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This work investigates the use of the novel electric field assisted chemical vapour deposition (E... more This work investigates the use of the novel electric field assisted chemical vapour deposition (EACVD) process in the production of titanium dioxide thin films for photocatalytic applications on glass substrate. This work looks into the interaction of applied electric fields with the precursor species during the aerosol assisted chemical vapour deposition (AACVD) and atmospheric pressure chemical vapour deposition (APCVD) reaction of Titanium isopropoxide (TTIP) and Titanium (IV) Chloride (TiCl 4) with different solvents. The electric field was generated by applying a potential difference between two fluorine-doped tin oxide glass sheets. The electric field was varied between 0-3000 Vm-1. The deposited films were analysed and characterized using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, atomic force microscopy, UV-vis spectroscopy, water-contact angles and resazurin photcatalytic testing. It was observed that the application of electric fields produced changes in the morphology, particle size, growth rate, crystal orientation and crystal phases.
Chemical Vapor Deposition, 2015
Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass subs... more Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450°C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.
This work investigates the use of the novel electric field assisted chemical vapour deposition (E... more This work investigates the use of the novel electric field assisted chemical vapour deposition (EACVD) process in the production of titanium dioxide thin films for photocatalytic applications on glass substrate. This work looks into the interaction of applied electric fields with the precursor species during the aerosol assisted chemical vapour deposition (AACVD) and atmospheric pressure chemical vapour deposition (APCVD) reaction of Titanium isopropoxide (TTIP) and Titanium (IV) Chloride (TiCl 4) with different solvents. The electric field was generated by applying a potential difference between two fluorine-doped tin oxide glass sheets. The electric field was varied between 0-3000 Vm-1. The deposited films were analysed and characterized using scanning electron microscopy, X-ray diffraction, Raman spectroscopy, atomic force microscopy, UV-vis spectroscopy, water-contact angles and resazurin photcatalytic testing. It was observed that the application of electric fields produced changes in the morphology, particle size, growth rate, crystal orientation and crystal phases.
Chemical Vapor Deposition, 2015
Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass subs... more Thin films of anatase titanium dioxide are deposited on fluorine-doped tin oxide (FTO) glass substrates utilizing the electric field-assisted aerosol (EA)CVD reaction of titanium isopropoxide in toluene at 450°C. The as-deposited films are characterized using scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy (RS), and UV-vis spectroscopy. The photoactivity and antibacterial activity of the films are also assessed. The characterization analysis reveals that the use of an electric field affects the film microstructure, its preferential orientation, and the functional properties. XRD of the anatase films reveals that the application of electric fields causes a change in the preferential orientation of the films from (101) to (004) or (211) planes, depending on the strength of the applied field during the deposition.