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The thin nature of EUV (Extreme Ultraviolet) resist has posed significant challenges for etch pro... more The thin nature of EUV (Extreme Ultraviolet) resist has posed significant challenges for etch processes. In particular, EUV patterning combined with conventional etch approaches suffers from loss of pattern fidelity in the form of line breaks. A typical conventional etch approach prevents the etch process from having sufficient resist margin to control the trench CD (Critical Dimension), minimize the LWR (Line Width Roughness), LER (Line Edge Roughness) and reduce the T2T (Tip-to-Tip). Pre-etch deposition increases the resist budget by adding additional material to the resist layer, thus enabling the etch process to explore a wider set of process parameters to achieve better pattern fidelity. Preliminary tests with pre-etch deposition resulted in blocked isolated trenches. In order to mitigate these effects, a cyclic deposition and etch technique is proposed. With optimization of deposition and etch cycle time as well as total number of cycles, it is possible to open the underlying ...
Sante mentale au Quebec, 2018
Objectives The study aims to document the strategies used to facilitate the engagement of partici... more Objectives The study aims to document the strategies used to facilitate the engagement of participating receiving assertive community treatment (ACT) to a group cognitive-behavioral therapy for psychosis (CBTp) given for the first time in that context, and to describe the feasibility of this intervention with these consumers and the involved clinicians.Methods A group CBTp of 24 sessions has been delivered. Participants were recruited from both teams ACT of Laval, Quebec. Different strategies were elaborated and documented in order to promote participants' engagement to the therapy. Participants had to fill in the following questionnaires: Self-Esteem Rating Scale - Short Form; Brief Symptom Inventory; and Social Provision Scale before and after the therapy.Results The descriptive data show that the strategies from the Positive reinforcement category were the most used, closely followed by Materials and services, and then by the strategies that aim to compensate Memory problems....
To enable evolutionary improvements in semiconductor device performance, new low dielectric const... more To enable evolutionary improvements in semiconductor device performance, new low dielectric constant (K) materials are needed to replace silicon dioxide. Fluorocarbon films grown by pulsed plasma-enhanced chemical vapor deposition (pulsed PECVD) have been studied to evaluate their suitability as low K materials. Pulsed plasma excitation mitigates several disadvantages of continuous plasma operation by modulating between pulse on and pulse off states. This thesis explores the effect of pulsed plasma excitation on resultant film composition and materials properties for a variety of precursors, including hexafluoropropylene oxide (HFPO), CHF3, CH 2F2 , 1,1,2,2-C 2H2F4, and CHClF2. Both a conventional rf PECVD system and an electron cyclotron resonance (ECR) high density plasma system have been used for deposition. A series of films were deposited in the parallel plate plasma reactor from HFPO, CH2F2, and C2H2F4 , and analyzed using ellipsometry (deposition rates), electron spin resonan...
Université de Montréal À deux, c'est mieux: Étude pilote portant sur la faisabilité, l'acceptabil... more Université de Montréal À deux, c'est mieux: Étude pilote portant sur la faisabilité, l'acceptabilité et l'impact potentiel d'une intervention de groupe sur les relations amoureuses pour jeunes hommes ayant un trouble psychotique par Catherine Hache-Labelle Département de psychologie, Faculté des arts et des sciences Mémoire présenté en vue de l'obtention du grade de maîtrise ès sciences (M.Sc.) en psychologie Février 2019 ©, Catherine Hache-Labelle, 2019 i Résumé Objectif: Évaluer la faisabilité, l'acceptabilité et l'impact potentiel d'une intervention de groupe cognitive comportementale de 12 séances portant sur les relations amoureuses pour des jeunes hommes célibataires ayant un trouble psychotique. Méthode: Un format A-B-A intrasujets (n=7) où chaque participant est son propre contrôle. Des ANOVAs intra-sujets à mesures répétées ont été conduites pour comparer des facteurs pouvant contribuer aux difficultés à initier et maintenir une relation intime (meilleurs fonctionnement social, fonctionnement amoureux, estime de soi, théorie de l'esprit, et moins d'autostigmatisation) à travers le temps (6 temps de mesure). Résultats: La faisabilité et l'acceptabilité ont été établies. Quant à l'impact potentiel de l'intervention, des différences significatives dans le temps ont été trouvées pour les facteurs de fonctionnement social (sous-échelle «behaviors»), de fonctionnement amoureux et de la théorie de l'esprit (sous-échelle «mentalizing»). Aucune différence significative dans le temps n'a été trouvée pour les facteurs de fonctionnement social (sous-échelle «beliefs»), d'estime de soi, d'autostigmatisation et de la théorie de l'esprit (sous-échelle «reasoning»). Conclusion: Des études similaires de plus grande envergure avec des groupes contrôles devraient être faites afin de contribuer à aider davantage les jeunes hommes ayant un trouble psychotique dans leur développement social et amoureux.
