An apparatus and method for surface treatment by means of a DIELECTRIC BARRIER DISCHARGE in a gas for processing two substrates simultaneously (original) (raw)

2007

Abstract

Apparatus for the implementation of a continuous process for treating substrates by dielectric barrier discharge for the simultaneous processing of two substrates, comprising: - a first electrode, - a second electrode, at least one of the electrodes being covered a dielectric barrier, - means for feeding at least two substrates in the space between the two electrodes; - a intimately contacting means of the first electrode with one of the faces of a first substrate - an intimate contacting means of the second electrode with one side of a second substrate, - holding means of the second electrode at a constant distance from the first electrode, - a feeding means the space between the two substrates in a process gas, said first and second electrodes being connected to an electrical power source so that the discharge takes place between the electrodes, and fa CON to create a plasma in the process gas between the two substrates.

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