original ) (raw )Excellent Response and Recovery Time of Photo-Detectors Based on Nc-Si:H Films Grown by Using Hot Wire Method
Dhirsing Naik
ES Materials & Manufacturing
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A study of hydrogenated nanocrystalline silicon thin films deposited by hot-wire chemical vapour deposition (HWCVD)
S. Halindintwali
2005
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Structural and optical studies on hot wire chemical vapour deposited hydrogenated silicon films at low substrate temperature
Purabi Gogoi
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Influence of the deposition parameters on the microstructure and opto-electrical properties of hydrogenated nanocrystalline silicon films by HW-CVD
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Hydrogenated Nanocrystalline Silicon Thin Films Prepared by Hot-Wire Method with Varied Process Pressure
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Journal of Nanotechnology, 2011
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Monitoring of crystallization and the effect of the deposition rate, hydrogen content and annealing process on the crystallization of hot wire chemical vapor deposited hydrogenated amorphous silicon (a-Si:H) films
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Influence of Substrate Temperature and Hydrogen Dilution Ratio on the Properties of Nanocrystalline Silicon Thin Films Grown by Hot-Wire Chemical Vapor Deposition
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Microstructure Dependent Opto-Electronic Properties of Amorphous Hydrogenated Silicon Thin Films
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Some optical properties of hydrogenated amorphous silicon thin films grown by Photo-CVD
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Role of argon in hot wire chemical vapor deposition of hydrogenated nanocrystalline silicon thin films
Adinath Funde
Thin Solid Films, 2011
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Determination of the optical parameters of a-Si:H thin films deposited by hot wire–chemical vapour deposition technique using transmission spectrum only
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Pramana, 2011
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Microstructure related optical characterization of technologically relevant hydrogenated silicon thin films
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16th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 2008
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Effect of the hydrogen flow rate on the structural and optical properties of hydrogenated amorphous silicon thin films prepared by plasma enhanced chemical vapor deposition
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Review on Se- and S-doped hydrogenated amorphous silicon thin films
Sanjeev Kumar Sharma
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Influence of film thickness on optical and electrical properties of hydrogenated amorphous silicon
elena tresso
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Optical and Structural Features of Silicon-Rich Hydrogenated Amorphous Silicon Nitride Thin Films
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Growth and characterization of polycrystalline Si films prepared by hot-wire chemical vapor deposition
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Thin Solid Films, 2006
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Effects of Substrate Temperature on the Properties of Hydrogenated Nanocrystalline Silicon Thin Film Grown by Layer-by-Layer Technique
Saadah Abdul Rahman
2006
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Structural and chemical characterization of nanocrystalline and amorphous hydrogenated Si films
Salvatore Lombardo
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Optical characterization of a-Si:H thin films grown by Hg-Photo-CVD
Abdelfettah BARHDADI
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The effect of mixing hydrogen with silane on the electronic and optical properties of hydrogenated amorphous silicon thin films
Susmita Ray
Thin Solid Films, 1984
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Properties and stability of hydrogenated amorphous silicon films with a low hydrogen content prepared by cyclic chemical vapour deposition and hydrogenation
Svetoslav Koynov
Materials Science and Engineering: B, 1993
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Hydrogenated Amorphous Silicon Sensors Based on Thin Film on ASIC Technology
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Characteristics of a-si:h films prepared by ecr cvd as a function of the h2/sih4
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Materials Chemistry and Physics, 1997
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Crystallization of HWCVD amorphous silicon thin films at elevated temperatures
S. Halindintwali
Thin Solid Films, 2006
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Impact of dilution gases on structure, properties and growth of hydrogenated nanocrystalline silicon (nc-Si:H) prepared by HW-CVD method
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