SOME ASPECTS OF CVD GROWN DIAMOND AND DLC FILMS (original) (raw)
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2013
Diamond-like nanocomposite (DLN) coatings have been deposited over different substrates used for biomedical applications by plasma-enhanced chemical vapour deposition (PECVD). DLN has an interconnecting network of amorphous hydrogenated carbon and quartz-like oxygenated silicon. Raman spectroscopy, Fourier transform-infra red (FT-IR) spectroscopy, transmission electron microscopy (TEM) and X-ray diffraction (XRD) have been used for structural characterization. Typical DLN growth rate is about 1 μm/h, measured by stylus profilometer. Due to the presence of quartz-like Si:O in the structure, it is found to have very good adhesive property with all the substrates. The adhesion strength found to be as high as 0•6 N on SS 316 L steel substrates by scratch testing method. The Young's modulus and hardness have found to be 132 GPa and 14•4 GPa, respectively. DLN coatings have wear factor in the order of 1 × 10 −7 mm 3 /N-m. This coating has found to be compatible with all important biomedical substrate materials and has successfully been deposited over Co-Cr alloy based knee implant of complex shape.
Synthesis and characterisation of freestanding diamond coatings
Freestanding polycrystalline diamond (PCD) coatings are of immense technological importance. PCD has been grown over silicon substrates by microwave plasma assisted chemical vapor deposition (MWPACVD) process. The coatings are grown by suitable optimisation of the growth parameters of a 915 MHz microwave reactor. Thereafter, 1:1:1 solution of hydrofluoric acid (HF), nitric acid (HNO 3 ) and acetic acid (CH 3 COOH) is used to etch out the silicon wafer from the backside of the coating. Hereby, freshly generated nucleation surface, could be characterised by scanning electron microscopy (SEM), atomic force microscopy (AFM), Raman spectroscopy and stylus profilometer and could be compared with the growth side. It is found that both the nucleation side and growth side are of very high quality (full width at half maxima, i.e., FWHM < 8 cm -1 ). The growth side is (111) textured, whereas, the nucleation side is very smooth with embedded detonation-nano-diamond (DND) agglomerates. These freestanding coatings are successfully laser cut into different geometrical shapes. They are found to be optically translucent having high refractive index. Cross-sectional microscopy of the laser cut edge reveals novel melting features of the CVD grown diamond columns.
Synthesis and Characterization of Multilayered Diamond Coatings for Biomedical Implants
Materials, 2011
With incredible hardness and excellent wear-resistance, nanocrystalline diamond (NCD) coatings are gaining interest in the biomedical community as articulating surfaces of structural implant devices. The focus of this study was to deposit multilayered diamond coatings of alternating NCD and microcrystalline diamond (MCD) layers on Ti-6Al-4V alloy surfaces using microwave plasma chemical vapor deposition (MPCVD) and validate the multilayer coating's effect on toughness and adhesion. Multilayer samples were designed with varying NCD to MCD thickness ratios and layer numbers. The surface morphology and structural characteristics of the coatings were studied with X-ray diffraction (XRD), Raman spectroscopy, and atomic force microscopy (AFM). Coating adhesion was assessed by Rockwell indentation and progressive load scratch adhesion tests. Multilayered coatings shown to exhibit the greatest adhesion, comparable to single-layered NCD coatings, were the multilayer samples having the lowest average grain sizes and the highest titanium carbide to diamond ratios.
CVD growth of uniform conformal polycrystalline diamond (PCD) coatings over complex three dimensional structures is very important material processing technique. It has been found that the nucleation and subsequent growth period is very critical for successful development of CVD diamond based technologies. There are many methods of enhancing diamond nucleation on foreign substrates-ultrasonic treatment with diamond seed suspension being the best among them. A combination of ultrasonic seeding (US) technique with prior treatment (PT) of the substrate under CVD diamond growth conditions for brief period of time, has found to be very effective in enhancing the diamond nucleation during CVD growth-together they are known as NNP. But successive usage of the same seeding suspension up to ten cycles deteriorates the seeding efficiency. 6 th seeding cycle onwards the silicon substrates are barely get covered by diamond crystallites. Five different diamond micron grits were used for seeding the silicon substrates and it is observed that US with the sub-micron particles (0.25 µm) is very effective in efficient nucleation of PCD on Si substrates. PT of the substrate somewhat negates the effect of successive use of the same seeding slurry but it is best to avoid recycling of the same seeding suspension using micron size diamond grits.
