Fabrication of three-dimensional imprint lithography templates by colloidal dispersions (original) (raw)
Related papers
Fabrication of roll imprint stamp for continuous UV roll imprinting process
Microelectronic Engineering, 2009
Recently, nano imprint lithography has been developed for mass production of nano-scale patterns on large-scale substrates. To achieve high throughput and cost reduction, roll-to-roll imprint lithography has been introduced. The roll-to-roll imprint is the suitable process for large area patterning, especially, flexible substrates for display devices. In this study, roll-to-roll imprint stamp is fabricated using polyvinyl alcohol (PVA) mold and UV curable poly-dimethylsiloxanes (PDMS) resin for continuous roll imprinting process. The PVA mold was chosen since it is flexible and can be dissolved in water. Since the PDMS can form thin SiO x layer on the surface by oxygen plasma treatment, silane based hydrophobic anti-stiction layer can be formed directly on the surface of PDMS. As a result, nano-sized patterns were successfully formed on the flexible PET films by UV roll imprinting with the fabricated roll stamp.
Adaptation of Roll-to-Roll Imprint Lithography: From Flexible Electronics to Structural Template
Proc. of SPIE Vol. 7970, 2011
HP has previously demonstrated the roll-to-roll (R2R) fabrication of active-matrix display backplanes using the SelfAligned Imprint Lithography (SAIL) process. This approach permits a single imprint step to create a multi level mask comprising all patterns required for subsequent etching steps, obviating the need for multiple alignment steps. In this paper the imprint lithography technique and aspects of SAIL are reviewed. New work using imprint processing to generate structural templates, with aspect ratios approaching 6:1, for fluid containment will be presented. Arrays of transparent well structures, formed on a flexible transparent substrate provide the basis for a color display filter matrix that is filled by inkjet deposition of pigmented resins. A primary benefit of this approach is precise color pattern definition. A separation between primary color fields of 4 microns is realized without risk of color mixing or overlap. Components patterned with high absolute precision by imprint lithography were readily integrated with parts from other sources to yield flexible color reflective display demonstrator panels. This work highlights the flexibility of imprint processing and its suitability for use with a wide variety of materials and in differing applications.
International Journal of Nanotechnology, 2014
Recent developments in flexible electronics, solar cells, displays, bio-chips and wearable technology have featured various micro/nanostructures in system designs. However, fabricating these micro/nanostructures on flexible substrates using existing technology such as photolithography, electron beam lithography (EBL) and other lithography techniques is troublesome, time consuming and costly. An in-house roll-to-roll ultraviolet nanoimprint lithography (R2R-UVNIL) system was designed and fabricated as an alternative low cost and large area patterning tool. It consists of a coating unit, soft-bake unit and imprinting unit which are connected together using a series of rollers. The aim of the integrated soft-bake stage was to minimise the mould sticking issues during the continuous R2R imprinting using solvent-based resist. The assembled R2R-UVNIL system was tested with imprinting process on an untreated commercial polyethylene terephthalate (PET) film as the flexible substrate, solvent-based SU8-2002 photopolymer as the resist and PDMS soft mould as the imprinting mould. The PDMS soft mould was replicated from an EBL patterned silicon master mould. Imprinting speeds of 50 to 150 mm/min have been achieved in this work, with relatively sound replication quality and formability for patterning sub-2 µm microstructures.
Materials, 2020
The effective production of nanopatterned films generally requires a nanopatterned roll mold with a large area. We report on a novel system to fabricate large-area roll molds by recombination of smaller patterned areas in a step-and-repeat imprint lithography process. The process is accomplished in a method similar to liquid transfer imprint lithography (LTIL). The stamp roll with a smaller area takes up the liquid resist by splitting from a donor substrate or a donor roll. The resist is then transferred from a stamp roll to an acceptor roll and stitched together in a longitudinal and, if necessary, in a circumferential direction. During transfer, the nanostructured resist is UV-exposed and crosslinked directly on the acceptor roll. The acceptor roll with the stitched and recombined stamp patterns is ready to be used as a large-area roll mold for roll-based imprinting. A system for this purpose was designed, and its operation was demonstrated taking the example of an acceptor roll o...
Fabrication of flexible UV nanoimprint mold with fluorinated polymer-coated PET film
Nanoscale Research Letters, 2011
UV curing nanoimprint lithography is one of the most promising techniques for the fabrication of micro-to nanosized patterns on various substrates with high throughput and a low production cost. The UV nanoimprint process requires a transparent template with micro-to nano-sized surface protrusions, having a low surface energy and good flexibility. Therefore, the development of low-cost, transparent, and flexible templates is essential. In this study, a flexible polyethylene terephthalate (PET) film coated with a fluorinated polymer material was used as an imprinting mold. Micro-and nano-sized surface protrusion patterns were formed on the fluorinated polymer layer by the hot embossing process from a Si master template. Then, the replicated pattern of the fluorinated polymer, coated on the flexible PET film, was used as a template for the UV nanoimprint process without any anti-stiction coating process. In this way, the micro-to nano-sized patterns of the original master Si template were replicated on various substrates, including a flat Si substrate and curved acryl substrate, with high fidelity using UV nanoimprint lithography.
Development of imprint materials for the Step and Flash Imprint Lithography process
SPIE Proceedings, 2004
The Step and Flash Imprint Lithography (S-FIL TM) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. This talk will present the imprint materials that have been developed to specifically address the issue of process life and defects.
Flexible stamp for nanoimprint lithography
18th IEEE International Conference on Micro Electro Mechanical Systems, 2005. MEMS 2005., 2005
The design, fabrication and pedomance of a flexible silicon stamp for homogenous large area nanoimprint lithography (NIL) are presented. The flexible stamp is fabricated by bulk semiconductor micro machining of a 4-inch silicon wafer and consists of thick anchor-like imprint areas connected by membranes. The bending stiffness difference between the imprint areas and the membranes ensures that the deformation of the stamp during the imprint process mainly takes place in the membranes, leaving the imprint structures unaffected. By this design the strong demand to the parallelism between stamp and substrate in the imprint situation is decoupled from the pressing tool and the wafer quality. The stamp consist of 1562 imprint areas (1 mm x 1 mm) containing the pattems to be replicated. The imprinted patterns are characterized with respect to the imprint depth and the polymer residual layer thickness. It is found that within a 50 111111 diameter the polymer residual layer thickness is 18.8 nm with a standard deviation of 6.6 nm.
High‐Speed Roll‐to‐Roll Nanoimprint Lithography on Flexible Plastic Substrates
Advanced materials, 2008
Continuous Roll-to-Roll NanoImprint Lithography (R2RNIL) provides greatly improved throughput by overcoming the challenges faced by conventional NIL in maintaining pressure uniformity and successful large-area imprinting and demolding. We present continuous imprinting of nanoscale structures with linewidth down to 70nm on a flexible plastic substrate. Our new process used a flexible and non-sticking fluoropolymer mold, and fast thermal and UV curable liquid resist materials. In addition, pattern quality in continuous R2RNIL process according to two different mold-separation directions has been analytically investigated.