Canadian Journal of Community Mental Health
People with psychotic disorders are at higher risk of not completing an educational degree and te... more People with psychotic disorders are at higher risk of not completing an educational degree and tend to get low-wage jobs. We offered computer coding classes to 14 participants. The training was deemed feasible, acceptable, and appeared to increase their motivation for school or work, not only in computer-related domains.
Journal of Nervous & Mental Disease
Abstract The inability to synthesize information into experience of self and others could be one ... more Abstract The inability to synthesize information into experience of self and others could be one significant cause of negative symptoms. To explore this possibility, we examined the relationships between baseline metacognition and concurrent and prospective negative symptoms controlling for verbal memory. The participants were 62 adults diagnosed with serious mental illness enrolled in outpatient treatment. Metacognition was measured with the Metacognitive Assessment Scale–Abbreviated, symptoms were assessed using the Brief Psychiatric Rating Scale, and verbal memory was assessed using the California Verbal Learning Test. Significant correlations were found, indicating that poorer overall metacognition was associated with greater levels of negative symptoms assessed concurrently (r = 0.39) and 1 month later (r = 0.36). A significant relationship persisted after controlling for verbal memory and education. These findings support the idea that metacognitive deficits are related to negative symptoms and point to the potential of metacognitive interventions to positively influence negative symptoms.
Early Intervention in Psychiatry
To assess the feasibility, acceptability and potential impact of a cognitive behavioural group in... more To assess the feasibility, acceptability and potential impact of a cognitive behavioural group intervention occurring over 12 sessions and focusing on romantic relationships for single men with early psychosis.
Journal of Aggression, Maltreatment & Trauma
Faculté des arts et des sciences Mémoire présenté en vue de l'obtention du grade de maîtrise ès S... more Faculté des arts et des sciences Mémoire présenté en vue de l'obtention du grade de maîtrise ès Sciences (M.Sc.
Journal of Abnormal Psychology
The stress-vulnerability-protective factors model is often used to explain the etiology and known... more The stress-vulnerability-protective factors model is often used to explain the etiology and known risk and protective factors of initial psychotic symptoms and symptomatic relapses. Over the past 40 years since its initial conception, the model has evolved and gathered a plethora of evidence of varying quality for its different components. The objective of this metareview is to analyze the quality of the evidence and the effect sizes for each component of the model not previously reviewed. Recent meta-analyses covering each component of the model in relation to the onset of psychotic symptoms or symptomatic relapse in schizophrenia were reviewed with the grading of recommendations, assessment, development, and evaluation system. Thirty-one meta-analyses were kept, from 3,044 papers reviewed. We did not add to previous metareviews in terms of obstetric/prenatal or genetic vulnerabilities. For stressors, moderate to strong research evidence was found for childhood adversity, cannabis, methamphetamine abuse, and expressed emotions as triggers of psychotic relapse or as linked to the onset of psychotic symptoms. For protective factors, moderate to strong evidence was found for antipsychotic medication in adults, family interventions, social skills training, as well as interventions focusing on recovery management skills. Poor evidence or no evidence (i.e., absence of meta-analyses) were found for the other components of the model. More rigorous studies and systematic reviews are needed in order to validate the various components of the model in regard to symptom onset and relapse. (PsycINFO Database Record (c) 2019 APA, all rights reserved).
