Morphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films (original) (raw)

Titanium aluminium nitride (TiAlN) thin film coatings were synthesized via Atmospheric pressure chemical vapour deposition (APCVD) at various deposition temperature using titanium di-oxide (TiO2) powder, Al powder (99% pure) and N2 gas. The thin films were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) for analysing the morphological, vibrational and compositional characteristics of the deposited film. SEM images showed successful deposition of TiAlN thin film over Si wafers. Raman peaks revealed the optical phonon bands of the coated thin film within a range of 214.6-335.1 cm-1and 552.63-815.23 cm-1 for acoustic and optic range respectively at different processing temperatures. XPS spectra clearly showed the presence of different phases like Ti-N, Ti-O-N, Al2O3, N-Al, TiO2 Al-O in Ti (2p), Al (2p) and N (1s) orbitals, which is in a good agreement with past work.