original ) (raw )Effect of N2O/SiH4 flow ratios on properties of amorphous silicon oxide thin films deposited by inductively-coupled plasma chemical vapor deposition with application to silicon surface passivation
Dr.Lakshminarayan Nariangadu
Vacuum, 2009
View PDFchevron_right
Effects of process parameters on the properties of silicon oxide films using plasma enhanced chemical vapor deposition with tetramethoxysilane
Jean-marie Nedelec
Current Applied Physics, 2009
View PDFchevron_right
Structural properties of low temperature plasma enhanced chemical vapor deposited silicon oxide films using disilane and nitrous oxide
Juho song
Applied Physics Letters, 1995
View PDFchevron_right
Surface passivation of crystalline silicon by plasma-enhanced chemical vapor deposition double layers of silicon-rich silicon oxynitride and silicon nitride
Luca Gautero
Journal of Applied …, 2011
View PDFchevron_right
High-rate plasma-deposited SiO2 films for surface passivation of crystalline silicon
Mariadriana Creatore
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2006
View PDFchevron_right
Excellent Silicon Surface Passivation Achieved by Industrial Inductively Coupled Plasma Deposited Hydrogenated Intrinsic Amorphous Silicon Suboxide
Johnson T J Wong
International Journal of Photoenergy, 2014
View PDFchevron_right
Effects of Substrate Temperature on the Properties of Silicon Oxide Films by PECVD
Kuan Chiu
Applied Mechanics and Materials, 2012
View PDFchevron_right
Structural properties of SiO2 films prepared by plasma-enhanced chemical vapor deposition
Giulio Ceriola
Materials Science in Semiconductor Processing, 2001
View PDFchevron_right
Bonded Hydrogen in Silicon Oxide Thin Films Deposited By Remote Plasma Enhanced Chemical Vapor Deposition
David Tsu
MRS Proceedings, 1987
View PDFchevron_right
On the Plasma Chemistry During Plasma Enhanced Chemical Vapor Deposition of Microcrystalline Silicon Oxides
Bernd Stannowski
Plasma Processes and Polymers, 2014
View PDFchevron_right
Development of low temperature silicon oxide thin films by photo-CVD for surface passivation
Tapati Jana
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2005
View PDFchevron_right
Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx:H films
Andres Vega Cuevas
Applied Physics Letters, 2001
View PDFchevron_right
Optical and structural properties of silicon oxynitride deposited by plasma enhanced chemical vapor deposition
Mustapha Lemiti
2010
View PDFchevron_right
Modeling of non-stoichiometric silicon oxides obtained by plasma enhanced chemical vapour deposition process
Jorge Barreto
Thin Solid Films, 2007
View PDFchevron_right
Plasma-enhanced Chemical Vapor Deposition of silicon dioxide Optimizing dielectric films through plasma characterization
Carlos David Ramos Vilchis
View PDFchevron_right
Characterization of SiO2 films deposited at low temperature by means of remote ICPECVD
Alexey Kovalgin
2007
View PDFchevron_right
Chemical and morphological properties of amorphous silicon oxynitride films deposited by plasma enhanced chemical vapor deposition
wanderla scopel
2001
View PDFchevron_right
Properties of Silicon Dioxide Films Prepared Using Silane and Oxygen Feeds by PE-CVD at low Power Plasma
Tushar Salve
View PDFchevron_right
Effect of the hydrogen flow rate on the structural and optical properties of hydrogenated amorphous silicon thin films prepared by plasma enhanced chemical vapor deposition
sana ben amor
physica status solidi c, 2012
View PDFchevron_right
Electrical Properties of Plasma-Deposited Silicon Oxide Clarified by Chemical Modeling
Alexey Kovalgin
ECS Transactions, 2009
View PDFchevron_right
Plasma treatment effects on Si and Si/dielectric film heterostructures
Nicoletta Ditaranto , Luisa Torsi
Journal of Materials Processing Technology, 2008
View PDFchevron_right
High-Quality Surface Passivation Obtained by High-Rate Deposited Silicon Nitride, Silicon Dioxide and Amorphous Silicon using the Versatile Expanding Thermal Plasma Technique
Bram Hoex
2006 IEEE 4th World Conference on Photovoltaic Energy Conference, 2006
View PDFchevron_right
The Electrical Properties of Silicon Oxide Deposited By Remote Plasma Enhanced Chemical Vapor Deposition (Rpecvd)
David Tsu
MRS Proceedings, 1987
View PDFchevron_right
Uniformity and Quality of Monocrystalline Silicon Passivation by Thin Intrinsic Amorphous Silicon in a New Generation Plasma-enhanced Chemical Vapor Deposition Reactor
Benjamin Strahm
MRS Proceedings, 2010
View PDFchevron_right
Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide
Wei-Tsu Tseng
Journal of Applied Physics, 2000
View PDFchevron_right
Plasma enhanced chemical vapor deposition of silicon thin films for large area electronics
Sonia Blais
Current Opinion in Solid State and Materials Science, 2002
View PDFchevron_right
Plasma enhanced chemical vapor deposition of nanocrystalline silicon films from SiF 4-H 2He at low temperature
Giovanni Bruno
Thin Solid Films, 1999
View PDFchevron_right
Ultra high amorphous silicon passivation quality of crystalline silicon surface using in-situ post-deposition treatments
Wissem. Dimassi
physica status solidi (RRL) - Rapid Research Letters, 2014
View PDFchevron_right
The Effect of Low and High Temperature Anneals on the Hydrogen Content and Passivation of Si Surface Coated with SiO[sub 2] and SiN Films
Mostafa El-Sayed
Journal of The Electrochemical Society, 1999
View PDFchevron_right
Plasma and surface diagnostics during plasma-enhanced chemical vapor deposition of SiO2 from SiH4/O2/Ar discharges
Eray Aydil
Thin Solid Films, 1996
View PDFchevron_right