Mo/Si multilayers with enhanced TiO2-and RuO2-capping layers (original) (raw)

Proceedings of Spie the International Society For Optical Engineering, 2008

Abstract

The lifetime of Mo/Si multilayer-coated projection optics is one of the outstanding issues on the road of commercialization of extreme-ultraviolet lithography (EUVL). The application of Mo/Si multilayer optics in EUVL requires both sufficient radiation stability and also the highest possible normal-incidence reflectivity. A serious problem of conventional high-reflective Mo/Si multilayers capped by silicon is the considerable degradation of reflective properties

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