MRS Proceedings
Ultra-thin ALD-TaN/PVD-Ta liners have been developed to prevent Cu diffusion into porous interlay... more Ultra-thin ALD-TaN/PVD-Ta liners have been developed to prevent Cu diffusion into porous interlayer dielectric (ILD) materials envisioned for future copper interconnections. The porous ultra-low k (p-ULK) film is prepared using the spin-on method, and typical k-value and the average pore size of p-ULK used in this paper are 2.3 and 2-3 nm, respectively. Interaction and phenomena at the ILD/ALD-TaN interface have been investigated, and the electrical measurements of samples with a bi-layered ALD-TaN/PVD-Ta barrier were performed after completing the metallization and CMP process.A deep penetration of ALD-TaN was observed on the as-deposited p-ULK, which is due to the interconnected pore structures. However, the surface of the p-ULK is drastically changed after the etch process, where changes are attributed to plasma damage and re-deposition of etched species. Pores can therefore be sealed during the etch process. Furthermore, the plasma damage makes the sidewall more hydrophilic, whi...
MRS Proceedings
Future microprocessor technologies will require interlayer dielectric (ILD) materials with a diel... more Future microprocessor technologies will require interlayer dielectric (ILD) materials with a dielectric constant (κ-value) less than 2.5. Organosilicate glass (OSG) materials must be nanoporous to meet this demand. However, the introduction of nanopores creates many integration challenges. These challenges include 1) integrating nanoporous films with low mechanical strength into conventional process flows, 2) managing etch profiles, 3) processinduced damage to the nanoporous ILD, and 4) controlling the metal/nanoporous ILD interface. This paper reviews research to maximize mechanical strength by engineering optimal pore structures, controlling trench bottom roughness induced by etching and understanding its relationship to pore size, repairing plasma damage using silylation chemistry, and sealing a nanoporous surface for barrier metal (liner) deposition.
The thin nature of EUV (Extreme Ultraviolet) resist has posed significant challenges for etch pro... more The thin nature of EUV (Extreme Ultraviolet) resist has posed significant challenges for etch processes. In particular, EUV patterning combined with conventional etch approaches suffers from loss of pattern fidelity in the form of line breaks. A typical conventional etch approach prevents the etch process from having sufficient resist margin to control the trench CD (Critical Dimension), minimize the LWR (Line Width Roughness), LER (Line Edge Roughness) and reduce the T2T (Tip-to-Tip). Pre-etch deposition increases the resist budget by adding additional material to the resist layer, thus enabling the etch process to explore a wider set of process parameters to achieve better pattern fidelity. Preliminary tests with pre-etch deposition resulted in blocked isolated trenches. In order to mitigate these effects, a cyclic deposition and etch technique is proposed. With optimization of deposition and etch cycle time as well as total number of cycles, it is possible to open the underlying ...
Sante mentale au Quebec, 2018
Objectives The study aims to document the strategies used to facilitate the engagement of partici... more Objectives The study aims to document the strategies used to facilitate the engagement of participating receiving assertive community treatment (ACT) to a group cognitive-behavioral therapy for psychosis (CBTp) given for the first time in that context, and to describe the feasibility of this intervention with these consumers and the involved clinicians.Methods A group CBTp of 24 sessions has been delivered. Participants were recruited from both teams ACT of Laval, Quebec. Different strategies were elaborated and documented in order to promote participants' engagement to the therapy. Participants had to fill in the following questionnaires: Self-Esteem Rating Scale - Short Form; Brief Symptom Inventory; and Social Provision Scale before and after the therapy.Results The descriptive data show that the strategies from the Positive reinforcement category were the most used, closely followed by Materials and services, and then by the strategies that aim to compensate Memory problems....
