NANOELECTRONICS AND NANOLITHOGRAPHY (original) (raw)
Currently optical lithography is the dominant exposure tool. The decrease of the critical dimensions is based on using radiation with a shorter wavelength. Extreme Ultra Violet lithography is the natural successor of conventional optical lithography. X-ray proximity lithography represents the last step in the decrease of photon wavelength for nanolithography purposes. Current e-beam lithography systems are mainly serial technologies, which are limited by the scanning speed of the e-beam in the pattern generation. Alternative techniques are developed for the mass production and for laboratory purpose as well. We present the Local Anodic Oxidation (LAO) by Atomic Force Microscope Ntegra NT-MDT. LAO is still attracting attention because of its relatively low cost and high resolution. The LAO can be applied to very thin semiconductor layers to define quantum point contacts, quantum wires, rings, dots and other devices. We report our results of LAO process on the thin GaMnAs layers prepa...
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