Formation of carbon nanostructures by the plasma jets emitted from a pulsed capillary discharge at low pressures (original) (raw)
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Formation of carbon nanostructures by the plasma jets: synthesis, characterization, application
Materials Today: Proceedings, 2018
Carbon nanostructures were synthesized without the use of catalysts by the conversion of hydrocarbons in the DC plasma jet system. The samples of carbon nanotubes, nanofibers, graphene, onion like structures have been characterized by electron microscopy, thermal analysis, Raman spectroscopy. An experimental study of the composition of the gas phase with variation of the type of the plasma-forming gas and the type of carbon source was carried out. The synthesized samples have been used in the composition of the functional ceramic and in electrochemical systems.
DC discharge plasma studies for nanostructured carbon CVD
Diamond and Related Materials, 2003
A synthesis of carbon films by d.c. discharge plasma-enhanced chemical vapor deposition using a hydrogen-methane gas mixture was investigated by optical emission spectroscopy and by measurements of current-voltage dependencies. The effects of gas composition and pressure on the characteristics of d.c. discharge in the methane-hydrogen gas mixture are studied. Variation of the deposition process parameters over a wide range allows us to obtain various carbon thin film materials, whose structure and composition were qualitatively characterized by Raman spectroscopy and electron microscopy. The data of optical emission spectroscopy show the presence in the discharge plasma of H, H , CH and C activated species, which play a decisive role in 2 2 nanostructured graphite-like carbon film formation and carbon condensation in the gas phase. We propose a model for the formation of graphitic nanostructured carbon films in plasma containing C dimers. 2
Journal of Electrical Engineering, 2010
Synthesis of Carbon Nanostructures by Plasma Enhanced Chemical Vapour Deposition at Atmospheric PressureCarbon nanostructures present the leading field in nanotechnology research. A wide range of chemical and physical methods was used for carbon nanostructures synthesis including arc discharges, laser ablation and chemical vapour deposition. Plasma enhanced chemical vapour deposition (PECVD) with its application in modern microelectronics industry became soon target of research in carbon nanostructures synthesis. Selection of the ideal growth process depends on the application. Most of PECVD techniques work at low pressure requiring vacuum systems. However for industrial applications it would be desirable to work at atmospheric pressure. In this article carbon nanostructures synthesis by plasma discharges working at atmospheric pressure will be reviewed.
Synthesis of Carbon Nanostructures in a Plasma Jet Reactor
Radioelectronics. Nanosystems. Information Technologies., 2015
In this paper we propose a simple approach to produce nanocrystalline carbon materials with a narrow pore size distribution: the evaporation and condensation by a plasma jet. Synthesized samples were characterized by physic chemical methods. It demonstrated the possibility to application of plasma jet reactor to synthesis of nanostructured materials of a predetermined particle size and a pore structure in large quantities.
Journal of Nanoparticle Research, 2015
Three kinds of carbon nanostructures, i.e., graphene nanoflakes (GNFs), multi walled carbon nanotubes (MWCNTs), and spherical carbon nanoparticles (SCNPs) were comparatively investigated in one run experiment. These carbon nanostructures are located at specific location inside the direct current plasma-assisted arc discharge chamber. These carbon nanomaterials have been successfully synthesized using graphite as arcing electrodes at 400 torr in helium (He) atmosphere. The SCNPs were found in the deposits formed on the cathode holder, in which highly curled graphitic structure are found in majority. The diameter varies from 20 to 60 nm and it also appears that these particles are self-assembled to each other. The MWCNTs with the diameter of 10-30 nm were obtained which were present inside the swelling portion of cathode deposited. These MWCNTs have 14-18 graphitic layers with 3.59 Å interlayer spacing.
Fabrication of Carbon Nanoparticle Strand under Pulsed Arc Discharge
Plasmonics, 2018
Nowadays, carbon-based nanomaterial application on nanoelectronic is growing fast. Therefore, the nanoparticle fabrication as a device, needs to be optimized. In the present work, a pulsed AC arc discharge apparatus is fabricated for production of carbon nanoparticles (CNPs)-based device, which is derived from decomposition of methane gas in plasma condition and atmospheric pressure controlled by a bobbling system. The morphological properties and identification of synthesized CNPs are characterized by scanning electron microscopy (SEM), Fourier transform infrared (FTIR) spectroscopy and nanofocus techniques. The analysis of obtained images confirms the existence of CNPs (mainly carbon nanotubes CNTs) in this method. Also, pulsed electric field equation and relation between growth time and distance between two electrodes are investigated. Moreover, growth conditions of CNPs and their physical mechanism are discussed. Finally, the current-voltage (I-V) characteristics of synthesized CNPs are examined.
Green Applications of Carbon Nanostructures produced by Plasma Techniques
MRS Advances
The study of several types of plasma reactors used to obtain carbon nanostructures (CNS) is realized in the Laboratory of Plasma Applications. To obtain carbon nanotubes (CNT) thermal plasma was used and carbon nanofibers (CNF) were obtained with glow discharge. Optical emission spectroscopy was applied to correlate some plasma parameters with CNS growth. Several analytical techniques are used to study CNS obtained by both plasma techniques. In this work, we present results concerning the use of CNS as harmful gases traps and some results of a CNT based supercapacitor prototype are also depicted. Experimental results here detailed, show the capacity of CNF to absorb nitrogen oxides (NOx), sulfur dioxide (SO2) and, at less proportion, carbon dioxide (CO2). CNF films were obtained by electrophoretic deposition technique and by adding CNT ink; preliminary results showed a capacitance value of 2.69 F/g. This value remains still low compared to some supercapacitors, therefore additional ...
Keywords: [C] Plasma based ion implantation and deposition (PBII&D) [C] Radio frequency (RF) plasma [D] Carbon film We report on the synthesis of a variety of sub-micron size carbon structures using RF, 13.6 MHz, plasma enhanced CVD, without the use of any external heater or catalyzer precursor. The plasma is generated in an asymmetric capacitively coupled discharge operated at a low power of up to 30 W, with a gas mixture of acetylene and hydrogen, at different mixing ratios. Carbon films are grown on mirror-like polished silicon (100) substrates, which are negatively biased using 4 kV, 2 μs pulses, at a 2 kHz rate, with a characteristic exposure time of around 30 min. The morphology, structure and atomic composition of the resulting carbon films are characterized using SEM, EDX, AFM and Raman spectroscopy. Carbon spheres of different diameters, of sub-micron range, are observed to grow in layers onto the Si surface. We present a detailed characterization of the resulting carbon films, in correlation with the plasma properties, as inferred from optical emission spectroscopy observations.