Electrostatic Formation of Coupled Si/SiO 2 Quantum Dot Systems (original) (raw)
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Japanese Journal of Applied Physics, 2008
We study the electrostatic coupling in the silicon double quantum dot (DQD) structure as a key building block for a chargebased quantum computer and a quantum cellular automaton (QCA). We realize the three interdot coupling regimes of the DQD structure only by optimizing the DQD design and the thermal oxidation condition. We then demonstrate that the electrostatic coupling between DQDs can be modulated by tuning the negative voltage of the side gate electrode. Note that the interdot coupling was largely modulated with a small decrease in the gate voltage from 0 to À100 mV because our structure initially has the DQD geometry. Furthermore, the device fabrication is compatible with the conventional silicon complementary metal-oxide-semiconductor (CMOS) process. This structure is suitable for the future integration of CMOS devices. In addition, we show the derivation of the DQDs' capacitances, including the gate cross capacitances, as a function of the spacing between the two adjacent charge triple points. By using these capacitances, the electron transport properties of the DQD structure are simulated, and the modulation of the electrostatic coupling is successfully simulated as the change of the total capacitance in DQDs.
Controlled Coupling and Occupation of Silicon Atomic Quantum Dots
Eprint Arxiv 0807 0609, 2008
It is discovered that the zero-dimensional character of the silicon atom dangling bond (DB) state allows controlled formation and occupation of a new form of quantum dot assemblies. Whereas on highly doped n-type substrates isolated DBs are negatively charged, it is found that Coulomb repulsion causes DBs separated by less than ~2 nm to experience reduced localized charge. The unoccupied states so created allow a previously unobserved electron tunnel-coupling of DBs, evidenced by a pronounced change in the time-averaged view recorded by scanning tunneling microscopy. Direct control over net electron occupation and tunnel-coupling of multi-DB ensembles through separation controlled is demonstrated. Through electrostatic control, it is shown that a pair of tunnel-coupled DBs can be switched from a symmetric bi-stable state to one exhibiting an asymmetric electron occupation. Similarly, the setting of an antipodal state in a square assembly of four DBs is achieved, demonstrating at room temperature the essential building block of a quantum cellular automata device.
Electrostatically defined few-electron double quantum dot in silicon
Applied Physics Letters, 2009
A few-electron double quantum dot was fabricated using metal-oxide-semiconductor(MOS)-compatible technology and low-temperature transport measurements were performed to study the energy spectrum of the device. The double dot structure is electrically tunable, enabling the inter-dot coupling to be adjusted over a wide range, as observed in the charge stability diagram. Resonant single-electron tunneling through ground and excited states of the double dot was clearly observed in bias spectroscopy measurements.
A Multi-Purpose Electrostatically Defined Silicon Quantum Dot Structure
Japanese Journal of Applied Physics, 2012
Small size and good coupling control between dots are the key parameters for useful coupled quantum dot devices. Using a new approach of electrostatically defined silicon double quantum dot device recently proposed, we design and simulate a silicon quantum dot structure that exhibits multi functionality. Control on potential tunnel barrier using side gates, as well as the preparation of series-coupled and parallel-coupled double quantum dot structure are demonstrated and explained by numerical simulation on electron distribution profile.
Applied Physics Letters, 2020
Physically defined silicon triple quantum dots (TQDs) are fabricated on a silicon-on-insulator substrate by dry-etching. The fabrication method enables us to realize a simple structure that does not require gates to create quantum dot confinement potentials and is highly advantageous for integration. We observe the few-electron regime and resonant tunneling points in the TQDs by applying voltages to two plunger gates at a temperature of 4.2 K. Moreover, we reproduce the measured charge stability diagram by simulation with an equivalent-circuit model composed of capacitors and resistors. The equivalent-circuit simulation makes it clear that we realize three QDs in series within the nanowire, as planned. This circuit model also elucidates the mechanism of resonant tunneling and identifies a quadruple point of TQDs.
Charge dynamics of a single donor coupled to a few-electron quantum dot in silicon
Applied Physics Letters, 2012
We study the charge transfer dynamics between a silicon quantum dot and an individual phosphorous donor using the conduction through the quantum dot as a probe for the donor ionization state. We use a silicon n-MOSFET (metal oxide field effect transistor) biased near threshold in the SET regime with two side gates to control both the device conductance and the donor charge. Temperature and magnetic field independent tunneling time is measured. We measure the statistics of the transfer of electrons observed when the ground state D 0 of the donor is aligned with the SET states.
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Physical Review B, 2006
We present finite-element solutions of the Laplace equation for the silicon-based trench-isolated double quantum-dot and the capacitively-coupled single-electron transistor device architecture. This system is a candidate for charge and spin-based quantum computation in the solid state, as demonstrated by recent coherent-charge oscillation experiments. Our key findings demonstrate control of the electric potential and electric field in the vicinity of the double quantum-dot by the electric potential applied to the in-plane gates. This constitutes a useful theoretical analysis of the silicon-based architecture for quantum information processing applications.
Numerical modeling of silicon quantum dots
Superlattices and Microstructures, 1996
We have developed a numerical approach to calculate the confining potential and charge profiles in silicon quantum dots. We use a 3D generalization of the strongly implicit procedure for the Poisson equation. The efficient difference approximation, proposed by Scharfetter and Gummel, was extended to 3D for the continuity equation. To reduce the computation time and storage requirements, an adaptive non-uniform mesh was adopted.
Electrostically defined few-electron double quantum dot in silicon
2009
A few-electron double quantum dot was fabricated using metal-oxide-semiconductor(MOS)-compatible technology and low-temperature transport measurements were performed to study the energy spectrum of the device. The double dot structure is electrically tunable, enabling the inter-dot coupling to be adjusted over a wide range, as observed in the charge stability diagram. Resonant single-electron tunneling through ground and excited states of the double dot was clearly observed in bias spectroscopy measurements.
Controlled Coupling and Occupation of Silicon Atomic Quantum Dots at Room Temperature
Physical Review Letters, 2009
It is discovered that the zero-dimensional character of the silicon atom dangling bond (DB) state allows controlled formation and occupation of a new form of quantum dot assemblies. Whereas on highly doped n-type substrates isolated DBs are negatively charged, it is found that Coulomb repulsion causes DBs separated by less than ~2 nm to experience reduced localized charge. The unoccupied states so created allow a previously unobserved electron tunnel-coupling of DBs, evidenced by a pronounced change in the time-averaged view recorded by scanning tunneling microscopy. Direct control over net electron occupation and tunnel-coupling of multi-DB ensembles through separation controlled is demonstrated. Through electrostatic control, it is shown that a pair of tunnel-coupled DBs can be switched