Design, fabrication, characterization of micromachined capacitive shunt switches with low actuation voltages and low temperature packaging (original) (raw)

Low Voltage Rf Mems Capacitive Shunt Switches

Micro-electro-mechanical-systems(MEMS) switches have low resistive loss, negligible power consumption, good isolation and high power handling capability compared with semiconductor switches. Lifetime of capacitive shunt switches strongly depends on the actuation voltage so low voltage switches is necessary to enhance its performance as well as to broaden its application area. This paper presents the design and simulation of low voltage capacitive shunt MEMS switches together with its RF performance for high frequency applications. The low voltage switches are realized by lowering the spring constant of the beam using serpentine spring designs together with large capacitive area so as to achieve the good RF performance as well. The pull-in voltage is analyzed with commercial CAD finite element analysis software CoventorWare. The electromagnetic performance in terms of scattering parameters, insertion loss, and isolation are analyzed with software Ansoft HFSS10. The switches achieved insertion loss <0.47 dB in on state from 2 to 40 GHz; it provided better than 25 dB isolation in off state with a capacitance ratio of 94-96. The actuation voltage as low as 1.5 V with actuation area 110 × 100 µm 2 along with good RF performance is reported. The design parameter optimization including selection of appropriate number of meanders and its width found to be one of the most sensitive factors affecting the spring stiffness and actuation voltage.

RF MEMS Capacitive Shunt Switch: A study based practical overview

2018

This paper gives a study based practical overview of Electrostatically Actuated Radio Frequency Micro-ElectroMechanical-Systems (RF MEMS) Capacitive shunt switches. Switch configurations and their working principles are discussed. Attention is given towards design and modeling considerations of RF MEMS switches i.e. mechanical design, electromechanical design and radio frequency design aspects. Advantages and performance comparisons of RF MEMS switches against semiconductor switches and application areas are highlighted. A study of fixed-fixed gold bridge structure CPW based shunt capacitive switch with dual actuation electrodes is done for analysis and simulation of mechanical and electromagnetic characteristics. Pull-in voltage findings are 7 Volts for perforated gold bridge structure with k= 0.9276 N/m and dual actuation electrode area of 200 × 110 um2. Small capacitance switch with capacitance area of 150X70 μm2 and large capacitance switch with capacitance area of 150X150 μm2 a...

Design and optimization of a low-voltage shunt capacitive RF-MEMS switch

2014 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 2014

This paper presents the design, optimization and simulation of a radio frequency (RF) micro-electromechanical system (MEMS) switch. The device is a capacitive shuntconnection switch, which uses four folded beams to support a big membrane above the signal transmission line. Another four straight beams provide the bias voltage. The switch is designed in 0.35µm complementary metal oxide semiconductor (CMOS) process and is electrostatically actuated by a low pull-in voltage of 2.9V. Taguchi Method is employed to optimize the geometric parameters of the beams, in order to obtain a low spring constant and a robust design. The pull-in voltage, vertical displacement, and maximum von Mises stress distribution was simulated using finite element modeling (FEM) simulation-IntelliSuite v8.7 ® software. With Pareto ANOVA technique, the percentage contribution of each geometric parameter to the spring constant and stress distribution was calculated; and then the optimized parameters were got as t=0.877µm, w=4µm, L1=40µm, L2=50µm and L3=70µm. RF performance of the switch was simulated by AWR Design Environment 10 ® and yielded isolation and insertion loss of-23dB and-9.2dB respectively at 55GHz.

Mechanical Design of RF MEMS Capacitive Switches

2000

This paper analyses the mechanical behaviour of various suspensions of electrostatically actuated RF MEMS switches. A family of capacitive switches is described, with suspensions varying step by step from cantilevers to meander shaped double clamped beams. The result is a capacitive shunt switch with a designed actuation voltage of 4.5 V, and 20dB isolation and 0.04 dB insertion loss at a frequency of 2 GHz. At the time of writing, the proposed devices are being processed.

Cantilever type radio frequency microelectromechanical systems shunt capacitive switch design and fabrication

Journal of Micro/Nanolithography, MEMS, and MOEMS, 2015

A new cantilever type radio frequency microelectromechanical systems (RF MEMS) shunt capacitive switch design and fabrication is presented. The mechanical, electromechanical, and electromagnetic designs are carried out to get <40 V actuation voltage, high isolation, and low insertion loss for 24 and 35 GHz and the fabrication is carried out for 24 GHz RF MEMS switch. The fabricated switch shows lower than 0.35 dB insertion loss up to 40 GHz and greater than 20 dB isolation at 22 to 29 GHz frequency band. An insignificant change is observed on RF performance at 24 GHz (ΔS 11 ¼ 1 dB, ΔS 21 < 0.1 dB) after 200°C thermal treatment for 30 min. The switch is fabricated on quartz wafer using an in-house surface micromachining process with amorphous silicon sacrificial layer structure. Total MEMS bridge thickness is aimed to be 4 μm and consists of 2-μm-thick sputtered and 2-μm-thick electroplated gold layers. The bridge bending models and pull-down voltage simulations are carried out for different stress levels and equivalent Young's modulus (E avg).

