Gate-all-around MOSFETs based on vertically stacked horizontal Si nanowires in a replacement metal gate process on bulk Si substrates (original) (raw)

2016 IEEE Symposium on VLSI Technology, 2016

Abstract

We report on gate-all-around (GAA) n- and p-MOSFETs made of 8-nm-diameter vertically stacked horizontal Si nanowires (NWs). We show that these devices, which were fabricated on bulk Si substrates using an industry-relevant replacement metal gate (RMG) process, have excellent short-channel characteristics (SS = 65 mV/dec, DIBL = 42 mV/V for LG = 24 nm) at performance levels comparable to finFET reference devices. The parasitic channels below the Si NWs were effectively suppressed by ground plane (GP) engineering.

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