Electron-beam lithography simulation for the fabrication of EUV masks (original) (raw)
Related papers
Electron Beam Lithography Simulation on Homogeneous and Multilayer Substrates
Japanese Journal of Applied Physics, 2000
High resolution patterning and simulation on Mo/Si multilayer for EUV masks
24th European Mask and Lithography Conference, 2008
Substrate Effect in Electron Beam Lithography
Advances in Electrical and Electronic Engineering, 2018
E-beam lithography experimental results and simulation for the 45-nm node
2004
Electron beam lithography simulation for high resolution and high-density patterns
Vacuum, 2001
Calculation of energy deposition in thin resist films over multilayer substrates
Microelectronic Engineering, 1998
High-energy Electron Beam Lithography for Nanoscale Fabrication
Lithography, 2010
Simulation of chemically amplified resist processes for 150 nm e-beam lithography
Microelectronic Engineering, 1999
Photomask Technology 2018
The Validation of Various Technological Factors Impact on the Electron Beam Lithography Process
Advances in Electrical and Electronic Engineering, 2021
Simulation of electron beam lithography of nanostructures
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2010
European Transactions on Telecommunications, 1990
Simulation of shot noise effect on CD and LER of electron-beam lithography in 32nm designs
Microelectronic Engineering, 2010
Multiphysics Simulation of Nanopatterning in Electron Beam Lithography
Journal of Photopolymer Science and Technology, 2016
Modeling and experiments of non-telecentric thick mask effects for EUV lithography
Greg McIntyre, Chiew-Seng Koay
Alternative Lithographic Technologies, 2009
Simulating the mechanical response of electron-beam projection lithography masks
J. Vac. Sci. Technol. B, 2000
Taras Fito, Mohammad Ali Mohammad
Microelectronic Engineering, 2009
Refined extreme ultraviolet mask stack model
Journal of the Optical Society of America A, 2021
Efficient and robust algorithms for Monte Carlo and e-beam lithography simulation
Microelectronic Engineering, 2001
Characterization of optics and masks for the EUV lithography
Microelectronic Engineering, 2002
Comparative study of mask architectures for EUV lithography
24th Annual BACUS Symposium on Photomask Technology, 2004
Results of proof-of-concept 50keV electron multi-beam mask exposure tool (eMET POC)
Photomask and Next-Generation Lithography Mask Technology XIX, 2012
Extreme Ultraviolet (EUV) Lithography III
SPIE eBooks, 2012
Computer simulation of resist profiles at electron beam nanolithography
Microelectronic Engineering, 2010
Localized resist heating due to electron-beam patterning during photomask fabrication
SPIE Proceedings, 2001
Stress mitigation in Mo/Si multilayers for EUV lithography
Stefan Muellender, Erwin Zoethout
Emerging Lithographic Technologies VII, 2003
EUV mask absorber and multi-layer defect disposition techniques using computational lithography
Photomask Technology 2011, 2011
EUV Lithography for the 3-nm Node and Beyond
2020
1 kV resist technology for microcolumn-based electron-beam lithography
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 2000
Independent-Exposure Method in Electron-Beam Lithography
Lithography, 2010
Electron Penetration Depths in EUV Photoresists
Journal of Photopolymer Science and Technology, 2014
An investigation of EUV lithography defectivity
Photomask Technology 2008, 2008
An investigation of EUV lithography defectivity
Proceedings of Spie the International Society For Optical Engineering, 2008