Si nanocrystals in sandwiched SiNx structures (original) (raw)

Formation of silicon nanocrystals by thermal annealing of low-pressure chemical-vapor deposited amorphous SiNx (x=0.16) thin films

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Characterization of Si nanocrystals grown by annealing SiO[sub 2] films with uniform concentrations of implanted Si

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Surface morphology and structural observation of laser interference crystallized a-Si:H/a-SiNx:H multilayers

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