Controlled Self-Assembly for High-Resolution Magnetic Printing (original) (raw)
High-resolution patterning technology capable of massproducing large patterned areas is very useful for producing electronic devices and biochips. As an alternative to improve on existing patterning technology, diverse printing techniques have been extensively studied. However, the resolution achievable using printing technology is typically limited to 20-30 μ m. In particular, with the carbon nanomaterials that have been used in organic electronic devices, it is diffi cult to print patterns with line widths of less than about 70 μ m. In general, metal nanoparticles should be sintered at high temperatures when used as ink materials, and inkjet printing of carbon nanomaterials produces only thin patterns after one printing operation, making repeated printing (often dozens of times) necessary. This decreases the productivity of these methods signifi cantly. Here, we demonstrate that a controlled magnetic fi eld can create a nanoparticle pattern with a minimum line width of 10 μ m on a fl exible substrate. The spatial distribution of the magnetic fi eld determining the shape of the printed patterns of superparamagnetic nanoparticles was adjusted by changing the direction of the external magnetic fi eld and the arrangement of the patterned nickel structures in the magnetic mask. This magnetic printing method has also been successfully used to print conductive patterns consisting of copper or carbon nanomaterials.
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