To enable evolutionary improvements in semiconductor device performance, new low dielectric const... more To enable evolutionary improvements in semiconductor device performance, new low dielectric constant (K) materials are needed to replace silicon dioxide. Fluorocarbon films grown by pulsed plasma-enhanced chemical vapor deposition (pulsed PECVD) have been studied to evaluate their suitability as low K materials. Pulsed plasma excitation mitigates several disadvantages of continuous plasma operation by modulating between pulse on and pulse off states. This thesis explores the effect of pulsed plasma excitation on resultant film composition and materials properties for a variety of precursors, including hexafluoropropylene oxide (HFPO), CHF3, CH 2F2 , 1,1,2,2-C 2H2F4, and CHClF2. Both a conventional rf PECVD system and an electron cyclotron resonance (ECR) high density plasma system have been used for deposition. A series of films were deposited in the parallel plate plasma reactor from HFPO, CH2F2, and C2H2F4 , and analyzed using ellipsometry (deposition rates), electron spin resonan...
Université de Montréal À deux, c'est mieux: Étude pilote portant sur la faisabilité, l'acceptabil... more Université de Montréal À deux, c'est mieux: Étude pilote portant sur la faisabilité, l'acceptabilité et l'impact potentiel d'une intervention de groupe sur les relations amoureuses pour jeunes hommes ayant un trouble psychotique par Catherine Hache-Labelle Département de psychologie, Faculté des arts et des sciences Mémoire présenté en vue de l'obtention du grade de maîtrise ès sciences (M.Sc.) en psychologie Février 2019 ©, Catherine Hache-Labelle, 2019 i Résumé Objectif: Évaluer la faisabilité, l'acceptabilité et l'impact potentiel d'une intervention de groupe cognitive comportementale de 12 séances portant sur les relations amoureuses pour des jeunes hommes célibataires ayant un trouble psychotique. Méthode: Un format A-B-A intrasujets (n=7) où chaque participant est son propre contrôle. Des ANOVAs intra-sujets à mesures répétées ont été conduites pour comparer des facteurs pouvant contribuer aux difficultés à initier et maintenir une relation intime (meilleurs fonctionnement social, fonctionnement amoureux, estime de soi, théorie de l'esprit, et moins d'autostigmatisation) à travers le temps (6 temps de mesure). Résultats: La faisabilité et l'acceptabilité ont été établies. Quant à l'impact potentiel de l'intervention, des différences significatives dans le temps ont été trouvées pour les facteurs de fonctionnement social (sous-échelle «behaviors»), de fonctionnement amoureux et de la théorie de l'esprit (sous-échelle «mentalizing»). Aucune différence significative dans le temps n'a été trouvée pour les facteurs de fonctionnement social (sous-échelle «beliefs»), d'estime de soi, d'autostigmatisation et de la théorie de l'esprit (sous-échelle «reasoning»). Conclusion: Des études similaires de plus grande envergure avec des groupes contrôles devraient être faites afin de contribuer à aider davantage les jeunes hommes ayant un trouble psychotique dans leur développement social et amoureux.
Canadian Journal of Community Mental Health
People with psychotic disorders are at higher risk of not completing an educational degree and te... more People with psychotic disorders are at higher risk of not completing an educational degree and tend to get low-wage jobs. We offered computer coding classes to 14 participants. The training was deemed feasible, acceptable, and appeared to increase their motivation for school or work, not only in computer-related domains.
Journal of Nervous & Mental Disease
Abstract The inability to synthesize information into experience of self and others could be one ... more Abstract The inability to synthesize information into experience of self and others could be one significant cause of negative symptoms. To explore this possibility, we examined the relationships between baseline metacognition and concurrent and prospective negative symptoms controlling for verbal memory. The participants were 62 adults diagnosed with serious mental illness enrolled in outpatient treatment. Metacognition was measured with the Metacognitive Assessment Scale–Abbreviated, symptoms were assessed using the Brief Psychiatric Rating Scale, and verbal memory was assessed using the California Verbal Learning Test. Significant correlations were found, indicating that poorer overall metacognition was associated with greater levels of negative symptoms assessed concurrently (r = 0.39) and 1 month later (r = 0.36). A significant relationship persisted after controlling for verbal memory and education. These findings support the idea that metacognitive deficits are related to negative symptoms and point to the potential of metacognitive interventions to positively influence negative symptoms.
