huizhong jia - Academia.edu (original) (raw)
Papers by huizhong jia
In this paper a new method is developed to deposit magnetic films on flexible substrates. The mag... more In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates. By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples were characterized by magnetic measurements (hysteresis curve , remanence and measure- ments), and by XRD and AFM.
Magnetic Interactions in CoCr/Cr Thin Films Sputtered with Different Gases HZ Jia / J. Veldeman /... more Magnetic Interactions in CoCr/Cr Thin Films Sputtered with Different Gases HZ Jia / J. Veldeman / M. Burgelman University of Gent, Electronics and Information Systems (ELIS), B-9000 Gent, Belgium Abstract Magnetic properties are studied within the thin CoggCr^/Cr films ...
In this paper a new method is developed to deposit magnetic films on flexible substrates. The mag... more In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates. By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples mere characterized by magnetic measurements [hysteresis curve (H/sub c/, M/sub r/, M/sub s/), remanence and /spl delta/M measurements], and by XRD and AFM.
Neural Computing and Applications
SID Symposium Digest of Technical Papers
Fourth International Conference on Thin Film Physics and Applications, 2000
ICDT 2018, 2018
In order to monitor any thermal environment variations, specifically with variation of temperatur... more In order to monitor any thermal environment variations, specifically with variation of temperature, an augmented reality (AR) device based on android system has been designed for mass production. Dual on-device cameras have been implemented. One is the normal camera with 13 M resolution; the other is a thermal camera with the resolution of 80*60. With such real time function, the AR device could be applied in different industry area such as industrial inspection and maintenance, fire detection, intelligent aquaculture, and intelligent medical treatment. By the help of real time thermal data, the user could obtain the real time temperature variations in the dedicated environment. These data could be sent to the center work station device for history analysis via wireless connections with WIFI and Bluetooth.
… : vision for the …, Jan 1, 1994
Proceedings of SPIE, Jan 1, 2000
In order to improve the magnetic properties of Co-based thin films, different seedlayers (SiO, IT... more In order to improve the magnetic properties of Co-based thin films, different seedlayers (SiO, ITO, SiO, Ag and Al) have been applied on a PET substrate. The thickness of Cr underlayers and of magnetic layers is varied to obtain thin films with optimal magnetic properties. The ...
Physica B: Condensed Matter, Jan 1, 2000
The aim of this work is to investigate the in#uence of the magnetron con"guration on the magnetic... more The aim of this work is to investigate the in#uence of the magnetron con"guration on the magnetic interactions in DC magnetron sputtered Cr/Co Cr "lms on a PET substrate. The sputter pressure is used as an extra parameter. Four di!erent magnetron con"gurations were investigated, two of type I and two of type II. With a type I magnetron the optimum sputter pressure is lower than with a type II magnetron. In type I con"gurations (low ion bombardment) the optimum sputter pressure is determined by an optimum voided structure. In type II magnetrons a high ion bombardment shifts the optimum voided structure to higher sputter pressures due to the compensation of the shadowing e!ect during sputtering. The optimum voided structure is characterised by remanence and AFM measurements.
Surface science, Jan 1, 2000
The aim of this work is to investigate the influence of different substrate effects, when magnetr... more The aim of this work is to investigate the influence of different substrate effects, when magnetron sputtering is used to sputter CoCrTa/Cr layers on different plastic (PET: polyethylene terephthalate) substrates, on kapton and on glass. Four substrate effects were investigated: the kind and thickness of the plastic, the shape of the substrate holder, the influence of a heat conducting glue during sputtering and the target-substrate distance. The best results were obtained using thin PET, with a target-substrate distance of 4 cm. This is due to an easier heat transfer using the thin substrate. A heat conducting glue stabilizes the sputter process. By using a cylindrical sample holder we studied the transformability of our sputter process to an industrial roll coater process. The magnetic parameters were almost constant over the whole sample. All films are characterized by hysteresis, remanence, X-ray diffraction and atomic force microscopy measurements.
Journal of magnetism and magnetic …, Jan 1, 1999
The effect of diluting the argon sputter gas with helium in DC-magnetron sputtering of both CoCr ... more The effect of diluting the argon sputter gas with helium in DC-magnetron sputtering of both CoCr magnetic layers and Cr underlayers was studied. A Co Cr target and a PET substrate were used. The addition of helium markedly improved the longitudinal magnetic properties and the magnetic uniformity of the films. It is shown that sputtering of the Cr underlayer with a He/Ar mixture improved the magnetic properties of the CoCr film which was sputtered subsequently; an explanation is that the structure of the Cr film sputtered with He/Ar is better suited to the epitaxial growth of CoCr. The beneficial effects of He are ascribed to an increased ion bombardment on the substrate. This is supported by measurement of the ion current of the substrate and by SEM measurements.
