Defect energy levels in hydrogen-implanted and electron-irradiated n-type 4H silicon carbide (original) (raw)

Deep level transient spectroscopy study of defects in hydrogen implanted p-type 4H-SiC

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Journal of Applied Physics, 2007

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Electrical characterisation of deep level defects created by bombarding the n-type 4H-SiC with 1.8 MeV protons

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Radiation-induced defect centers in 4H silicon carbide

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Defects in High Energy Ion Irradiated 4H-SiC

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In Situ Study of Low-Temperature Irradiation-Induced Defects in Silicon Carbide

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Annealing behavior of the EB-centers and M-center in low-energy electron irradiated n-type 4H-SiC

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Capture cross sections of electron irradiation induced defects in 6H–SiC

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High energy N+ ion implantation in 4H–SiC

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Point defect production efficiency in ion irradiated 4H–SiC

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Annealing behavior of vacancies and Z1/2 levels in electron-irradiated 4H–SiC studied by positron annihilation and deep-level transient spectroscopy

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Capacitance transient study of a bistable deep level in e − -irradiated n-type 4H–SiC

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Electric-field-assisted migration and accumulation of hydrogen in silicon carbide

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Vacancy-related defect distributions in 11B-, 14N-, and 27Al-implanted 4H–SiC: Role of channeling

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Impact of Ionizing Radiation on 4H-SiC Devices

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Annealing of ion implanted 4H–SiC in the temperature range of 100–800° C analysed by ion beam techniques

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