Tailoring the Charge Carrier Lifetime Distribution of 10 kV SiC PiN Diodes by Physical Simulations (original) (raw)
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The effect of proton irradiation (proton energy 15 MeV) on the parameters of high-voltage 4H-SiC integrated Schottky diodes (JBS) was studied for the first time in the operating temperature range Ti (23 and 175oC). The blocking voltage of the diodes under study, Ub, was 600 and 1700 V. For devices with U_b = 600 V, the fluence range was 5·1013-1·1014 cm-2; for devices with U_b=1700 V, the fluence range was 3·1013-6·1013 cm-2. An increase in the irradiation temperature leads to a noticeable decrease in the effect of irradiation on the current-voltage characteristics of the diodes. The effect of annealing on the current-voltage characteristics of irradiated devices is studied. Keywords: Silicon carbide, Schottky diodes, proton irradiation, current-voltage characteristics, annealing.
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The defects formation in ion-irradiated 4H-SiC was investigated and correlated with the electrical properties of Schottky diodes. The diodes were irradiated with 1 MeV Si+-ions, at fluences ranging between 1×109cm-2 and 1.8×1013cm-2. After irradiation, the current-voltage characteristics of the diodes showed an increase of the leakage current with increasing ion fluence. The reverse I-V characteristics of the irradiated diodes monitored as a function of the temperature showed an Arrhenius dependence of the leakage, with an activation energy of 0.64 eV. Deep level transient spectroscopy (DLTS) allowed to demonstrate that the Z1/Z2 center of 4H-SiC is the dominant defect in the increase of the leakage current in the irradiated material.
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The ON-state characteristics of a 1.7-kV 4H-SiC junction barrier Schottky diode were studied after 4.5-MeV electron irradiation. Irradiation doses were chosen to cause a light, strong, and full doping compensation of an epitaxial layer. The diodes were characterized using Deep Level Transient Spectroscopy, C-V (T), and I-V measurements without postirradiation annealing. The calibration of model parameters of a device simulator, which reflects the unique defect structure caused by the electron irradiation, was verified up to 2000 kGy. The quantitative agreement between simulation and measurement requires: 1) the Shockley-Read-Hall model with at least two deep levels on the contrary to ion irradiation and 2) a new model for enhanced mobility degradation due to radiation defects. The diode performance at high electron fluences is shown to be limited by the doping compensation at the epitaxial layer.
IEEE Transactions on Nuclear Science, 2000
Charge collection of a 6H-SiC p + n diode has been studied. The collected charges of the diode are measured using a single alpha particle strike at various reverse bias voltages, then analyzed using both the low-injection charge collection model and the DESSIS device simulator. It is found that the total collected charges at lower bias voltages cannot be well understood based on the low-injection model. In distinct contrast, the device simulator successfully predicts the total collected charges at all voltages including the lower ones. The transient analysis of carrier and electric field distributions after the strike shows insignificant collapse of the original depletion region and time-dependent extension of the electric field beyond the original depletion region. A new physics is proposed to explain slower rearrangement of carriers, compared to Si devices, and formation of an extended drift region in the 6H-SiC diode based on the results of the transient analysis.