Novel design and analysis of RF MEMS shunt capacitive switch for radar and satellite communications

2019

In this paper, a new type of Radio Frequency Micro-Electro-Mechanical System (RF-MEMS) shunt capacitive switch is designed and studied. RF MEMS switch has a number of advantages in a modern telecommunication system such as low power consumption, easy to fabricate and power handling capacity at radio frequency. At high frequency applications, this switch shows very superior performance due to which it now became one of the key elements for RF application. In this proposed design, an innovative type of MEMS switch is designed. The MEMS switch structure consists of substrate, co-planar waveguide (CPW), dielectric material and a metallic bridge. The proposed MEMS switch has a dimension of 508 µm × 620 µm with a height of 500 µm. The substrate used is GaAs material. The relative permittivity of the substrate is 12.9. This proposed MEMS switch is designed and simulated in both UP (ON) state and DOWN (OFF) state. The proposed RF-MEMS switch is designed and simulated using Ansoft High frequency structure simulator (HFSS) electromagnetic simulator. The simulated result shows better performance parameters such as return loss (<-10 dB) and insertion loss (>-0.5 dB) in UP state, whereas return loss (>-0.5 dB) and isolation (<-10 dB) in DOWN state. This switch has good isolation characteristics of-43 dB at 27 GHz frequency. 1. INTRODUCTION The term RF-MEMS means Radio Frequency Micro-Electro Mechanical System. Therefore it is combination of two different systems that is mechanical and electrical systems. The MEMS switch exhibit both mechanical and electrical characteristics during the function. The mechanical property helps to up and down movement of RF MEMS switch for the transmission of radio frequency signal through the CPW conductor [1, 2]. This MEMS switch are extensively used for radio frequency applications [3]. Initially MEMS are used for several devices such as tempreture sensor, pressure sensor, gas chromatographs etc and at the same time MEMS switch are also used at low frequency applications [4-6]. The MEMS switches integrates the benefits of mechanical and semiconductor properties in small size. This property of MEMS switch can be used for radio frequency, hence called RF-MEMS switch. Like MEMS switch, there have alos been several standard switches such as PIN diode and FET for the switching function at RF frequency. The RF-MEMS switch provides better performances such as low power consumption, high isolation, less noise, low insertion loss, high bandwidth than the conventional solid state PINdiode and FET switches [7-8]. However, for the designing and operation of RF-MEMS switch, it has also some disadvantages such as switching speed, low power handling capacity [9-11], electrostatic discharge [12-13], high actuation voltage, packaging and low switching lifetime [14]. In order to overcome

A Low Voltage Mems Structure for RF Capacitive Switches

Progress In Electromagnetics Research, 2006

A novel structure for the capacitive micromachined switches with low actuation voltage is proposed. In this structure both contact plates of the switch are designed as displaceable membranes. Two structures with similar dimensions and conditions, differing on only the number of the displaceable beams are analytically investigated as well as simulated using ANSYS software. The obtained results indicate about 30% reduction in actuation voltage from the conventional single beam to our proposed double beam structure. The stress on the beam due to the actuation voltage is also reduced increasing the switching life time. The dynamic simulation results in switching time of 6.5 µsec compared to the 8.9 µsec of the analytical results. It can be implemented by the well established surface micromachining for RF applications.

IAETSD-Design and Analysis of a Novel Low Actuated Voltage RF MEMS Shunt Capacitive Switch

This Paper presents design, analysis, proposed fabrication process and simulation of a novel low actuated voltage shunt capacitive RF MEMS Switch. The Air gap in between the membrane and CPW signal line is 1.5 µm. The lowest actuation voltage of switch is 3 Volts. The proposed fixedfixed flexures beam structure provides excellent RF Characteristics (Isolation -43 dB at 28 GHZ and insertion loss -0.12 dB at 28 GHZ).

Design of H-shaped low actuation-voltage RF-MEMS switches

2006 Asia-Pacific Microwave Conference, 2006

Low actuation-voltage and high reliable microelectromechanical systems (MEMS) shunt capacitive and shunt resistive switches are in this paper proposed. Electrostatic-mechanical coupling using finite element method (FEM) and full-wave electromagnetic (EM) analyses have been performed. The mechanical design of a low spring-constant switch structure has been optimized by calculating the dependence of the actuation voltage on the membrane shape, material properties and geometrical sizes. The proposed switches, based on Al metallization membrane, show a pull-in voltage around 7 and 13 Volts with 0 and 20 MPa residual stresses, respectively. The simulated insertion losses are less than 0.25 dB up to 40GHz with a return loss of about 20 dB in the ONstate. The isolations in the OFF-state for the capacitive-switch are greater than 20 and 35 dB at 12 and 40 GHz, respectively. The shunt resistive switch theoretically works from zero frequency with isolation greater than 25 dB up to 40 GHz. The fabrication of those switches is compatible with standard CMOS technology and they are in process. Index Terms -Low-actuation voltage, MEMS, Pull-in, RF MEMS switch.

Design and Analysis of RF MEMS Capacitive Shunt Switch and Impact of Geometric Trade-offs on RF Performance

HELIX

The electromagnetic and the electromechanical characteristics of the radio frequency micro-electro-mechanicalsystem (RF MEMS) switches for high-frequency applications are the critical performance metrics that need to optimize. Performance indices of the RF MEMS switches such as isolation, insertion loss, pull-in voltage, holddown voltage, reliability are dependent on types and properties of conducting and insulating materials that are used in the construction of switch. This article proposes the design and analysis of the two terminal capacitive shunt switches built on a coplanar waveguide (CPW) for applications in subsets of Ka-and V-Band frequency range. The proposed switch used a fixed-fixed gold membrane with the low-spring constant uniform single meander flexures support and achieved a low pull-in voltage of 5.1 Volts. An impact of the variation of the geometric parameter trade-offs like conducting membrane height, dielectric material height, and the air gap between the membrane and the dielectric materials like Silicon Nitride (Si3N4) and Hafnium Dioxide (HfO2) are studied to investigate RF and electromechanical performance of the switch.