Journal of magnetism and magnetic …, Jan 1, 1999
The aim of this work is to investigate the influence of the magnetron configuration on the magnet... more The aim of this work is to investigate the influence of the magnetron configuration on the magnetic properties of DC magnetron sputtered Co Cr films on a PET substrate. The parameters of each magnetron configuration are calculated or measured. The influence of the most relevant sputtering parameters, such as a Cr underlayer and sputter pressure, is investigated for all configurations. The magnetic properties of the sputtered films were measured with a VSM. Microscopic characterisation of the films is done with XRD measurements. Changes in magnetic and microscopic properties of the films are explained in terms of charged particle bombardment of the substrate during sputtering. Using a Cr underlayer and a rather high pressure can improve the magnetic properties of the film drastically.
Journal of magnetism and magnetic …, Jan 1, 2001
Thin magnetic "lms (CoCr/Cr, CoCrTa/Cr and CoCrTa/Cr/SiO) are deposited by DC-magnetron sputterin... more Thin magnetic "lms (CoCr/Cr, CoCrTa/Cr and CoCrTa/Cr/SiO) are deposited by DC-magnetron sputtering on a PET substrate. The optimum sputter pressure, giving rise to the highest coercive force, is found to be around 50 mTorr. However, the deposition parameters in#uence the value of this optimum pressure. The addition of Ta to CoCr leads to phase segregation, resulting in CoCrTa "lms in which the magnetic interaction between the grains is more dipolar than in CoCr "lms. The magnetic interactions in CoCrTa "lms are less dependent on the sputter parameters than those in CoCr "lms. The evaporation of a seedlayer of, e.g. SiO prior to the deposition of the Cr underlayer increases the coercive force of the CoCrTa thin "lms, especially when the CoCrTa layer is thinner than 50 nm. This makes these "lms more suitable for high-density magnetic recording.
In this paper a new method is developed to deposit magnetic films on flexible substrates. The mag... more In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates. By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples were characterized by magnetic measurements (hysteresis curve , remanence and measure- ments), and by XRD and AFM.
Magnetic Interactions in CoCr/Cr Thin Films Sputtered with Different Gases HZ Jia / J. Veldeman /... more Magnetic Interactions in CoCr/Cr Thin Films Sputtered with Different Gases HZ Jia / J. Veldeman / M. Burgelman University of Gent, Electronics and Information Systems (ELIS), B-9000 Gent, Belgium Abstract Magnetic properties are studied within the thin CoggCr^/Cr films ...
In this paper a new method is developed to deposit magnetic films on flexible substrates. The mag... more In this paper a new method is developed to deposit magnetic films on flexible substrates. The magnetron sputter process commonly used in hard disk technology is adapted to the specific needs of flexible substrates. By using a higher sputter pressure and no substrate heating the problem of substrate stress or deformation is solved. The influence of all major sputter parameters is discussed in this article. All samples mere characterized by magnetic measurements [hysteresis curve (H/sub c/, M/sub r/, M/sub s/), remanence and /spl delta/M measurements], and by XRD and AFM.
Neural Computing and Applications
SID Symposium Digest of Technical Papers
Fourth International Conference on Thin Film Physics and Applications, 2000
ICDT 2018, 2018
In order to monitor any thermal environment variations, specifically with variation of temperatur... more In order to monitor any thermal environment variations, specifically with variation of temperature, an augmented reality (AR) device based on android system has been designed for mass production. Dual on-device cameras have been implemented. One is the normal camera with 13 M resolution; the other is a thermal camera with the resolution of 80*60. With such real time function, the AR device could be applied in different industry area such as industrial inspection and maintenance, fire detection, intelligent aquaculture, and intelligent medical treatment. By the help of real time thermal data, the user could obtain the real time temperature variations in the dedicated environment. These data could be sent to the center work station device for history analysis via wireless connections with WIFI and Bluetooth.
… : vision for the …, Jan 1, 1994
Proceedings of SPIE, Jan 1, 2000
In order to improve the magnetic properties of Co-based thin films, different seedlayers (SiO, IT... more In order to improve the magnetic properties of Co-based thin films, different seedlayers (SiO, ITO, SiO, Ag and Al) have been applied on a PET substrate. The thickness of Cr underlayers and of magnetic layers is varied to obtain thin films with optimal magnetic properties. The ...
