich... more Here we experimentally demonstrate two-octave spanning supercontinuum generation in nitrogen-rich silicon nitride waveguides fabricated through backend CMOS compatible processes. Experimental results are in good agreement with our numerical calculations.

HAL (Le Centre pour la Communication Scientifique Directe), Apr 24, 2019

Practically attractive nanophotonic technologies, mostly realized on mature silicon-on-insulator ... more Practically attractive nanophotonic technologies, mostly realized on mature silicon-on-insulator (SOI) substrates, call upon availability of efficient input/output grating-coupled optical interfaces. In this work, we demonstrate, both theoretically and experimentally, ultra-directional L-shaped grating couplers for low-loss light coupling between standard optical fibres and SOI chips. Experimentally, we show grating couplers without and with subwavelength (SWG) transition, seamlessly fabricated with a 193-nm deep-ultraviolet lithography. Coupling loss of-2.7 dB is measured with a low return loss as low as-20 dB. In addition, we propose an apodized Lshaped grating coupler layouts with coupling loss below 1 dB. Apodized fiber-chip grating couplers are designed with a sub-decibel coupling performance, together with substantially relaxed requirements in terms of minimum feature dimensions.

A two-octave spanning supercontinuum generation in the O-band communication window on an integrat... more A two-octave spanning supercontinuum generation in the O-band communication window on an integrated silicon nitride platform is reported. The nitrogen-rich silicon nitride waveguides were fabricated through low temperature processes on an industrial platform (<500°C). Numerical results are in good agreement with experimental results.

Uniform grating couplers based on versatile L-shaped waveguides are experimentally demonstrated, ... more Uniform grating couplers based on versatile L-shaped waveguides are experimentally demonstrated, with coupling loss of −2.7 dB and back-reflections of −20 dB. Apodized couplers with subwavelength-grating metamaterials predict improved fiber-chip coupling down to −0.46 dB within device layouts compatible with lithographic technologies available in nanophotonic foundries.

Fiber-chip grating couplers providing high-efficiency, robustness and cost-effectivity are recogn... more Fiber-chip grating couplers providing high-efficiency, robustness and cost-effectivity are recognized as a key building block for large-volume photonic applications. However, the efficiency of silicon-on-insulator (SOI) grating couplers is limited by the mismatch between the beam diffracted by the grating and the fiber mode, back-reflections at the grating-to-waveguide interface, and the power radiated towards the substrate. While the first two limitations can be overcome by grating apodization, the limited diffraction efficiency (directionality) towards the fiber remains a challenge. Typically, grating directionality is optimized by backside metallization, distributed Bragg mirrors, multi-level grating architectures or non-standard etching depths. However, these approaches yield comparatively complex structures, which in turn, come with the expense of extra fabrication costs, hindering the mass-scale development. Alternatively, the blazing effect has been exploited to provide remarkably high directionalities, relying on standard deep and shallow etch depths. Here, we report on the first experimental demonstration of an ultra-directional L-shaped fiber-chip grating coupler fabricated on 300 mm SOI wafer using 193-nm deep-ultraviolet lithography. The grating coupler is realized on a 300-nm-thick Si layer, combining standard full (300 nm) and shallow (150 nm) etch steps in an L-shaped arrangement. This approach yields a remarkably high grating directionality up to 98%. A single-step subwavelength-engineered transition provides an eight-fold reduction of the reflectivity, from ~8% to ~1%. We experimentally demonstrate a coupling efficiency of -2.7 dB, with a 3-dB bandwidth of 62 nm. These results open a new route towards exploiting the blazing effect for the large-volume realization of high-efficiency fiber-chip grating couplers in the low-cost 300 mm SOI photonic platform.

2023 23rd International Conference on Transparent Optical Networks (ICTON)

Smart Photonic and Optoelectronic Integrated Circuits 2023

2022 IEEE Photonics Conference (IPC)

Optical Fiber Communication Conference (OFC) 2022

In this paper we present the first integration of a 2D Optical Phased Array (OPA) for 905nm LIDAR... more In this paper we present the first integration of a 2D Optical Phased Array (OPA) for 905nm LIDAR applications on our 300mm SWIR photonic platform DAPHNE, based on Si & SiN components.

IEEE Conference Proceedings, 2017

2021 IEEE International Electron Devices Meeting (IEDM), 2021

In this paper we present the use of a 300mm Si-Photonic platform for applications beyond the data... more In this paper we present the use of a 300mm Si-Photonic platform for applications beyond the data communication. Beam steering and beam shaping for free-space-optics and hybrid III - V/ Si optical switch for computing applications are discussed.

Silicon Photonics XVII, 2022

Silicon nitride platforms based on ultra-low loss tightly confining waveguides present a great in... more Silicon nitride platforms based on ultra-low loss tightly confining waveguides present a great interest for a wide range of applications. We present our 200mm platform based on 800nm-thick LPCVD Si3N4 with optical losses below 5dB/m. It is completed with a set of photonic components specially developed for this platform: grating and edge fiber couplers, directional couplers, MMI, Y-junction, racetrack resonators and an AWG multiplexer. The Si3N4 platform and its device library are the basic building blocks for more complex circuits targeting advanced applications: LiDAR, microwave optics, quantum photonics, neuromorphic computing and sensors.

Optical Interconnects XXII, 2022

Integrated Optics: Devices, Materials, and Technologies XXVI, 2022

Journal of Lightwave Technology, 2022