Effect of the substrate material on diamond CVD coating properties
Materials Chemistry and Physics, 2003
Diamond coatings were deposited onto different substrates (Cu, Si, WC-Co, Mo) by hot-filament chemical vapor deposition (CVD). Characterization of the obtained coatings was performed using scanning electron microscopy (SEM), X-ray diffraction (XRD) analysis, Raman spectroscopy and Fourier transform infrared reflection (FTIR) spectroscopy. The results and observed differences are discussed from the aspect of the chemical nature of the substrate and its reactivity with a gaseous medium.
Application of diamond coatings onto small dental tools
Diamond and Related Materials, 2002
Small dental tools such as burs and drills are commonly used in dental practice and laboratory. Conventional diamond burs used for grinding operations have a number of problems associated with heterogeneity of the crystallites, decreased cutting efficiency, need for repeated sterilisation and short life. These burs are manufactured by imbedding diamond particles into the burs using a suitable binder matrix material. The use of a diamond coating may offer an improvement in dental bur technology. Chemical vapour deposition (CVD) of diamond coatings onto the cemented tungsten carbide WC-Co substrate is problematic. Generally the adhesion of diamond coating to cemented carbide substrate is poor. It is obvious that the binder materials such as cobalt can suppress diamond growth and enhance graphitic deposits, which cause poor adhesion and low diamond nucleation density. The effects of key process parameters such as filament position, filament and substrate temperature and pre-treated substrate material on the coating properties have been investigated using a variety of analytical techniques. Characterisations of the substrates and polycrystalline diamond film morphology were analysed by scanning electron microscopy (SEM). The chemical composition was evaluated by energy dispersive spectroscopy (EDS). Raman spectroscopy was used to assess the carbon-phase purity and give an indication of the stress levels in the as-grown polycrystalline diamond films. ᮊ
Microstructural and biological properties of nanocrystalline diamond coatings
Diamond and Related Materials, 2006
In this study, the microstructural, mechanical, adhesion, and hemocompatibility properties of nanocrystalline diamond coatings were examined. Microwave plasma chemical vapor deposition (MPCVD) was used to deposit nanocrystalline diamond coatings on silicon (100) substrates. The coating surface consisted of faceted nodules, which exhibited a relatively wide size distribution and an average size of 60 nm. High-resolution transmission electron microscopy demonstrated that these crystals were made up of 2-4 nm rectangular crystallites. Raman spectroscopy and electron diffraction revealed that the coating contained both crystalline and amorphous phases. The microscratch adhesion study demonstrated good adhesion between the coating and the underlying substrate. Scanning electron microscopy and energy dispersive X-ray analysis revealed no crystal, fibrin, protein, or platelet aggregation on the surface of the platelet rich plasma-exposed nanocrystalline diamond coating. This study suggests that nanocrystalline diamond is a promising coating for use in cardiovascular medical devices.
Bulletin of Materials Science, 2015
Diamond coatings were deposited on silicon (100) substrate using the microwave plasma chemical vapour deposition (MPCVD) technique at different process conditions. Process parameters such as CH 4 -H 2 gas mixture concentration, microwave power, chamber pressure and substrate temperature were varied. The diamond coatings were characterized by micro-Raman and micro-photoluminescence (PL) spectroscopy techniques. In this paper we report a comparison of the overall quality of MPCVD polycrystalline diamond coatings grown under different processing conditions in terms of stress distribution, thickness uniformity and surface roughness. Micro-Raman spectroscopy studies over various points on the deposited coating showed that the Raman line widths of diamond peak varied from 3.2 to 18.3 cm −1 with the variation of CH 4 and H 2 gas concentration. The micro-PL spectra suggested the presence of impurity concentration and defects within the diamond coating synthesized at different processing conditions. Transmission electron microscopy (TEM) images provide the direct evidence of the presence of crystal defects which corroborates the Raman and PL results. The coherence scanning interferometry (CSI) showed that surface roughness of diamond coating varied from 0.43 to 11 μm with thickness at different positions of the three coating samples. It has been concluded that Raman line-width broadening and Raman-shift are due to the presence of crystal defects as well as non-uniform distribution of stresses present in the diamond crystals of the coating, due to the incorporation of Si as impurity element and non-uniform temperature distribution during growth. Defect density gets reduced at higher processing temperatures. It is also being proposed that better thickness uniformity and lower surface roughness can be achieved for coatings deposited at low methane concentration under optimized process conditions.