The fabrication of mono-domain highly ordered nanoporous alumina on a wafer scale by a guided electric field (original) (raw)

This paper describes the formation of mono-domain highly ordered nanoporous alumina on the scale of a 2 inch diameter silicon wafer by anodization of aluminium evaporated on a patterned SiO 2 mask on a silicon substrate. The position of the ordered pores correlates with holes in the SiO 2 mask, which guide the electric field during anodization and initiates pore nucleation. The technique is suitable for the production of ordered nanoporous alumina on a wafer scale and overcomes the time, cost and scale limitations of existing processes.