Early Intervention in Psychiatry
To assess the feasibility, acceptability and potential impact of a cognitive behavioural group in... more To assess the feasibility, acceptability and potential impact of a cognitive behavioural group intervention occurring over 12 sessions and focusing on romantic relationships for single men with early psychosis.
Journal of Aggression, Maltreatment & Trauma
Faculté des arts et des sciences Mémoire présenté en vue de l'obtention du grade de maîtrise ès S... more Faculté des arts et des sciences Mémoire présenté en vue de l'obtention du grade de maîtrise ès Sciences (M.Sc.
Journal of Abnormal Psychology
The stress-vulnerability-protective factors model is often used to explain the etiology and known... more The stress-vulnerability-protective factors model is often used to explain the etiology and known risk and protective factors of initial psychotic symptoms and symptomatic relapses. Over the past 40 years since its initial conception, the model has evolved and gathered a plethora of evidence of varying quality for its different components. The objective of this metareview is to analyze the quality of the evidence and the effect sizes for each component of the model not previously reviewed. Recent meta-analyses covering each component of the model in relation to the onset of psychotic symptoms or symptomatic relapse in schizophrenia were reviewed with the grading of recommendations, assessment, development, and evaluation system. Thirty-one meta-analyses were kept, from 3,044 papers reviewed. We did not add to previous metareviews in terms of obstetric/prenatal or genetic vulnerabilities. For stressors, moderate to strong research evidence was found for childhood adversity, cannabis, methamphetamine abuse, and expressed emotions as triggers of psychotic relapse or as linked to the onset of psychotic symptoms. For protective factors, moderate to strong evidence was found for antipsychotic medication in adults, family interventions, social skills training, as well as interventions focusing on recovery management skills. Poor evidence or no evidence (i.e., absence of meta-analyses) were found for the other components of the model. More rigorous studies and systematic reviews are needed in order to validate the various components of the model in regard to symptom onset and relapse. (PsycINFO Database Record (c) 2019 APA, all rights reserved).
MRS Proceedings
Ultra-thin ALD-TaN/PVD-Ta liners have been developed to prevent Cu diffusion into porous interlay... more Ultra-thin ALD-TaN/PVD-Ta liners have been developed to prevent Cu diffusion into porous interlayer dielectric (ILD) materials envisioned for future copper interconnections. The porous ultra-low k (p-ULK) film is prepared using the spin-on method, and typical k-value and the average pore size of p-ULK used in this paper are 2.3 and 2-3 nm, respectively. Interaction and phenomena at the ILD/ALD-TaN interface have been investigated, and the electrical measurements of samples with a bi-layered ALD-TaN/PVD-Ta barrier were performed after completing the metallization and CMP process.A deep penetration of ALD-TaN was observed on the as-deposited p-ULK, which is due to the interconnected pore structures. However, the surface of the p-ULK is drastically changed after the etch process, where changes are attributed to plasma damage and re-deposition of etched species. Pores can therefore be sealed during the etch process. Furthermore, the plasma damage makes the sidewall more hydrophilic, whi...
MRS Proceedings
Future microprocessor technologies will require interlayer dielectric (ILD) materials with a diel... more Future microprocessor technologies will require interlayer dielectric (ILD) materials with a dielectric constant (κ-value) less than 2.5. Organosilicate glass (OSG) materials must be nanoporous to meet this demand. However, the introduction of nanopores creates many integration challenges. These challenges include 1) integrating nanoporous films with low mechanical strength into conventional process flows, 2) managing etch profiles, 3) processinduced damage to the nanoporous ILD, and 4) controlling the metal/nanoporous ILD interface. This paper reviews research to maximize mechanical strength by engineering optimal pore structures, controlling trench bottom roughness induced by etching and understanding its relationship to pore size, repairing plasma damage using silylation chemistry, and sealing a nanoporous surface for barrier metal (liner) deposition.