saeed Mohammadi | Ferdowsi University of Mashhad (original) (raw)
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Papers by saeed Mohammadi
International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217)
2006 IEEE MTT-S International Microwave Symposium Digest, 2006
2007 IEEE/MTT-S International Microwave Symposium, 2007
33rd European Microwave Conference, 2003, 2003
Microwave, MTT-S International Symposium, 2002
High performance power SiGe/Si HBTs at X-band (8.4 GHz), Ku-band (12.6 GHz) and K-band (18 GHz) h... more High performance power SiGe/Si HBTs at X-band (8.4 GHz), Ku-band (12.6 GHz) and K-band (18 GHz) have been demonstrated. Under continuous wave operation, a single 20-finger Si/Si0.75Ge0.25/Si (emitter area of 1200 μm2) HBT, biased in class AB, delivers 28.5 dBm (700 mW) of RF output power at X-band, 25.5 dBm (350 mW) at Ku-band and 22.5 dBm (180 mW) at
2007 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium, 2007
Microwave, MTT-S International Symposium, 2003
A toroidal inductor has been developed that confines flux and eliminates eddy currents. A printed... more A toroidal inductor has been developed that confines flux and eliminates eddy currents. A printed circuit and micromachined RFIC-compatible implementations of the inductor are presented.
Solid-State Electronics, 2000
Solid-State Electronics, 2000
IEEE Transactions on Microwave Theory and Techniques, 2006
IEEE Transactions on Electron Devices, 2000
IEEE Transactions on Advanced Packaging, 2007
IEEE Transactions on Advanced Packaging, 2009
IEEE Photonics Technology Letters, 2007
IEEE Microwave and Wireless Components Letters, 2006
IEEE Microwave and Wireless Components Letters, 2003
IEEE Microwave and Wireless Components Letters, 2001
Electronics Letters, 2001
Applied Physics Letters, 2007
Enhancement-mode GaAs metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) wi... more Enhancement-mode GaAs metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) with ex situ atomic-layer-deposited Al2O3 as gate dielectrics are studied. Maximum drain currents of 211 and 263mA∕mm are obtained for 1μm gate-length Al2O3 MOS-HEMTs with 3 and 6nm thick gate oxide, respectively. C-V characteristic shows negligible hysteresis and frequency dispersion. The gate leakage current density of the MOS-HEMTs is 3–5 orders of magnitude lower than the conventional HEMTs under similar bias conditions. The drain current on-off ratio of MOS-HEMTs is ∼3×103 with a subthreshold swing of 90mV/decade. A maximum cutoff frequency (fT) of 27.3GHz and maximum oscillation frequency (fmax) of 39.9GHz and an effective channel mobility of 4250cm2∕Vs are measured for the 1μm gate-length Al2O3 MOS-HEMT with 6nm gate oxide. Hooge’s constant measured by low frequency noise spectral density characterization is 3.7×10−5 for the same device.
IEEE MTT-S International Microwave Symposium Digest, 2005.
International Electron Devices Meeting 1998. Technical Digest (Cat. No.98CH36217)
2006 IEEE MTT-S International Microwave Symposium Digest, 2006
2007 IEEE/MTT-S International Microwave Symposium, 2007
33rd European Microwave Conference, 2003, 2003
Microwave, MTT-S International Symposium, 2002
High performance power SiGe/Si HBTs at X-band (8.4 GHz), Ku-band (12.6 GHz) and K-band (18 GHz) h... more High performance power SiGe/Si HBTs at X-band (8.4 GHz), Ku-band (12.6 GHz) and K-band (18 GHz) have been demonstrated. Under continuous wave operation, a single 20-finger Si/Si0.75Ge0.25/Si (emitter area of 1200 μm2) HBT, biased in class AB, delivers 28.5 dBm (700 mW) of RF output power at X-band, 25.5 dBm (350 mW) at Ku-band and 22.5 dBm (180 mW) at
2007 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium, 2007
Microwave, MTT-S International Symposium, 2003
A toroidal inductor has been developed that confines flux and eliminates eddy currents. A printed... more A toroidal inductor has been developed that confines flux and eliminates eddy currents. A printed circuit and micromachined RFIC-compatible implementations of the inductor are presented.
Solid-State Electronics, 2000
Solid-State Electronics, 2000
IEEE Transactions on Microwave Theory and Techniques, 2006
IEEE Transactions on Electron Devices, 2000
IEEE Transactions on Advanced Packaging, 2007
IEEE Transactions on Advanced Packaging, 2009
IEEE Photonics Technology Letters, 2007
IEEE Microwave and Wireless Components Letters, 2006
IEEE Microwave and Wireless Components Letters, 2003
IEEE Microwave and Wireless Components Letters, 2001
Electronics Letters, 2001
Applied Physics Letters, 2007
Enhancement-mode GaAs metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) wi... more Enhancement-mode GaAs metal-oxide-semiconductor high-electron-mobility transistors (MOS-HEMTs) with ex situ atomic-layer-deposited Al2O3 as gate dielectrics are studied. Maximum drain currents of 211 and 263mA∕mm are obtained for 1μm gate-length Al2O3 MOS-HEMTs with 3 and 6nm thick gate oxide, respectively. C-V characteristic shows negligible hysteresis and frequency dispersion. The gate leakage current density of the MOS-HEMTs is 3–5 orders of magnitude lower than the conventional HEMTs under similar bias conditions. The drain current on-off ratio of MOS-HEMTs is ∼3×103 with a subthreshold swing of 90mV/decade. A maximum cutoff frequency (fT) of 27.3GHz and maximum oscillation frequency (fmax) of 39.9GHz and an effective channel mobility of 4250cm2∕Vs are measured for the 1μm gate-length Al2O3 MOS-HEMT with 6nm gate oxide. Hooge’s constant measured by low frequency noise spectral density characterization is 3.7×10−5 for the same device.
IEEE MTT-S International Microwave Symposium Digest, 2005.