H.Wong, M.C.Poon, Y.Gao, and T.C.W.Kok, “Preparation of Thin Dielectric Film for Nonvolatile Memory by Thermal Oxidation of Si-rich LPCVD nitride,” Journal of Electrochemical Society, vol.148, no.5, pp.G275-G278, May 2001 (original) (raw)

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H.Wong, M.C.Poon, Y.Gao, and T.C.W.Kok, “Preparation of Thin Dielectric Film for Nonvolatile Memory by Thermal Oxidation of Si-rich LPCVD nitride,” Journal of Electrochemical Society, vol.148, no.5, pp.G275-G278, May 2001

Journal of The Electrochemical Society

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