Expanding the limits of Nanofabrication with Extreme Ultraviolet Light (original) (raw)

Abstract

In this nanoscale exploratory research (NER) project, we investigate the capabilities of a table top nanopatterning tool based on the illumination with compact extreme ultraviolet (EUV) laser sources. We pursue two different approaches consisting of interferometric lithography (IL) and de-magnifying imaging using diffractive optics. Main efforts were concentrated in the utilization of a 47 nm discharge pumped EUV laser. Preliminary tests were also performed using a high repetition rate laser at 13.2 nm.

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