Study of the ion energy distribution during physical vapour deposition of TiN (original) (raw)

Surface and Coatings Technology, 1994

Abstract

Abstract The energetic distribution of ions in a triode ion plating configuration during TiN deposition was investigated. The fluxes of different ions such as Ti + , N + , N + 2 , TiN + , TiAr + , impinging on the substrate, for various N partial pressures were measured by mass-energy spectrometry. The potential distribution in the plasma and the total ion flux towards the substrate were evaluated by Langmuir plasma probing. A model of the potential distribution in the triode ion plating plasma configuration is suggested and the Ti ionization for various plasma conditions is discussed.

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