Large-Area ZnO Thin Films for Solar Cells Prepared by Photo-Induced Metalorganic Chemical Vapor Deposition (original) (raw)

Japanese Journal of Applied Physics, 1993

Abstract

Textured ZnO films with low resistivity and high transparency in a wide wavelength range from 400 nm to 1400 nm have been successfully grown by the photo-induced metalorganic chemical vapor deposition (MOCVD) technique. It was found that ultraviolet irradiation during deposition was very effective in improving the electrical properties of the films, even with a low intensity. The obtained films have a good uniformity along the 10×10 cm2 substrate.

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