Growth of zinc oxide thin films for optoelectronic application by pulsed laser deposition (original) (raw)

Advances in Thin-Film Coatings for Optical Applications III, 2006

Abstract

Zinc oxide (ZnO) thin films were deposited on quartz, silicon, and polymer substrates by pulsed laser deposition (PLD) technique at different oxygen partial pressures (0.007 mbar to 0.003 mbar). Polycrystalline ZnO films were obtained at room temperature when the oxygen pressure was between 0.003 mbar and .007 mbar, above and below this pressure the films were amorphous as indicated by

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