An Approach for Nanolithography Using Electron Holography (original) (raw)
NASA/ADS
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Abstract
A technique of electron holography was applied to nanofabrication. Electron interference fringes whose spacing was 108 nm were successfully recorded on polymethylmethacrylate (PMMA) resist using a W< 100> thermal field emission (TFE) gun and an electron biprism both set on a conventional transmission electron microscope (TEM). Furthermore, we have attempted the fabrication of a free-standing multi-biprism by electron beam lithography and dry etching, leading to a new fabrication method of a nanoscale grating with a short exposure.
Publication:
Japanese Journal of Applied Physics
Pub Date:
December 1993
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