Application of the high-resolution grazing-emission x-ray fluorescence method for impurities control in semiconductor nanotechnology (original) (raw)
Total reflection X-ray fluorescence spectroscopy using synchrotron radiation for trace impurity analysis of silicon wafer surfaces
Maria Delbarba
1996
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Observation of ultralow-level Al impurities on a silicon surface by high-resolution grazing emission x-ray fluorescence excited by synchrotron radiation
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Physical Review B, 2009
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Combination of grazing incidence x-ray fluorescence with x-ray reflectivity in one table-top spectrometer for improved characterization of thin layer and implants on/in silicon wafers
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Trends in total reflection X-ray fluorescence spectrometry for metallic contamination control in semiconductor nanotechnology
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Method and mechanism of vapor phase treatment–total reflection X-ray fluorescence for trace element analysis on silicon wafer surface
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Depth profiling of low energy ion implantations in Si and Ge by means of micro-focused grazing emission X-ray fluorescence and grazing incidence X-ray fluorescence
J.-cl. Dousse, Joanna Hoszowska
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Impurities in multicrystalline silicon wafers for solar cells detected by synchrotron micro-beam X-ray fluorescence analysis
Andreas Thünemann
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Future in-fab applications of total reflection X-ray fluorescence spectrometry for the semiconductor industry
Ehrenfried Zschech
Spectrochimica Acta Part B: Atomic Spectroscopy, 1999
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Validation of vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis of silicon wafers
Stefan Gendt
Spectrochimica Acta Part B: Atomic Spectroscopy, 2004
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Depth profiles of Al impurities implanted in Si wafers determined by means of the high-resolution grazing emission X-ray fluorescence technique
J.-cl. Dousse, Joanna Hoszowska
Spectrochimica Acta Part B: Atomic Spectroscopy, 2010
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Synchrotron radiation induced total reflection X-ray fluorescence of low Z elements on Si wafer surfaces at SSRL — comparison of excitation geometries and conditions
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Spectrochimica Acta Part B: Atomic Spectroscopy, 2001
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Depth profiling of dopants implanted in Si using the synchrotron radiation based high-resolution grazing emission technique
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Scanning X-ray fluorescence microspectroscopy of metallic impurities in solar-grade silicon
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Physica Status Solidi A-applications and Materials Science, 2010
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Construction of a windowless Si-anode X-ray tube for a more efficient excitation of low Z elements on Si-wafer surfaces in total reflection fluorescence analysis
C. Streli
Spectrochimica Acta Part B: Atomic Spectroscopy, 2003
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Analysis of low Z elements on Si wafer surfaces with synchrotron radiation induced total reflection X-ray fluorescence at SSRL, Beamline 3-3: comparison of droplets with spin coated wafers
B. Kanngießer
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Vapor phase decomposition–droplet collection–total reflection X-ray fluorescence spectrometry for metallic contamination analysis on Ge wafers
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Spectrochimica Acta Part B: Atomic Spectroscopy, 2005
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Improvement of total reflection X-ray fluorescence analysis of low Z elements on silicon wafer surfaces at the PTB monochromator beamline for undulator radiation at the electron storage ring BESSY II
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Calibration procedure for quantitative surface analysis by total reflection X-ray fluorescence
Michel Delamar
Surface and Interface Analysis, 1994
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Synchrotron X-ray diffraction analysis for quantitative defect evaluation in GaP/Si nanolayers
Emmanuel Giudicelli
Thin Solid Films, 2013
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Determination of ultra trace contaminants on silicon wafer surfaces using total-reflection X-ray fluorescence TXRF ‘state-of-the-art’
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Spectrochimica Acta Part B: Atomic Spectroscopy, 2001
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Characterization of ultra-shallow aluminum implants in silicon by grazing incidence and grazing emission X-ray fluorescence spectroscopy
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Nanoresolution interface studies in thin films by synchrotron x-ray diffraction and by using x-ray waveguide structure
Attila Csik
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Chemical Mapping of Individual Semiconductor Nanostructures
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Trace element analysis on Si wafer surfaces by TXRF at the ID32 ESRF undulator beamline
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Study of near-surface layers modified by ion implantation in Si wafers by grazing incidence X-ray reflectometry
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Grazing incidence x-ray fluorescence and secondary ion mass spectrometry combined approach for the characterization of ultrashallow arsenic distribution in silicon
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Tomographic analysis of dilute impurities in semiconductor nanostructures
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Determination of metallic contaminants on Ge wafers using direct- and droplet sandwich etch-total reflection X-ray fluorescence spectrometry
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