Ordered Mesopores Through a Diblock Copolymers Mask (original) (raw)

Psst 2014 Home Page, 2014

Abstract

Thanks to diblock copolymers self-assembly, it is possible to propagate periodic polymeric nanostructures on large area to silicon dioxide and silicon by Reactive Ion Etching or Metal Assisted Etching, obtaining ordered mesoporous silicon with pore size ranging from 50 to 10 nanometers an less. The two different propagation methods are compared in this work.

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