Physica B: Condensed Matter, Jan 1, 2000
The aim of this work is to investigate the in#uence of the magnetron con"guration on the magnetic... more The aim of this work is to investigate the in#uence of the magnetron con"guration on the magnetic interactions in DC magnetron sputtered Cr/Co Cr "lms on a PET substrate. The sputter pressure is used as an extra parameter. Four di!erent magnetron con"gurations were investigated, two of type I and two of type II. With a type I magnetron the optimum sputter pressure is lower than with a type II magnetron. In type I con"gurations (low ion bombardment) the optimum sputter pressure is determined by an optimum voided structure. In type II magnetrons a high ion bombardment shifts the optimum voided structure to higher sputter pressures due to the compensation of the shadowing e!ect during sputtering. The optimum voided structure is characterised by remanence and AFM measurements.
Surface science, Jan 1, 2000
The aim of this work is to investigate the influence of different substrate effects, when magnetr... more The aim of this work is to investigate the influence of different substrate effects, when magnetron sputtering is used to sputter CoCrTa/Cr layers on different plastic (PET: polyethylene terephthalate) substrates, on kapton and on glass. Four substrate effects were investigated: the kind and thickness of the plastic, the shape of the substrate holder, the influence of a heat conducting glue during sputtering and the target-substrate distance. The best results were obtained using thin PET, with a target-substrate distance of 4 cm. This is due to an easier heat transfer using the thin substrate. A heat conducting glue stabilizes the sputter process. By using a cylindrical sample holder we studied the transformability of our sputter process to an industrial roll coater process. The magnetic parameters were almost constant over the whole sample. All films are characterized by hysteresis, remanence, X-ray diffraction and atomic force microscopy measurements.
Journal of magnetism and magnetic …, Jan 1, 1999
The effect of diluting the argon sputter gas with helium in DC-magnetron sputtering of both CoCr ... more The effect of diluting the argon sputter gas with helium in DC-magnetron sputtering of both CoCr magnetic layers and Cr underlayers was studied. A Co Cr target and a PET substrate were used. The addition of helium markedly improved the longitudinal magnetic properties and the magnetic uniformity of the films. It is shown that sputtering of the Cr underlayer with a He/Ar mixture improved the magnetic properties of the CoCr film which was sputtered subsequently; an explanation is that the structure of the Cr film sputtered with He/Ar is better suited to the epitaxial growth of CoCr. The beneficial effects of He are ascribed to an increased ion bombardment on the substrate. This is supported by measurement of the ion current of the substrate and by SEM measurements.
Journal of magnetism and magnetic …, Jan 1, 1999
The aim of this work is to investigate the influence of the magnetron configuration on the magnet... more The aim of this work is to investigate the influence of the magnetron configuration on the magnetic properties of DC magnetron sputtered Co Cr films on a PET substrate. The parameters of each magnetron configuration are calculated or measured. The influence of the most relevant sputtering parameters, such as a Cr underlayer and sputter pressure, is investigated for all configurations. The magnetic properties of the sputtered films were measured with a VSM. Microscopic characterisation of the films is done with XRD measurements. Changes in magnetic and microscopic properties of the films are explained in terms of charged particle bombardment of the substrate during sputtering. Using a Cr underlayer and a rather high pressure can improve the magnetic properties of the film drastically.
Journal of magnetism and magnetic …, Jan 1, 2001
Thin magnetic "lms (CoCr/Cr, CoCrTa/Cr and CoCrTa/Cr/SiO) are deposited by DC-magnetron sputterin... more Thin magnetic "lms (CoCr/Cr, CoCrTa/Cr and CoCrTa/Cr/SiO) are deposited by DC-magnetron sputtering on a PET substrate. The optimum sputter pressure, giving rise to the highest coercive force, is found to be around 50 mTorr. However, the deposition parameters in#uence the value of this optimum pressure. The addition of Ta to CoCr leads to phase segregation, resulting in CoCrTa "lms in which the magnetic interaction between the grains is more dipolar than in CoCr "lms. The magnetic interactions in CoCrTa "lms are less dependent on the sputter parameters than those in CoCr "lms. The evaporation of a seedlayer of, e.g. SiO prior to the deposition of the Cr underlayer increases the coercive force of the CoCrTa thin "lms, especially when the CoCrTa layer is thinner than 50 nm. This makes these "lms more suitable for high-density magnetic recording.