5 E-Beam Nanolithography Integrated with Scanning Electron Microscope (original) (raw)
The integration of e-beam nanolithography with scanning electron microscopes (SEMs) enhances micro and nano fabrication capabilities by utilizing existing microscope infrastructure without compromising imaging performance. This paper discusses the classification of electron sources, comparing the characteristics and advantages of conventional (tungsten, LaB6) and field emission sources for lithography applications. Additionally, it highlights the versatility and control options of modern microscopy systems, which facilitate advanced fabrication techniques through external manipulation of beam parameters.